A permittivity sensor, for determining an image of a distribution of permittivity of a material of an object in a scene, comprising an input interface, a hardware processor, and an output interface is provided. The input interface is configured to accept phaseless measurements of propagation of a known incident field through the scene and scattered by the material of the object in the scene. The hardware processor is configured to solve a multi-variable minimization problem over unknown phases of the phaseless measurements and unknown image of the permittivity of the material of the object by minimizing a difference of a nonlinear function of the known incident field and the unknown image with a product of known magnitudes of the phaseless measurements and the unknown phases. Further, the output interface is configured to render the permittivity of the material of the object provided by the solution of the multi-variable minimization problem.

Disclosed is an in vitro exposure system that may radiate a uniform field having a constant wavefront to an experimental cell container and expose each cell container to a same electromagnetic field.

A compression moulding machine comprises: an extrusion unit configured to extrude a rod of pasty polymeric material; a cutting element, configured to portion the rod into individual charges; a rotary carousel, including a plurality of moulds, each mould being configured to receive a respective charge and to form a corresponding object from the charge; a feeder, configured to convey each charge to a respective mould at a feed position; an inspecting device, configured to capture inspection data, representing a composition of the rod or of the charges.

A system and method for determining moisture content of soil, comprising providing bistatic radar configuration to measure soil reflectivity in UHF and S-band, cross-correlating between Sky-viewed and Earth-viewed signals and reflected signals in order to isolate the reflected signals, and correlating the isolated reflectesd signal to moisture content of the soil.

There is described a method for inspecting a structure across a cover layer covering the structure. The method generally has emitting a high energy photon beam along a photon path extending across said cover layer and leading to a target point within said structure, resulting in scattering along at least first and second scatter paths originating from said target point and extending across said cover layer and away therefrom, said first and second scatter paths forming a respective angle relative to said cover layer and defining an inspection plane comprising at least the target point; simultaneously detecting a first scatter signal incoming from said first scatter path and detecting a second scatter signal incoming from said second scatter path, and generating first and second values indicative therefrom; comparing said first and second values to one another; and inspecting said structure based on said comparing.

A mass spectrometer (1) includes: an ionization section (201) configured to generate ions from a sample; a mass separation section (231, 235) configured to separate ions generated by the ionization section according to mass-to-charge ratio; an ion detector (237) configured to detect an ion separated by the mass separation section; an ion capture section (31) configured to capture ions separated by the mass separation section; and an electron beam detection section (32) configured to detect an electron beam diffracted by ions captured within the ion capture section (31). This mass spectrometer is capable of performing, in a single measurement operation, both a mass spectrometric analysis and an electron-beam diffraction measurement for distinguishing between isomers. The electron-beam diffraction measurement can be more efficiently performed than in a conventional device of this type.

Provided are an intelligent manufacturing system and manufacturing method for terahertz water molecule rearrangement, which relate to the technical field of terahertz water molecule rearrangement apparatuses. The intelligent manufacturing system includes a drive adjustment structure and an electromagnetic production structure, where the electromagnetic production structure is fixedly connected to a centre of the drive adjustment structure; the drive adjustment structure includes a stable connection component and a cooperative adjustment component, where the cooperative adjustment component is arranged at a centre of an inner end of the drive adjustment structure, and a side end of the cooperative adjustment component meshes with the stable connection component. Integrated production work can be achieved by means of structural arrangement of the drive adjustment structure and the electromagnetic production structure.

A method, a non-transitory computer readable medium and a system for focusing an electron beam. The method may include focusing the electron beam on at least one evaluated area of a wafer, based on a height parameter of each one of the at least one evaluated area. The wafer includes a transparent substrate. The height parameter of each one of the at least one evaluated area is determined based on detection signals generated as a result of an illumination of one or more height-measured areas of the wafer with a beam of photons. The illumination occurs while one or more supported areas of the wafer contact one or more supporting elements of a chuck, and while each one of the one or more height-measured areas are spaced apart from the chuck by a distance that exceeds a depth of field of the optics related to the beam of photons.

To shorten a waiting time for a belongings inspection, the present invention provides an inspection system 10 including: an electromagnetic wave transmission/reception unit 11 that irradiates an electromagnetic wave having a wavelength of equal to or more than 30 micrometers and equal to or less than one meter, and receives a reflection wave; a detection unit 12 that performs detection processing of detecting an abnormal state, based on a signal of the reflection wave; a decision unit 13 that decides, for an inspection target person from which the abnormal state is detected, whether to perform a secondary inspection at a place or perform a secondary inspection later; and a registration unit 16 that registers, in association with a result of the detection processing, identification information about the inspection target person decided that a secondary inspection is performed later.

A permittivity sensor, for determining an image of a distribution of permittivity of a material of an object in a scene, comprising an input interface, a hardware processor, and an output interface is provided. The input interface is configured to accept phaseless measurements of propagation of a known incident field through the scene and scattered by the material of the object in the scene. The hardware processor is configured to solve a multi-variable minimization problem over unknown phases of the phaseless measurements and unknown image of the permittivity of the material of the object by minimizing a difference of a nonlinear function of the known incident field and the unknown image with a product of known magnitudes of the phaseless measurements and the unknown phases. Further, the output interface is configured to render the permittivity of the material of the object provided by the solution of the multi-variable minimization problem.