The present disclosure relates to a sitting toilet type uroflowmeter apparatus. The sitting toilet type uroflowmeter apparatus according to the present disclosure includes a toilet main body having a water collecting tank; a seat part that is positioned above the toilet main body and that is rotatable; and a uroflow sensor that is positioned on a bottom surface of the water collecting tank and that measures a flux over time.

Various embodiments of the present disclosure are directed to measuring methods for determining a flow rate of a process gas, contained in a gas pressure vessel charged with overpressure, escaping from the gas pressure vessel. In one example embodiment, the method includes: exerting a vessel weight force from the gas pressure vessel together with the contained process gas; compensating for the vessel weight force by means of a counterweight force exerted by a counterweight, or the counterweight force by means of the vessel weight force exerted by the counterweight, at least partially to a resultant measured weight force; determining the measured weight force at at least two points in time; and determining the flow rate of the process gas using the measured weight force determined at the at least two points in time.

System and methods for applying a liquid coating to a substrate are disclosed herein. One exemplary method includes a flow control routine in which the velocity of an applicator, or other parameter affecting the amount of material applied to the substrate, is iteratively adjusted. The amount of the adjustment performed in each iteration is tracked. When the sum of the adjustments by the flow control routine exceeds a predetermined threshold, a fan width control routine is initiated in which the fan width of the stream of material applied by the applicator is adjusted.

A system and method including a weighing scale configured to measure a starting weight at a start time of a vaporizer chamber with a vaporizable liquid, the weighing scale configured to measure an ending weight at an end time and a controller configured to determine a vapor flow rate out of the vaporizer chamber based on a difference between the start time and the end time.

A method of displaying a predicted state of a medical apparatus, and a medical apparatus employing the method are disclosed. The method comprises receiving a sensor signal from a sensor of the medical apparatus, filtering the sensor signal by an adaptive filter such that a predicted signal is achieved, determining a state from the predicted signal, and displaying an indication through a user interface of the medical apparatus based on the determined state.

A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.

This invention relates generally to injection remediation systems and methods. In one embodiment, an injection remediation system includes, but is not limited to, at least one reservoir configured to contain material; at least one load sensor supporting the at least one reservoir; at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material; and at least one processor configured to determine an amount of the material sourced from the at least one reservoir based at least partly on weight information obtained from the at least one load sensor.

A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.

A brewing guide device is provided. The brewing guide device includes a communication device, a processing device, and a display device. The communication device obtains real-time weight information and real-time time information from an electronic scale. In a first brewing stage, the processing device determines whether the flow rate is higher than, equal to or lower than a first threshold according to the real-time weight information and the real-time time information to generate a first display instruction. According to the first instruction, the display device displays a first water line corresponding to the real-time weight information, a first target line corresponding to the first brewing stage, and a first display pattern corresponding to a first display block below the first target line on a display interface, wherein the level of the first water line is lower than or equal to the first target line.

This invention relates generally to injection remediation systems and methods. In one embodiment, an injection remediation system includes, but is not limited to, at least one reservoir configured to contain material; at least one load sensor supporting the at least one reservoir; at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material; and at least one processor configured to determine an amount of the material sourced from the at least one reservoir based at least partly on weight information obtained from the at least one load sensor.