In a substrate processing system according to an exemplary embodiment, gas supply units are configured to supply gases to chambers through first gas flow channels thereof, respectively. Chamber pressure sensors are configured to measure pressures in the chambers. A second gas flow channel is connected to the first gas flow channel of each of the gas supply units. A reference pressure sensor is configured to measure a pressure in the second gas flow channel. In a method according to an exemplary embodiment, each of the chamber pressure sensors is calibrated by using a measurement value thereof and a measurement value of the reference pressure sensor which are obtained in a state where pressures in a corresponding chamber, the first gas flow channel of a corresponding gas supply unit, and the second gas flow channel are maintained.

Gas meters are provided including a housing and a pressure regulator integrated with the housing. The pressure regulator is configured to adjust pressure of gas flowing through the gas meter responsive to a signal from a remote location or automatically based on a predetermined pressure threshold programmed into the gas meter.

A flow meter for measuring a flow rate of a fluid may include a cartridge containing certain components such as a flow sensor. The cartridge is removable from the flow meter such that it may be replaced with a new cartridge, allowing calibration of the flow meter while enabling the flow meter to continue to be operated with another cartridge in the place of the removed cartridge. The flow meter may be configured to direct fluid flow away from selected components of the flow meter.

Gas meter includes shutoff valve, return unit, flow rate measurer, display, communication unit that communicates with an outside, controller, area information setting unit, and area information comparator. The gas meter compares, by area information comparator, a preset area information held in area information setting unit with a specified value of area information added to a remote shutoff instruction received by communication unit, and when the preset area information and the specified value of the added area information match, shutoff valve is closed.

Gas meter includes shutoff valve, return unit, flow rate measurer, display, communication unit that communicates with an outside, controller, area information setting unit, and area information comparator. The gas meter compares, by area information comparator, a preset area information held in area information setting unit with a specified value of area information added to a remote shutoff instruction received by communication unit, and when the preset area information and the specified value of the added area information match, shutoff valve is closed.

Gas meters are provided including a housing and a pressure regulator integrated with the housing. The pressure regulator is configured to adjust pressure of gas flowing through the gas meter responsive to a signal from a remote location or automatically based on a predetermined pressure threshold programmed into the gas meter.

The invention relates to a device and method for measuring the flow rate of a liquid flowing in a flow duct, from upstream to downstream, in which: a shutter member (4) is able to close/open said flow duct (3), a deformable membrane (5) obstructs an opening (6) made through the wall of said flow duct and situated upstream of said shutter member, and an electronic device (100) comprises a detection means (101) that detects deformations of said deformable membrane (5) and is able to deliver deformation signals, a means (112) that controls said shutter member (4), a means (112) that takes readings of the values of at least two deformation signals that are separated by a predetermined time period, established when the solenoid valve (4) is closed, and a calculation means that calculates a liquid volume depending on the read deformation signals and in order to calculate a flow rate depending on said calculated volume and the predetermined time period.

Disclosed is a method of inspecting a flow rate measuring system used in a substrate processing system. The flow rate measuring system provides a gas flow path used for calculating a flow rate in a build-up method. A gas output by a flow rate controller of a gas supply unit of the substrate processing system may be supplied to the gas flow path. In the method, apart from a previously obtained initial value of a volume of the gas flow path, a volume of the gas flow path is obtained at the time of inspection of the flow rate measuring system. Then, the obtained volume is compared to the initial value.

In a substrate processing system according to an exemplary embodiment, gas supply units are configured to supply gases to chambers through first gas flow channels thereof, respectively. Chamber pressure sensors are configured to measure pressures in the chambers. A second gas flow channel is connected to the first gas flow channel of each of the gas supply units. A reference pressure sensor is configured to measure a pressure in the second gas flow channel. In a method according to an exemplary embodiment, each of the chamber pressure sensors is calibrated by using a measurement value thereof and a measurement value of the reference pressure sensor which are obtained in a state where pressures in a corresponding chamber, the first gas flow channel of a corresponding gas supply unit, and the second gas flow channel are maintained.

A gas sampling mechanism protecting an odor sensor and permeable membrane against direct exposure to the gas molecules of an external environment provides a one-way airflow, and includes an inlet chamber, a pump chamber connected to the inlet chamber, and a pump assembly connected to the pump chamber. The pump chamber can compress or evacuate air inside the pump chamber. An inlet valve is moveably arranged between the inlet chamber and the pump, and an outlet valve is movably arranged between the pump chamber and the ambient.