A biological component measurement apparatus includes an optical medium, a high thermal conductive film, an excitation light source, a probe light source, and a light position detector. The high thermal conductive film is higher in thermal conductivity than the optical medium, and is provided on a sample placement surface of the optical medium. The high thermal conductive film spreads heat generated from the sample irradiated with excitation light more in a first direction than in a second direction. The first direction is a traveling direction of probe light in plan view of the sample placement surface. The second direction is a direction orthogonal to the first direction in plan view of the sample placement surface.

A biological component measurement apparatus includes an optical medium, a high thermal conductive film, an excitation light source, a probe light source, and a light position detector. The high thermal conductive film is higher in thermal conductivity than the optical medium, and is provided on a sample placement surface of the optical medium. The high thermal conductive film spreads heat generated from the sample irradiated with excitation light more in a first direction than in a second direction. The first direction is a traveling direction of probe light in plan view of the sample placement surface. The second direction is a direction orthogonal to the first direction in plan view of the sample placement surface.

Disclosed are dielectric cavity arrays with cavities formed by pairs of dielectric tips, wherein the cavities have low mode volume (e.g., 7*10.sup.−5λ.sup.3, where X is the resonance wavelength of the cavity array), and large quality factor Q (e.g., 10.sup.6 or more). Applications for such dielectric cavity arrays include, but are not limited to, Raman spectroscopy, second harmonic generation, optical signal detection, microwave-to-optical transduction, and as light emitting devices.

The present disclosure describes a differential refractometer for gradient chromatography. In an exemplary embodiment, the differential refractometer includes a solvent delay volume, an eluent flow meter coupled to an eluent inlet of a sample cell, a solvent flow regulator coupled to an outlet of the solvent delay volume and coupled to a solvent inlet of a reference cell, an instrument controller configured to receive the eluent flow rate from the eluent flow meter, configured to receive the solvent flow rate from the solvent flow regulator, configured to receive a flow rate ratio from a flow rate ratio data source, wherein the flow rate ratio indicates a ratio of the eluent flow rate to the solvent flow rate, and an optical bench configured to measure a difference between a refractive index of the eluent present in the sample cell and a refractive index of the solvent present in the reference cell.

A method for manufacturing glass-based micro- and nanostructure comprising the step of dewetting a thin-film glass layer on a textured substrate to form the micro- and nanostructure from the thin-film glass layer.

A method for manufacturing glass-based micro- and nanostructure comprising the step of dewetting a thin-film glass layer on a textured substrate to form the micro- and nanostructure from the thin-film glass layer.

A method of determining a phase shift caused by reflection at, or transmission through, a dielectric coating as a function of wavenumber includes obtaining a nominal phase shift for the dielectric coating as a function of wavenumber, determining a first wavenumber and a second wavenumber for performing measurements of phase shift at these wavenumbers based on the nominal phase shift, determining a wavenumber shift based on a first measurement of phase shift at the first wavenumber, a second measurement of phase shift at the second wavenumber, and the nominal phase shift as a function of wavenumber, and determining the phase shift as a function of wavenumber based on the wavenumber shift and the nominal phase. Further described is a method of determining a layer design for a dielectric coating, wherein the dielectric coating comprises a plurality of stacked layers.

A method of determining a phase shift caused by reflection at, or transmission through, a dielectric coating as a function of wavenumber includes obtaining a nominal phase shift for the dielectric coating as a function of wavenumber, determining a first wavenumber and a second wavenumber for performing measurements of phase shift at these wavenumbers based on the nominal phase shift, determining a wavenumber shift based on a first measurement of phase shift at the first wavenumber, a second measurement of phase shift at the second wavenumber, and the nominal phase shift as a function of wavenumber, and determining the phase shift as a function of wavenumber based on the wavenumber shift and the nominal phase. Further described is a method of determining a layer design for a dielectric coating, wherein the dielectric coating comprises a plurality of stacked layers.

An electromagnetic wave detector including a first electromagnetic wave sensor including a light reception unit held in midair above a substrate by a support leg and a second electromagnetic wave sensor including a light reception unit held in midair above the substrate by a support leg having same structure as the support leg of the first electromagnetic wave sensor and provided adjacent to the first electromagnetic wave sensor. The light reception unit of the first electromagnetic wave sensor includes a reflective film, the light reception unit of the second electromagnetic wave sensor includes an electromagnetic wave absorption body for detecting light of a prescribed wavelength band or a prescribed polarization, and the difference between the output of the second electromagnetic wave sensor and the first electromagnetic wave sensor is output.

A photodiode includes semiconductor layers and a gate insulating layer provided on a buried insulating layer formed on a substrate and has a diffraction grating portion in which a plurality of groove portions are formed in a two-dimensional lattice shape, on the gate insulating layer. Measurement light is guided by an optical system including a photoelastic modulator and is incident on the photodiode. The measurement light is emitted from the light source device in a state of being linearly polarized light having a predetermined wavelength and is converted at a predetermined frequency by the optical system such that states in which the measurement light becomes linearly polarized light beams of two orthogonal directions are repeated. In addition, electric signals from the photodiode in the state in which the measurement light becomes the linearly polarized light beams of the two orthogonal directions are lock-in detected.