Disclosed are a device and a method for measuring laser displacement. The device comprises an interferometric measurement module, a laser light source module, a signal modulation module, a control processing module and an optical vernier demodulation module. The control processing module controls the signal modulation module to apply a light source modulation signal to the laser light source module, so that the laser light source module provides two laser beams with fixed frequency difference to the interferometric measurement module. The control processing module controls the interferometric measurement module to perform interferometric measurement. During measurement, lasers respectively interfere in two Fabry-Perot cavities in the interferometric measurement module, and are detected by two photodetectors to form main and secondary measurement interference signals. The optical vernier demodulation module demodulates the main and secondary measurement interference signals obtained by the interferometric measurement module.

Measurement cavities described herein include a cylindrical chamber having a first open end and a second open end; a first cap covering the first open end of the cylindrical chamber and a second cap covering the second open end of the cylindrical chamber, wherein the first and second caps hermetically seal the cylindrical chamber and wherein the first cap is rigidly coupled to the second cap; and a wafer holder positioned within and coupled to the cylindrical chamber. The measurement cavity has a mass m, a stiffness k, and a damping constant c configured such that the transmissibility $.Math.\frac{x}{F}.Math.$
of an input force at 60 Hz in the measurement cavity is reduced by a factor of at least 10 and the measurement cavity has a natural frequency of greater than 300 Hz.

An apparatus and method are provided. The apparatus includes an imaging device; a stage movable relative to the imaging device; an isolation plate provided between the imaging device and the stage, including a horizontal glass plate; and a plurality of interferometers in electronic communication with a processor. The plurality of interferometers include three interferometers disposed on the imaging device, configured to direct a first beam set in a first direction toward the horizontal glass plate; and three interferometers disposed on the stage, configured to direct a second beam set in a second direction toward the horizontal glass plate, the second direction being opposite to the first direction. The processor is configured to measure distances between the imaging device and the isolation plate and distances between the stage and the isolation plate based on the first beam set and the second beam set reflected from the horizontal glass plate.

Multichannel optical coherence systems and methods involving optical coherence tomography (OCT) subsystems are operably and respectively connected to optical fibers of a multichannel optical probe, such that each optical fiber forms at least a distal portion of a sample beam path of a respective OCT subsystem. The optical fibers are in optical communication with distal optical elements such that external beam paths associated therewith are directed towards a common spatial region external to the housing. Image processing computer hardware is employed to process OCT signals obtained from the plurality of OCT subsystems to generate an OCT image dataset comprising a plurality of OCT A-scans and process the OCT image dataset to generate volumetric image data based on known positions and orientations of the external beam paths associated with the OCT subsystems.

A five-degree-of-freedom heterodyne grating interferometry system comprises: a single-frequency laser for emitting single-frequency laser light, the single-frequency laser light can be split into a reference light beam and a measurement light beam; an interferometer lens set and a measurement grating for converting the reference light and the measurement light into a reference interference signal and a measurement interference signal; and multiple optical fiber bundles respectively receiving the measurement interference signal and the reference interference signal, wherein each optical fiber bundle has multiple multi-mode optical fibers respectively receiving interference signals at different positions on the same plane. The system is not over-sensitive to the environment, is small and light, and is easy to arrange. Six-degree-of-freedom ultra-precision measurement can be achieved by arranging multiple five-degree-of-freedom interferometry systems and using redundant information, thereby meeting the needs of a lithography machine worktable for six-degree-of-freedom position and orientation measurement.

A method and a system for determining relative position of an element of an optical system of an assembly for processing or measuring an object along a measurement line, involve generating a measurement beam and a reference beam of low coherence optical radiation. The measurement and reference beams, alternately or in combination, have a main beam and a multiplexed additional beam. The measurement beam, led toward the element of the optical system, and back-reflected, is superimposed on the reference beam in a region of common incidence of an interferometric optical sensor arrangement. Position or frequency of a main interference fringe pattern and an additional interference fringe pattern is detected.

A digital measuring device implemented on a photonic integrated circuit, the digital measuring device including a laser source configured to provide light, a first ring resonator configured to produce a first frequency comb of light from the laser source, wherein at least a portion of the first frequency comb of light is directed at a moving object, a local oscillator configured to provide a reference beam, at least one waveguide structure configured to combine the reference beam with light reflected from the moving object to produce a measurement beam, a first multiplexer configured to split the measurement beam into a plurality of channels spaced in frequency, and a plurality of detectors configured to detect an intensity value of each channel of the plurality of channels to measure a distance between the digital measuring device and the moving object.

Component errors prevent linear photonic circuits from being scaled to large sizes. These errors can be compensated by programming the components in an order corresponding to nulling operations on a target matrix X through Givens rotations X.fwdarw.T.sup.†X, X.fwdarw.XT.sup.†. Nulling is implemented on hardware through measurements with feedback, in a way that builds up the target matrix even in the presence of hardware errors. This programming works with unknown errors and without internal sources or detectors in the circuit. Modifying the photonic circuit architecture can reduce the effect of errors still further, in some cases even rendering the hardware asymptotically perfect in the large-size limit. These modifications include adding a third directional coupler or crossing after each Mach-Zehnder interferometer in the circuit and a photonic implementation of the generalized FFT fractal. The configured photonic circuit can be used for machine learning, quantum photonics, prototyping, optical switching/multicast networks, microwave photonics, or signal processing.

A method for calibrating a mirror of an interferometer system configured to measure a position of an object using two interferometers of the interferometer system that are arranged at opposite sides of the object and configured to measure the position of the object in the same X-direction, wherein two sets of measurements are obtained for different rotational orientations about an axis perpendicular to the X-direction to determine a shape of the mirror. There is also provided a position measuring method in which the obtained shape of the mirror is used to adjust measurements in the X-direction, a lithographic apparatus and a device manufacturing method making use of such a lithographic apparatus.

A measurement device, for measuring the shape of an interface to be measured of an optical element having a plurality of interfaces, the device including: measurement apparatus with at least one interferometric sensor illuminated by a low-coherence source, for directing a measurement beam towards the optical element to pass through the plurality of interfaces, and to detect an interference signal resulting from interferences between the measured measurement beam reflected by the interface and a reference beam; positioning apparatus configured for relative positioning of a coherence area of the interferometric sensor at the level of the interface to be measured; digital processor for producing, based on the interference signal, an item of shape information of the interface to be measured according to a field of view.

A measurement method, for measuring the shape of an interface of an optical element having a plurality of interfaces is also provided.