Patent classifications
G01L1/183
Force measurement device for measuring low-frequency force and high-frequency force
The disclosure relates to a force measurement device including central portion, fixing portion, first and second sensing portions, and first and second electromechanical elements. The first sensing portion has first natural frequency. The first sensing portion is connected to the central portion. The second sensing portion has a second natural frequency. The second sensing portion is connected to the first sensing portion and the fixing portion. The first electromechanical element is disposed on the first sensing portion to measure a first vibration amplitude. The second electromechanical element is disposed on the second sensing portion to measure a second vibration amplitude. When the central portion is subjected to a first force, the first vibration amplitude is larger than the second vibration amplitude. When the central portion is subjected to a second force, the first vibration amplitude is smaller than the second vibration amplitude.
JOINING TWO COMPONENTS OF A FIELD DEVICE FOR PROCESSING AND AUTOMATION TECHNOLOGY
A field device for processing and automation technology includes a first and a second component that can each be mechanically connected at a joining surface by means of a joining point. Two metal surface layers are each applied at least to the joining surface of the first component and the joining surface of the second component. The metal of the surface layers is different from the metal of the first and/or the metal of the second component. A joining material is applied between the respective joining surfaces of the two components, wherein the joining material includes particles at least partially consisting of a metal that corresponds with the metal of the surface layers The joining of the two components occurs at a joining temperature below 300° C.
Apparatus for sensing an elastic deformation of a hollow element
An apparatus for sensing an elastic deformation of a hollow element, wherein the apparatus comprises at least one sensor that is arranged in a watertight capsule which is connected in a watertight manner to a connector device comprising at least one watertight electrical connector that is electrically connected to the at least one sensor, the at least one watertight electrical connector forming a first waterproof barrier of the connector device between an outside of the watertight capsule and the at least one sensor, and wherein the connector device comprises at least one further waterproof barrier that is formed between the first waterproof barrier and the at least one sensor.
MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION AND PIEZORESISTIVE SENSING HAVING SELF-CALIBRATION PROPERTIES
A microelectromechanical mirror device has, in a die of semiconductor material: a fixed structure defining a cavity; a tiltable structure carrying a reflecting region elastically suspended above the cavity; at least a first pair of driving arms coupled to the tiltable structure and carrying respective piezoelectric material regions which may be biased to cause a rotation thereof around at least one rotation axis; elastic suspension elements coupling the tiltable structure elastically to the fixed structure and which are stiff with respect to movements out of the horizontal plane and yielding with respect to torsion; and a piezoresistive sensor configured to provide a detection signal indicative of the rotation of the tiltable structure. At least one test structure is integrated in the die to provide a calibration signal indicative of a sensitivity variation of the piezoresistive sensor in order to calibrate the detection signal.
Systems and methods for non-destructive evaluation of optical material properties and surfaces
System and methods are provided for characterizing an internal surface of a lens using interferometry measurements. Sphere-fitting a distorted radius determines distorted pathlengths. Ray-tracing simulates refraction at all upstream surfaces to determine a cumulative path length. A residual pathlength is scaled by the group-index and rays are propagated based on the phase-index. After aspheric surface fitting, a corrected radius is determined. To estimate a glass type for the lens, a thickness between focal planes of the lens surfaces is determined using RCM measurements. Then, for both surfaces, the surface is positioned into focus, interferometer path length matching is performed, a reference arm is translated to stationary phase point positions for three wavelengths to determine three per-color optical thicknesses, and ray-tracing is performed. A glass type is identified by minimizing an error function based on optical parameters of the lens and parameters determined from known glass types from a database.
Fixing device and method for manufacturing such a device
Fixing device comprising a fixing member provided with a bearing head, a sensor provided with a detector of the mechanical force to which the fixing member is subjected, the detector being mounted in contact with the fixing member, and a connecting component which is electrically connected to the sensor, which is configured to transmit a measurement of a mechanical force provided by the sensor and which is mounted on the fixing member, the fixing member comprising a body which is mounted on the bearing head and which extends along a longitudinal axis protruding from the bearing head.
HIGHLY SENSITIVE RESONANT FORCE SENSOR WITH A TEST BODY AND AT LEAST ONE RESONANT ELEMENT DECOUPLED AND EACH DISPOSED IN A SUITABLE ENVIRONMENT
A force sensor including a support, a test body, two strain gauges, mechanical transmission means between the test body and the strain gauges so that a movement of the test body applies a strain onto the strain gauges in a first direction of the plane of the sensor, the transmission means being hinged relative to the support about a second direction in the plane of the sensor, the test body being accommodated within a first volume, the strain gauges being accommodated within a second volume, insulated by sealed insulation means. The sensor includes a sacrificial layer, a nanometric layer, a protective layer and a micrometric layer. The test body and at least one portion of the support are formed in the substrate, the sealed insulation means are partially formed by the nanometric layer and by the sacrificial layer, and the strain gauges are formed in the nanometric layer.
DEVICE AND METHOD FOR ESTIMATING A LOAD IN A BEARING
Disclosed is a device for estimating a load in a bearing, including a receiving unit for receiving a sensor signal waveform. The sensor signal waveform is provided by at least one sensor probe arranged at the bearing. The at least one sensor probe is configured to measure a displacement and/or strain of the bearing. The sensor signal waveform is a product of a carrier waveform and a load waveform, and an electronic control unit configured for processing the received measured sensor signal waveform, by determining a rolling element frequency from the measured sensor signal waveform, determining the carrier waveform based on the determined rolling element frequency and the measured sensor signal waveform, determining the load waveform based on determined carrier waveform and the measured sensor signal waveform, and estimating the load in the bearing from the determined load waveform.
RESONATOR AND METHOD OF MANUFACTURING THE RESONATOR, AND STRAIN SENSOR AND SENSOR ARRAY INCLUDING THE RESONATOR
Provided are a resonator, a method of manufacturing the resonator, and a strain sensor and a sensor array including the resonator. The resonator is provided to extend in a lengthwise direction from a support. The resonator includes a single crystal material and is provided to extend in a crystal orientation that satisfies at least one from among a Young's modulus and a Poisson's ratio, from among crystal orientations of the single crystal material.
Force sensing with an electromagnetic load
A system for performing force sensing with an electromagnetic load may include a signal generator configured to generate a signal for driving an electromagnetic load and a processing subsystem configured to monitor at least one operating parameter of the electromagnetic load and determine a force applied to the electromagnetic load based on a variation of the at least one operating parameter.