A focus scan type imaging device for imaging a target object in a sample that induces aberration proposed. The device includes: a light source unit for emitting a beam; an optical interferometer for splitting the beam emitted from the light source into a sample wave and a reference wave, and providing an interference wave formed by interference between a reflection wave that is the sample wave reflected from the sample and the reference wave; a camera module for imaging the interference wave; a scanning mirror disposed on an optical path of the sample wave of the optical interferometer and configured to reflect the sample wave to cause the sample wave to scan the sample; a wavefront shaping modulator disposed on the optical path of the sample wave of the optical interferometer; and an imaging controller configured to operate in a phase map calculation mode and in an imaging mode.

The present invention provides a surface shape measuring device and a surface shape measuring method which do not require a physical reference plane and can improve measurement accuracy without using a mechanical adjustment mechanism. The illumination light condensing point P.sub.Q and the reference light condensing point P.sub.L are arranged as mirror images of each other with respect to the virtual plane VP, and each data of the object light O, being a reflected light of the spherical wave illumination light Q, and the inline spherical wave reference light L is recorded on each hologram. On the virtual plane VP, the reconstructed object light hologram h.sup.V for measurement is generated, and the spherical wave optical hologram s.sup.V representing a spherical wave light emitted from the reference light condensing point P.sub.L is analytically generated. The height distribution of the surface to be measured of the object 4 is obtained from the phase distribution obtained by dividing the reconstructed object light hologram h.sup.V by the spherical wave light hologram s.sup.V. High-accuracy surface shape measurement without requiring a reference plane such as a glass substrate is realized by comparing the phase data of the reflected light acquired from the surface to be measured and the phase distribution on the plane cut surface of the spherical wave obtained analytically.

The illumination light condensing point P.sub.Q and the reference light condensing point P.sub.L are arranged as mirror images of each other with respect to the virtual plane VP, and each data of the object light O, being a reflected light of the spherical wave illumination light Q, and the inline spherical wave reference light L is recorded on each hologram. On the virtual plane VP, the reconstructed object light hologram h.sup.V for measurement is generated, and the spherical wave optical hologram s.sup.V representing a spherical wave light emitted from the reference light condensing point P.sub.L is analytically generated. The height distribution of the surface to be measured of the object 4 is obtained from the phase distribution obtained by dividing the reconstructed object light hologram h.sup.V by the spherical wave light hologram s.sup.V.

The invention provides a method and apparatus for applying spatial filtering the optical beam of a free space optical coherence tomography (OCT) system substantially without problematic reflections back to the optical source. The invention teaches spatially filtering the reference beam of the OCT system which is typically designed to provide isolation of the optical source from undesirable optical feed-back, thereby achieving spatial filtering without generating undesirable reflections back to the optical source. Various embodiments are taught.

A displacement detection apparatus can reduce a measurement error even when a diffraction grating is displaced and/or tilted to a direction other than the measurement direction. A displacement detection apparatus includes a light source which emits light, a luminous flux-splitting section, a diffraction grating, a diffracted light-reflecting section, a correcting lens, a luminous flux-coupling section, and a light-receiving section. The diffracted light-reflecting section reflects a first luminous flux and a second luminous flux so as to be perpendicular to one of measuring planes of the diffraction grating and be parallel to each other. The correcting lens is arranged between the diffracted light-reflecting section and the diffraction grating.

A test appliance and a method for testing a mirror, e.g., a mirror of a microlithographic projection exposure apparatus. The test appliance has a computer-generated hologram (CGH), and a test can be carried out on at least a portion of the mirror by way of an interferometric superposition of a test wave that is directed onto the mirror by this computer-generated hologram and a reference wave. Here, the computer-generated hologram (CGH) (120, 320) is designed in such a way that, during operation of the appliance, it provides a first test wave for testing a first portion of the mirror (101, 301) by interferometric superposition with a reference wave in a first position of the mirror (101, 301) and at least a second test wave for testing a second portion of the mirror (101, 301) by interferometric superposition with a reference wave in a second position of the mirror (101, 301).

A method for characterising structures etched in a substrate, such as a wafer is disclosed. The method includes, for at least one structure, at least one interferometric measurement step, carried out with a low-coherence interferometer positioned on the top side of the substrate, for measuring with a measurement beam, at least one depth data relating to a depth of said HAR structure, wherein the method also includes a first adjusting step for adjusting a diameter, at the top surface, of the measurement beam according to at least one top-CD data relating to a width of said HAR structure. The invention further relates to a system implementing such a method.

A method for characterising structures etched in a substrate, such as a wafer is disclosed. The method includes at least one structure etched in the substrate, at least one imaging step including the following steps: capturing, with an imaging device positioned on a top side of said substrate, at least one image of a top surface of the substrate, and measuring a first data relating to the structure from at least one captured image, at least one interferometric measurement step, carried out with a low-coherence interferometer positioned on the top side, for measuring with a measurement beam positioned on the structure, at least one depth data relating to a depth of said structure; wherein the method also comprises a first adjusting step for adjusting said measurement beam according to the first data. A system implementing such a method is also disclosed.

Systems, apparatus and methods that modulate the phase inside the imaging system pupil aperture with a segmented deformable mirror, spatial light modulator (SLM), or liquid deformable lens (LDL) to produce minor perturbations in the point spread function (PSF) and create un-correlated speckle patterns between B-scans.

Exemplary apparatus and method are provided for illuminating a sample. With such exemplary apparatus and/or method, it is possible to, using at least one source arrangement, provide at least one first electro-magnetic radiation. Using an optical system of an optics arrangement, it is possible to receive the first electro-magnetic radiation(s), and modifying the at least one first electro-magnetic radiation to be at least one second electro-magnetic radiation so as to be forwarded to the sample. Further, with the optical system, it is possible to extend the at least one second electro-magnetic radiation into or across the sample for a distance of at least 2 times the Raleigh range of a Gaussian beam when the optics arrangement and the sample are stationary with respect to one another. Additionally, using the optical system, it is possible to control a placement of a focus of the at least one second electro-magnetic radiation on or in the sample.