Patent classifications
G01J1/0418
Laser Irradiation Apparatus, Laser Irradiation Method, and Recording Medium Recording Program to be Readable
A laser irradiation apparatus including a laser light source includes a first detection unit and a second detection unit configured to detect luminance of a substrate irradiated with laser light from the laser light source, and a control unit configured to perform control related to laser light emitted from the laser light source, in which the control unit specifies an energy density of laser light based on luminance detected by the first detection unit, specifies reference luminance based on a specified energy density and luminance detected by the second detection unit, and changes an energy density of laser light according to the reference luminance and luminance detected by the second detection unit.
SYSTEMS AND METHODS FOR FLASH DETECTION
A flash detection device comprises at least a first and a second sensor module, wherein each of the sensor modules comprises at least a photodiode for detecting an irradiance emitted by a source, and the first sensor module comprises at least an angular efficiency attenuator configured for attenuating the irradiance received by the photodiode according to a predetermined angular efficiency profile, wherein the at least first and second sensor modules are configured for collecting light from substantially the same field of view, and the angular efficiency attenuator of the first sensor module causes the first and second sensor modules to have complementary predetermined angular efficiency profiles, so that, for angles of view within a common field of view of the first and second sensor modules, a combination of irradiance measurements of the first and second sensor modules enables to derive an irradiance source angle of the source.
Image processing method for light emitting device
An image processing method includes the steps of lighting up at least a part of light emitting units of a light emitting device; capturing a plurality of detection images corresponding to a plurality of sections of the light emitting device respectively, wherein each section includes a plurality of lighted-up light emitting units, each detection image includes a plurality of light spots respectively corresponding to the light emitting units of the associated section, and every two adjacent sections have an overlap area including at least one lighted-up light emitting unit; and stitching the detection images of the adjacent sections together by taking the light spots corresponding to at least one lighted-up light emitting unit of the overlap area as alignment reference spots, so that the light emitting statuses of all the light emitting units are presented by a single image.
OPTICAL SENSING DEVICE AND ELECTRONIC APPARATUS HAVING THE SAME
An optical sensing device includes a substrate, a sensing element layer, a light-shielding layer, and a light absorbing layer. The substrate has a first surface and a second surface opposite to each other. The sensing element layer is disposed on the first surface and includes multiple sensing elements. The light-shielding layer is disposed on the sensing element layer and has multiple openings. An orthogonal projection of the opening on the substrate overlaps an orthogonal projection of the sensing element on the substrate. The light absorbing layer is disposed on the second surface. An electronic apparatus including the optical sensing device is also provided.
Automatic analysis apparatus and method for controlling automatic analysis apparatus
[Task] To provide an automatic analysis apparatus including a photomultiplier tube which controls a sensitivity of the photomultiplier tube without adjusting a high voltage value. [Solution] An automatic analysis apparatus according to the present invention includes a photomultiplier tube which detects light from a reaction vessel; a determination unit which determines an output signal of the photomultiplier tube in a case where the photomultiplier tube is irradiated with first light; and a control unit which irradiates the photomultiplier tube with second light to lower a sensitivity of the photomultiplier tube in accordance with a determination result by the determination unit.
OPTICAL DETECTOR INCLUDING PLASMONIC METASURFACES AND BULK ACOUSTIC WAVE RESONATORS
An apparatus for an optical detector includes a bulk acoustic wave (BAW) resonator including a piezoelectric layer and a metal layer, an acoustic Bragg mirror on the BAW resonator and including a first acoustic impedance layer and a second acoustic impedance layer different than the first acoustic impedance layer, and a plasmonic metasurface on the acoustic Bragg mirror and including structures of geometric patterns arranged in an array.
LASER OUTPUT LIMITING DEVICE
The present invention relates to a device and a method for limiting the output of a laser, wherein a reflecting device arranged in the optical path of a laser beam comprises a switching layer which comprises or consists of a material exhibiting a metal-insulator transition and a reflecting layer which is positioned downstream of the switching layer in the optical path of the laser beam, wherein the reflecting device is configured such that an output of the laser beam when it is incident upon the reflecting device which exceeds a predefined threshold causes a change in the refractive index of the material in the switching layer, and the output of the laser beam reflected by the reflecting device is thus reduced as compared to the output of the laser beam when it is incident upon the reflecting device due to reduced reflection by the reflecting device.
SELF-ADAPTIVE ELECTROMAGNETIC ENERGY ATTENUATOR
Aspects of embodiments pertain to a sensing systems configured to receive scene electromagnetic (EM) radiation comprising a first wavelength (WL1) range and a second wavelength (WL2) range. The sensing system comprises at least one spectral filter configured to filter the received scene EM radiation to obtain EM radiation in the WL1 range and the WL2 ranges; and a self-adaptive electromagnetic (EM) energy attenuating structure. The self-adaptive EM energy attenuating structure may comprise material that includes nanosized particles which are configured such that high intensity EM radiation at the WL1 range incident onto a portion of the self-adaptive EM energy attenuating structure causes interband excitation of one or more electron-hole pairs, thereby enabling intraband transition in the portion of the self-adaptive EM energy attenuating structure by EM radiation in the WL2 range.
Sky luminance mapping system and mapping method
A sky luminance mapping system includes a camera unit, two pyranometer units and a processing unit. Camera unit includes a fisheye lens to shoot image of sky dome and is equipped with light-shading devices which block the sun from the camera unit corresponding to instant location of the sun at instant time. First pyranometer unit measures daylight illuminance from the sky dome and outputs first intensity signal while the light-shading device is applied to block the sun. Second pyranometer unit measures daylight illuminance from the sky dome and outputs second intensity signal without blocking the sun. A reference intensity value is obtained by subtracting a value of the first intensity signal from a value of the second intensity signal. According to the value of the first intensity signal and the reference intensity value, a total luminance of and the luminance distribution in the image of the sky dome are corrected.
Lithographic method
- Andrey Alexandrovich Nikipelov ,
- Olav Waldemar Vladimir FRIJNS ,
- Gosse Charles De Vries ,
- Erik Roelof Loopstra ,
- Vadim Yevgenyevich Banine ,
- Pieter Willem Herman De Jager ,
- Rilpho Ludovicus Donker ,
- Han-Kwang NIENHUYS ,
- Borgert Kruizinga ,
- Wouter Joep Engelen ,
- Otger Jan Luiten ,
- Johannes Antonius Gerardus Akkermans ,
- Leonardus Adrianus Gerardus Grimminck ,
- Vladimir Litvinenko
A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.