Patent classifications
G01B9/02088
Method and system for measuring a surface of an object comprising different structures using low coherence interferometry
A method for measuring a surface of an object including at least one structure using low coherence optical interferometry, the method including the steps of acquiring an interferometric signal at a plurality of measurement points in a field of view and, for at least one measurement point, attributing the interferometric signal acquired to a class of interferometric signals from a plurality of classes, each of the classes being associated with a reference interferometric signal representative of a typical structure; and analysing the interferometric signal to derive therefrom an item of information on the structure at the measurement point, as a function of its class.
Optical coherence tomography (OCT) apparatus and OCT method for axial tracking and flattening
The present specification relates to Master-Slave (MS) interferometry for sensing the axial position of an object subject to optical coherence tomography (OCT) imaging, and to MS-OCT applied to curved and axially moving objects. The methods and apparatuses allow producing OCT signals from selected depths within the object irrespective of its axial position in respect to the imaging system. Images are obtained for curved objects that are flattened along a layer of interest in the object, images that are used to provide OCT angiography images less disturbed by axial movement or lateral scanning.
Measurement of properties of patterned photoresist
A method for optical inspection includes illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths, measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths, and based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.
Method and System for Regional Phase Unwrapping with Pattern-Assisted Correction
A wafer metrology system includes an interferometer sub-system and a controller. The interferometer sub-system is configured to generate an interferogram with an intensity map that corresponds to a modulated representation of a wafer surface. Further, the interferometer sub-system includes a detector configured to capture the interferogram. The controller includes one or more processors configured to generate a wrapped phase map of the interferogram, define patterns associated with features on the wafer, and correct phase discontinuities by applying a phase unwrapping procedure to the wrapped phase map to generate an unwrapped phase map and correcting phase discontinuities in the unwrapped phase map based on the patterns, or by combining phase unwrapping and correction in a unified step. Further, the patterns comprise two or more structures such that a portion of the unwrapped phase map associated with structures of the same type is continuous across borders separating structures of the same type.
MEASUREMENT OF PROPERTIES OF PATTERNED PHOTORESIST
A method for optical inspection includes illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths, measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths, and based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.
METHOD AND SYSTEM FOR MEASURING A SURFACE OF AN OBJECT COMPRISING DIFFERENT STRUCTURES USING LOW COHERENCE INTERFEROMETRY
A method for measuring a surface of an object including at least one structure using low coherence optical interferometry, the method including the following steps: acquiring an interferometric signal at a plurality of points, called measurement points, of the surface in a field of view; for at least one measurement point: attributing the interferometric signal acquired to a class of interferometric signals from a plurality of classes, each class being associated with a reference interferometric signal representative of a typical structure; and analysing the interferometric signal to derive therefrom an item of information on the structure at the measurement point, as a function of its class.
A measuring system implementing the present method is also provided.
METHOD AND SYSTEM FOR MEASURING A SURFACE OF AN OBJECT COMPRISING DIFFERENT STRUCTURES USING LOW COHERENCE INTERFEROMETRY
A method and related system for measuring a surface of a substrate including at least one structure using low coherence optical interferometry, the method being implemented with a system having an interferometric device, a light source, an imaging sensor, and a processing module, and including: —acquiring, with the imaging sensor, an interferometric signal formed by the interferometric device between a reference beam and a measurement beam reflected by the surface at a plurality of measurement points in a field of view; the following steps being carried out by the processing module: classifying, by a learning technique, the acquired interferometric signals according to a plurality of classes, each class being associated with a reference interferometric signal representative of a typical structure; and analysing the interferometric signals to derive therefrom information on the structure at the measurement points, as a function of the class of each interferometric signal.
Measurement device employing color appearing due to interference of white light, system, and program
A device including: a storage section that stores information for measuring a light path difference of two light paths relating to interference of a white light, from a color appearing due to the interference; and a calculation section that measures, from an image configured by a plurality of pixels each including information representing a color, the light path difference relating to each of the pixels, based on at least the information stored in the storage section.
OPTICAL COHERENCE TOMOGRAPHY (OCT) APPARATUS AND OCT METHOD FOR AXIAL TRACKING AND FLATTENING
The present specification relates to Master-Slave (MS) interferometry for sensing the axial position of an object subject to optical coherence tomography (OCT) imaging, and to MS-OCT applied to curved and axially moving objects. The methods and apparatuses allow producing OCT signals from selected depths within the object irrespective of its axial position in respect to the imaging system. Images are obtained for curved objects that are flattened along a layer of interest in the object, images that are used to provide OCT angiography images less disturbed by axial movement or lateral scanning.
MEASUREMENT DEVICE EMPLOYING COLOR APPEARING DUE TO INTERFERENCE OF WHITE LIGHT, SYSTEM, AND PROGRAM
A device including: a storage section that stores information for measuring a light path difference of two light paths relating to interference of a white light, from a color appearing due to the interference; and a calculation section that measures, from an image configured by a plurality of pixels each including information representing a color, the light path difference relating to each of the pixels, based on at least the information stored in the storage section.