An inline thermal treatment system for thermally treating a continuous conductive product includes a first electrode configured to contact a continuous conductive product and a second electrode configured to contact the continuous conductive product such that a portion of the continuous conductive product is disposed between the first and second electrodes. The inline thermal treatment system includes a power source coupled to the first electrode and to the second electrode, wherein the power source is configured to apply an electrical bias between the first electrode and the second electrode to resistively heat the portion of the continuous conductive product disposed between the first and second electrodes.

A rapid thermal processing method and a rapid thermal processing device are provided. The rapid thermal processing method includes the following operations. A wafer is provided. A first heating operation is performed on the wafer to heat the wafer to a first temperature. The wafer is controlled to start rotating. The first temperature is maintained for a first predetermined time. A second heating operation is performed on the wafer to heat the wafer from the first temperature to a second temperature, and the second temperature is maintained for a second predetermined time. A third heating operation is performed on the wafer to heat the wafer from the second temperature to a third temperature, and the third temperature is maintained for a third predetermined time.

A method of controlling a production process includes illuminating a portion of a workpiece undergoing a production process with a light having a selected wavelength, processing a portion of the workpiece, capturing a digital image of the light reflecting from a surface of the workpiece with a digital camera, performing, with a processor, a specular reflectance analysis of the digital image, and adjusting a production process parameter based on the specular reflectance analysis.

Invention relates to a vertical ring shaft kiln comprising a vertical burning region (1); an intermediate sintering zone (Z.sub.3) surrounded by a first wall (10) and an opposite second wall (20) at the burning region (1) to obtain a clinker from a particulate raw material flowing downwards direction.

An inline thermal treatment system for thermally treating a continuous conductive product includes a first electrode configured to contact a continuous conductive product and a second electrode configured to contact the continuous conductive product such that a portion of the continuous conductive product is disposed between the first and second electrodes. The inline thermal treatment system includes a power source coupled to the first electrode and to the second electrode, wherein the power source is configured to apply an electrical bias between the first electrode and the second electrode to resistively heat the portion of the continuous conductive product disposed between the first and second electrodes.

A method for operating an annealing furnace to anneal a metal strip provides that, initially, at least one target material property (MP.sub.Target) is specified for a point or a section of the metal strip after passing through the annealing furnace. In addition, information (E) on the metal strip is provided before or in the annealing furnace. A calculation of a target temperature distribution (T.sub.Target) and/or a target speed (V.sub.Target) of the metal strip in the annealing furnace is then carried out with the assistance of a computer-aided model as a function of the target material properties and the specified information. The target temperature distribution and/or target speed calculated in this manner is/are subsequently set in the annealing furnace in order to transfer the material property of the metal strip behind the annealing furnace to the desired target material property MP.sub.Target.

A rapid thermal processing method and a rapid thermal processing device are provided. The rapid thermal processing method includes the following operations. A wafer is provided. A first heating operation is performed on the wafer to heat the wafer to a first temperature. The wafer is controlled to start rotating. The first temperature is maintained for a first predetermined time. A second heating operation is performed on the wafer to heat the wafer from the first temperature to a second temperature, and the second temperature is maintained for a second predetermined time. A third heating operation is performed on the wafer to heat the wafer from the second temperature to a third temperature, and the third temperature is maintained for a third predetermined time.

An apparatus for feeding and preheating a metal charge toward a melting furnace of a melting plant, comprising at least one conveyor channel for said metal charge, at least one hood disposed above said conveyor channel and scrap detection means able to identify the profile of the metal charge entering said conveyor channel. The present invention also concerns a plant for melting metal comprising said apparatus, and a method to feed and preheat a metal charge.

A cooler for cooling clinker of a cement production plant may include an aeration grate for conveying the clinker in a conveying direction, a ventilator for generating a cooling air flow that passes the aeration grate as a cross flow, and a measuring plane disposed above the aeration grate. The measuring plane may have a temperature measuring installation for ascertaining a temperature distribution in the measuring plane. The cooler may also include an open-loop/closed-loop control installation configured in an open loop/closed loop to control a conveying rate of the clinker and/or a flow rate of the cooling air flow as a function of the ascertained temperature distribution. Further, a corresponding method can be utilized to operate a cooler for cooling clinker.

The invention relates to a device and to a method for sensing a conveying rate at which liquid material is filled into a metallurgical target vessel (6) from a pivotable starting vessel (4). For this purpose, means for determining an amount of liquid material with which the initial vessel (4) has been filled and means for sensing an amount of the liquid material which is discharged toward the target vessel (6) or filled into the target vessel (6) by pivoting of the starting vessel (4) are provided.