A heat treatment apparatus includes a heating unit, a chamber, an exhaust unit, a partition unit and a switching unit. The heating unit supports and heats a substrate on which a film of a processing liquid is formed. The chamber surrounds the substrate supported by the heating unit. The exhaust unit is configured to discharge a gas from an inner space of the chamber through a discharge opening located near the heating unit. The partition unit is configured to partition the inner space of the chamber into a first space where the substrate on the heating unit is exposed and a second space located above the first space. The switching unit is configured to switch between a first state where the gas is discharged by the exhaust unit through the first space and a second state where the gas is discharged by the exhaust unit through the second space.

A sintering and debinding system includes a debinding chamber configured to switch between an open state and a closed state, the open state being configured to permit receipt or removal of at least one part within or from the debinding chamber and a sintering chamber operably connected to the debinding chamber and being vertically positioned above or below the debinding chamber. The sintering system also includes a shelf structure configured to receive the at least one part, the shelf structure being movable between the debinding chamber and the sintering chamber and a gate valve configured to switch between an open state and a closed state, the gate valve being configured to selectively permit or block fluid communication between the debinding chamber and the sintering chamber. The gate valve is configured such that: when the gate valve is in an open state, fluid communication between the debinding chamber and the sintering chamber is permitted and the shelf structure is movable between the debinding chamber and the sintering chamber. The gate valve is further configured such that, when the gate valve is in the closed state, fluid communication between the debinding chamber and sintering chamber is restricted, and at least one of: (i) movement of the shelf structure between the debinding chamber and the sintering chamber is restricted or (ii) the debinding chamber is configured to permit receipt within and removal of the at least one part from the debinding chamber.

A dual-purpose sintering furnace including a furnace body having a furnace chamber, a first furnace mouth and a second furnace mouth which are communicated with the furnace chamber, a furnace door hinged to the furnace body and configured for closing the first furnace mouth, a blocking member lap-jointed inside the furnace chamber and configured for blocking the second furnace mouth, a sample stage, an ejection rod fixedly arranged on a sample placement face of the sample stage, a lifting device configured for driving the sample stage to raise or lower, so that the ejection rod pushes the blocking member until the second furnace mouth is opened, and so that the sample stage enters the furnace chamber through the second furnace mouth. The dual-purpose sintering furnace can complete a large amount of sintering as conventional sintering and also implement rapid sintering.

A furnace for producing a secondary battery cathode material according to an exemplary embodiment of the present invention includes; a chamber of which the internal space is heated by a heater; a conveyer installed in the chamber and conveying a sagger containing raw material power of a cathode material of a secondary battery in one direction; and a gas supply nozzle and an exhaust port installed in the chamber.

The chamber is divided into a front chamber, an intermediate chamber, and a rear chamber. The intermediate chamber has an inlet shutter and an outlet shutter for sealing the internal space thereof, and an exhaust port of the intermediate chamber is connected to an exhaust device for discharging gas.

Disclosed is a thermal reduction apparatus. The thermal reduction apparatus according to the exemplary embodiment includes: a preheating unit which preheats a to-be-reduced material and loads the to-be-reduced material into a reducing unit; the reducing unit which is connected to the preheating unit and in which a thermal reduction reaction of the to-be-reduced material occurs; a cooling unit which is connected to the reducing unit and from which the to-be-reduced material flowing into the cooling unit is unloaded to the outside; a gate device which is installed between the preheating unit and the reducing unit; a gate device which is installed between the reducing unit and the cooling unit; a condensing device which is connected to the reducing unit and condenses a metal vapor; a first blocking unit which is installed in the reducing unit; and a second blocking unit which is installed in the reducing unit so as to be spaced apart from the first blocking unit.

A fire testing device for testing fire-resistance properties of a test subject includes a cavity, a heat source adapted to heat the cavity, and a removable separation plate configured to subdivide the cavity into a first chamber and a second chamber. The heat source is arranged in the first changer and adapted to preheat the first chamber. The second chamber includes an opening adapted to receive the test subject. A fire-resistance test of the test subject may include activating the removable separation plate to subdivide the cavity into the first chamber and the second chamber, arranging the test subject at an opening of the second chamber, preheating the first chamber to a defined temperature using the heat source, deactivating the removable separation plate to provide an undivided cavity, and sustaining a heat supply to the cavity using the heat source.

The present invention relates to a plasma furnace capable of separating and discharging different kinds of molten material, which comprises a furnace body 110; and a heating portion 140 for heating the lateral discharge gate 120, 130, wherein the furnace body comprises a melt discharge portion formed through a lower portion of the melting chamber 101 provided for accommodating molten material; and at least two lateral discharge gates 120, 130 provided at different heights capable of discharging molten material.

The infrared baking device includes: a furnace chamber having an opening openable/closable by an opening/closing cover and allowing an internal space thereof to be tightly sealed; a baking object placement portion on which a baking object is to be placed and which is extractable/insertable through the opening; a heater lamp for heating the heating object by infrared rays; and a thermocouple provided at the baking object placement tray. A furnace wall of the furnace chamber is configured so that infrared rays from the heater lamp are collected and radiated to the tray. The thermocouple is provided in a contactor to contact with the tray. The tray and the contactor are made of the same material which absorbs the infrared rays.

A dual-purpose sintering furnace including a furnace body having a furnace chamber, a first furnace mouth and a second furnace mouth which are communicated with the furnace chamber, a furnace door hinged to the furnace body and configured for closing the first furnace mouth, a blocking member lap jointed inside the furnace chamber and configured for blocking the second furnace mouth, a sample stage, an ejection rod fixedly arranged on a sample placement face of the sample stage, a lifting device configured for driving the sample stage to raise or lower, so that the ejection rod pushes the blocking member until the second furnace mouth is opened, and so that the sample stage enters the furnace chamber through the second furnace mouth. The dual-purpose sintering furnace can complete a large amount of sintering as conventional sintering and also implement rapid sintering.

This heat treatment apparatus is configured such that a treating target is conveyed via an intermediate conveyance chamber and accommodated in a heating chamber. The heat treatment apparatus is provided with a gas cooling chamber that is disposed adjacent to the intermediate conveyance chamber and in which the treating target is cooled using a cooling gas containing an oxidizer.