Patent classifications
G01C19/5733
MICROELECTROMECHANICAL DEVICE WITH OUT-OF-PLANE STOPPER STRUCTURE
A microelectromechanical device includes a substrate, a first structural layer, and a second structural layer of semiconductor material. A sensing mass extends in the first structural layer and is coupled to the substrate by first elastic connections to enable oscillation of the sensing mass in a sensing direction perpendicular to the substrate by a maximum amount relative to a resting position of the sensing mass. An out-of-plane stopper structure includes an anchorage fixed to the substrate and a mechanical end-of-travel structure, which extends in the second structural layer, faces the sensing mass, and is separated therefrom by a gap having a width smaller than the maximum displacement distance of the sensing mass. The mechanical end-of-travel structure is coupled to the anchorage by second elastic connections that enable movement of the mechanical end-of-travel structure in the sensing direction in response to an impact of the sensing mass.
MEMS INERTIAL SENSOR WITH HIGH RESILIENCE TO THE PHENOMENON OF STICTION
A MEMS inertial sensor includes a supporting structure and an inertial structure. The inertial structure includes at least one inertial mass, an elastic structure, and a stopper structure. The elastic structure is mechanically coupled to the inertial mass and to the supporting structure so as to enable a movement of the inertial mass in a direction parallel to a first direction, when the supporting structure is subjected to an acceleration parallel to the first direction. The stopper structure is fixed with respect to the supporting structure and includes at least one primary stopper element and one secondary stopper element. If the acceleration exceeds a first threshold value, the inertial mass abuts against the primary stopper element and subsequently rotates about an axis of rotation defined by the primary stopper element. If the acceleration exceeds a second threshold value, rotation of the inertial mass terminates when the inertial mass abuts against the secondary stopper element.
MEMS gyroscope control circuit
A microelectromechanical system (MEMS) gyroscope includes a driving mass and a driving circuit that operates to drive the driving mass in a mechanical oscillation at a resonant drive frequency. An oscillator generates a system clock that is independent of and asynchronous to the resonant drive frequency. A clock generator circuit outputs a first clock and a second clock that are derived from the system clock. The drive loop of the driving circuit including an analog-to-digital converter (ADC) circuit that is clocked by the first clock and a digital signal processing (DSP) circuit that is clocked by the second clock.
MEMS gyroscope control circuit
A microelectromechanical system (MEMS) gyroscope includes a driving mass and a driving circuit that operates to drive the driving mass in a mechanical oscillation at a resonant drive frequency. An oscillator generates a system clock that is independent of and asynchronous to the resonant drive frequency. A clock generator circuit outputs a first clock and a second clock that are derived from the system clock. The drive loop of the driving circuit including an analog-to-digital converter (ADC) circuit that is clocked by the first clock and a digital signal processing (DSP) circuit that is clocked by the second clock.
Semiconductor structure and manufacturing method thereof
A semiconductor structure includes a substrate; a sensing device disposed over the substrate and including a plurality of protruding members protruded from the sensing device; a sensing structure disposed adjacent to the sensing device and including a plurality of sensing electrodes protruded from the sensing structure towards the sensing device; and an actuating structure disposed adjacent to the sensing device and configured to provide an electrostatic force on the sensing device based on a feedback from the sensing structure. Further, a method of manufacturing the semiconductor structure is also disclosed.
Rotation-rate sensor, method for producing a rotation-rate sensor
A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater extension in the first main-extension-direction than in the second main-extension-direction.
Rotation-rate sensor, method for producing a rotation-rate sensor
A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater extension in the first main-extension-direction than in the second main-extension-direction.
Sensor and electronic device
According to one embodiment, a sensor includes a sensor part. The sensor part includes a supporter and a movable part. The movable part includes a movable member located around the supporter in a first plane, and a plurality of structure members located between the supporter and the movable member. The structure members have bent shapes. The structure members connect the movable member with the supporter. The movable member is capable of vibrating. The movable part has the supporter as a center of rotational symmetry. The movable part has a plurality of mirror planes. The mirror planes pass through the center of the rotational symmetry and cross the first plane.
Sensor and electronic device
According to one embodiment, a sensor includes a sensor part. The sensor part includes a supporter and a movable part. The movable part includes a movable member located around the supporter in a first plane, and a plurality of structure members located between the supporter and the movable member. The structure members have bent shapes. The structure members connect the movable member with the supporter. The movable member is capable of vibrating. The movable part has the supporter as a center of rotational symmetry. The movable part has a plurality of mirror planes. The mirror planes pass through the center of the rotational symmetry and cross the first plane.
Three-axis microelectromechanical system (MEMS) gyroscope
A three-axis microelectromechanical system (MEMS) gyroscope includes four proof masses, where the proof masses are connected by spring beams and/or rigid beams; a first proof mass is configured to move in an X-axis direction; a second proof mass is configured to rotate around an X-direction axis, a Y-direction axis, and a Z-direction axis, and when the first proof mass moves in the X-axis direction, the second proof mass is driven to rotate around the Z-direction axis; a third proof mass is configured to move in the X-axis direction and a Y-axis direction, and when the first proof mass moves in the X-axis direction, the third proof mass is driven to move in the Y-axis direction; a fourth proof mass is configured to move in the X-axis direction, and when the third proof mass moves in the X-axis direction, the fourth proof mass is driven to move in the X-axis direction.