Window controller systems and methods are disclosed herein. In some embodiments, a window controller system for controlling multiple optically switchable devices comprises a printed circuit board comprising a first plurality of footprints to which a first plurality of components is mounted and a second plurality of footprints, wherein a subset of the second plurality of footprints is populated by a second plurality of components. The first plurality of components may comprise: a plurality of insulated glass unit (IGU) controllers, each configured to control an IGU of a corresponding plurality of IGUs operatively coupled to the window controller system; and a processing unit configured to control each of the plurality of IGU controllers. The second plurality of components may be selected based on a cable type and/or a protocol type used to provide power and data signals to the printed circuit board.

A laser irradiation apparatus including a laser light source includes a first detection unit and a second detection unit configured to detect luminance of a substrate irradiated with laser light from the laser light source, and a control unit configured to perform control related to laser light emitted from the laser light source, in which the control unit specifies an energy density of laser light based on luminance detected by the first detection unit, specifies reference luminance based on a specified energy density and luminance detected by the second detection unit, and changes an energy density of laser light according to the reference luminance and luminance detected by the second detection unit.

Methods and systems for controlling tintable windows based on cloud detection.

The optical control apparatus includes a light source, a light collecting section, and an optical path control section. The light source emits light. The light collecting section collects the light emitted from the light source and illuminates the light onto an object.

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

The present invention relates to an apparatus for detecting photons according to an atmospheric condition, using a function of adjusting light quantity that can significantly improve reliability of an atmospheric condition analysis result by minimizing noise in a spectrum by maintaining the quantity of incident light uniform within a predetermined range regardless of atmospheric conditions and changes, and to a method of adjusting light quantity. The apparatus for detecting photons in accordance with atmospheric conditions using a function of adjusting light quantity includes: an apparatus case having a light inlet; a light quantity adjuster disposed under the light inlet and adjusting quantity of incident light such that a predetermined quantity of light travels inside; and a controller controlling operation of the light quantity adjuster in accordance with intensity of light detected by the light quantity adjuster.

The present invention relates to an apparatus for detecting photons according to an atmospheric condition, using a function of adjusting light quantity that can significantly improve reliability of an atmospheric condition analysis result by minimizing noise in a spectrum by maintaining the quantity of incident light uniform within a predetermined range regardless of atmospheric conditions and changes, and to a method of adjusting light quantity. The apparatus for detecting photons in accordance with atmospheric conditions using a function of adjusting light quantity includes: an apparatus case having a light inlet; a light quantity adjuster disposed under the light inlet and adjusting quantity of incident light such that a predetermined quantity of light travels inside; and a controller controlling operation of the light quantity adjuster in accordance with intensity of light detected by the light quantity adjuster.

A laser projection system having built-in safety systems is disclosed. Further disclosed is a method of operating a laser projection system such that safe operation is a factor only of meeting a threshold distance between the laser unit and an audience member. To accomplish safe operation at the threshold distance, the laser projection system is pre-calibrated to operate below maximum permitted exposure levels at the threshold distance. In this manner of operation, laser lighting can be accomplished by non-laser professionals without the complexity, external sensors, and need for calibration at the venue.

A laser projection system having built-in safety systems is disclosed. Further disclosed is a method of operating a laser projection system such that safe operation is a factor only of meeting a threshold distance between the laser unit and an audience member. To accomplish safe operation at the threshold distance, the laser projection system is pre-calibrated to operate below maximum permitted exposure levels at the threshold distance. In this manner of operation, laser lighting can be accomplished by non-laser professionals without the complexity, external sensors, and need for calibration at the venue.