A rapid thermal processing method and a rapid thermal processing device are provided. The rapid thermal processing method includes the following operations. A wafer is provided. A first heating operation is performed on the wafer to heat the wafer to a first temperature. The wafer is controlled to start rotating. The first temperature is maintained for a first predetermined time. A second heating operation is performed on the wafer to heat the wafer from the first temperature to a second temperature, and the second temperature is maintained for a second predetermined time. A third heating operation is performed on the wafer to heat the wafer from the second temperature to a third temperature, and the third temperature is maintained for a third predetermined time.

The present application discloses a reflow oven and the operation method thereof. The reflow oven can operate in air mode and inert gas mode. The reflow oven comprises a heating zone, a blocked exhaust zone and a cooling zone. The reflow oven further comprises a first pipeline, a second pipeline and a third pipeline. When the reflow oven operates in air mode, external clean air is delivered to the heating zone and is discharged from the heating zone and the blocked exhaust zone. When the reflow oven operates in inert gas mode, an inert gas is delivered from the blocked exhaust zone to the heating zone and is discharged from the heating zone. Satisfying the accurate temperature profiling necessary for reflow processing in the operation atmosphere of air or an inert gas, the reflow oven in the present application can effectively discharge volatile pollutants to reduce the number of follow-up services and maintenances. In addition, the reflow oven in the present application can save the expensive inert gas.

A method for the recrystallisation annealing of a non-grain-oriented electric strip (2) in a continuous annealing and coating line (1) is presented. Therein, the electric strip (2) is heated in an induction furnace (5) to a temperature of at least 680° C. at a heating rate of at least 80 K/s and then, in an optional second continuous furnace (8), to a temperature of at least 820° C. at a heating rate of at most 20 K/s. The electric strip (2) is initially heated before the induction furnace (5) via a first continuous furnace (3) to a temperature of at least 300° C. at a heating rate of at most 60 K/s.

A furnace working system includes a vacuumed pre-heating zone, a vacuumed gas heating zone disposed behind the pre-heating zone, a vacuumed electric heating zone, a high cooling zone disposed behind the electric heating zone, a low cooling zone disposed behind the high cooling zone, a conveyer disposed in the zones for transporting a work piece through the zones, a pipe couples the high cooling zone to the gas heating zone for supplying a heat from the high cooling zone to the gas heating zone, and a conduit couples the low cooling zone to the pre-heating zone for supplying a heat from the low cooling zone to the pre-heating zone. A transition zone is disposed between the gas heating zone and the electric heating zone.

A shuttle kiln (100) according to certain aspects includes at least one flue channel (124) and multiple flue risers (122) in fluid communication with the flue channel (124), and at least one shuttle (104) defining multiple exhaust shafts (140) arranged above the multiple flue risers (122), wherein an aggregate volume of a first exhaust shaft/riser pair (140-1, 122-1) differs from an aggregate volume of a second exhaust shaft/riser pair (140-2, 122-2). Such configuration at least partially compensates for different backpressures that would otherwise be experienced by flue gas exiting a shuttle kiln cavity (138) through different exhaust shafts (140), thereby improving uniformity of flue gas flow and reducing temperature variability within a kiln cavity (138).

The present invention relates to an oven comprising: —a first chamber and a second chambers, which are separated by separation means—conveyor means for guiding products from the inlet through these chambers to the outlet, —temperature control means for controlling the temperature and/or humidity in each chamber individually using a fluid, respectively, and—a passage in the separation means through which the conveyor means are directed from the first chamber to the second chamber.

A shuttle kiln according to certain aspects includes at least one flue channel and multiple flue risers in fluid communication with the flue channel, and at least one shuttle defining multiple exhaust shafts arranged above the multiple flue risers, wherein at least one radiation blockers is arranged above outlet ports of the at least one shuttle. Such a configuration blocks line-of-sight radiant heat transfer between (i) heated surfaces above the shuttle within the kiln housing and (ii) outlet ports of the exhaust shafts, thereby enhancing radiant heat retention and reducing temperature variability within a kiln cavity of the shuttle kiln.

A furnace for thermal treatment, in particular for carbonization and/or graphitization, of material, in particular fibers, in particular fibers of oxidized polyacrylonitrile PAN. During the thermal treatment, a pyrolysis gas is released from the material. The furnace includes a housing, a process space, which is located in the interior of the housing and is delimited by a process space housing and through which the material can be fed, a heating system for heating a process space atmosphere prevailing in the process space, and an extraction system for suctioning process space atmosphere laden with pyrolysis gas from the process space. The extraction system has at least one suction device having a suction channel, which is delimited by a channel wall and which is connected to the process space by means of a suction opening. The suction opening is arranged in a region of the process space in which, during operation of the furnace a temperature prevails at which no or only moderate chemical reactions occur between the pyrolysis gas and the process space housing and/or the channel wall.

A furnace working system includes a vacuumed pre-heating zone, a vacuumed gas heating zone disposed behind the pre-heating zone, a vacuumed electric heating zone, a high cooling zone disposed behind the electric heating zone, a low cooling zone disposed behind the high cooling zone, a conveyer disposed in the zones for transporting a work piece through the zones, a pipe couples the high cooling zone to the gas heating zone for supplying a heat from the high cooling zone to the gas heating zone, and a conduit couples the low cooling zone to the pre-heating zone for supplying a heat from the low cooling zone to the pre-heating zone. A transition zone is disposed between the gas heating zone and the electric heating zone.

An apparatus for calcining a secondary battery cathode material includes: a calcination furnace including an inner space that includes a temperature rising space, a temperature maintaining space, and a cooling space, which sequentially communicate; a plurality of rollers for transferring a sagger, in which a cathode material is accommodated, from the temperature rising space to the cooling space via the temperature maintaining space; a plurality of heaters arranged along the inner space; a plurality of gas feeding parts for feeding gas to the inner space; and a plurality of exhaust parts for exhausting gas from the inner space, wherein the cross-sectional area of the temperature maintaining space is smaller than the cross-sectional area of the temperature rising space and the cross-sectional area of the cooling space.