An X-ray imaging system, including a target; an electron beam source configured to provide an electron beam for interaction with the target to generate X-ray radiation; electron optics configured to alternately direct the electron beam to at least a first and a second location on the target; an X-ray detector array configured to receive X-ray radiation generated at the first and second locations on the target; a sample position region for receiving a sample to be exposed to generated X-ray radiation, the sample position region being located in a region where X-ray radiation generated at the first location overlaps with X-ray radiation generated at the second location; and a processing unit coupled to the X-ray detector array, the processing unit being configured to create an image of a sample, positioned in the sample position region, based on the X-ray radiation originating from the first location and from the second location.

Described herein are systems and methods for backscatter imaging. A backscatter imaging system configurable in real-time for imaging an object is provided. The backscatter imaging system includes a source array including a plurality of discrete sources, and a collimator array including a plurality of collimators corresponding to the plurality of discrete sources. The source array is configured to selectively activate the plurality of discrete sources at a frequency that is determined based at least in part on a speed of the object relative to the backscatter imaging system.

The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.

This application relates to apparatus and method for x-ray fluorescence analysis. There is provided an X-ray fluorescence analysis apparatus for analysing a sample, The X-ray fluorescence analysis apparatus comprises an X-ray source, a measurement chamber for holding the sample in air, and an X-ray detector. The X-ray source is arranged to irradiate the sample with a primary X-ray beam, to cause the sample to fluoresce. The X-ray detector is arranged to detect characteristic X-rays emitted by the sample and to determine a measured X-ray intensity associated with the characteristic X-rays. An X-ray filter, which transmits the primary X-ray beam, is arranged between the X-ray source and the sample. The X-ray source comprises an anode of material having an atomic number that is less than 25. The X-ray fluorescence analysis apparatus further comprises a sensor arrangement configured to sense air pressure and air temperature. A processor receives the measured X-ray intensity. The processor also receives air pressure data and air temperature data from the sensor arrangement. The processor is configured to carry out a compensation calculation for adjusting the measured X-ray intensity using the air pressure data and the air temperature data.

Disclosed herein is an x-ray backscatter apparatus for non-destructive inspection of a part. The x-ray backscatter apparatus comprises an x-ray source and an x-ray filter. The x-ray filter comprises a plurality of emission apertures and a detection aperture. The x-ray backscatter apparatus further comprises an x-ray intensity sensor that is fixed to the x-ray filter over the detection aperture such that any portion of an unfiltered x-ray emission filtered into the detection aperture is detected by the x-ray intensity sensor. The x-ray backscatter apparatus additionally comprises an emission alignment adjuster that is operable to adjust a position of the unfiltered x-ray emission relative to the plurality of emission apertures and the detection aperture in response to a position, relative to the detection aperture, of a peak intensity of the unfiltered x-ray emission passing into the detection aperture, detected by the x-ray intensity sensor.

The X-ray analysis apparatus contains an X-ray generation unit. The X-ray generation unit includes a target plate having a target that is irradiated with an electron beam from an electron beam source and generates X-rays, X-ray convergence optics that converges X-rays generated from the target in conjunction with a movement of the target plate, and a driving unit that changes a position of the target plate or the X-ray convergence optics relative to the electron beam source.

A three-dimensional x-ray imaging system includes at least one detector and an x-ray source including an x-ray transmissive vacuum window. The x-ray source is configured to produce diverging x-rays emerging from the vacuum window and propagating along an x-ray propagation axis extending through a region of interest of an object to the at least one detector. The diverging x-rays have propagation paths within an angular divergence angle greater than 1 degree centered on the x-ray propagation axis. The system further includes at least one sample motion stage configured to rotate the object about a rotation axis. The system further includes a sample mount configured to hold the object and comprises a first portion in the propagation paths of at least some of the diverging x-rays and having an x-ray transmission greater than 30% for x-rays having energies greater than 50% of a maximum x-ray energy of an x-ray spectrum of the diverging x-rays.

An irradiation target is formed into a sphere. The spherical irradiation target can be iridium metal containing natural or enriched iridium. The radiation source can be manufactured by manufacturing a spherical irradiation target, accommodating the spherical irradiation target in a rotating capsule, and rotating an axial flow impeller by a downward flow of a reactor primary coolant, whereby the rotating capsule is rotated. This radiation source provides an improved nondestructive inspection image having a high geometric resolution, and has no radiation source anisotropy and also has high target recyclability.

A well-logging tool may include a sonde housing and a radiation generator carried by the sonde housing. The radiation generator may include a generator housing, a target carried by the generator housing, a charged particle source carried by the generator housing to direct charged particles at the target, and at least one voltage source coupled to the charged particle source. The at least one voltage source may include a voltage ladder comprising a plurality of voltage multiplication stages coupled in a uni-polar configuration, and at least one loading coil coupled at at least one intermediate position along the voltage ladder. The well-logging tool may further include at least one radiation detector carried by the sonde housing.

An X-ray generation device includes a cathode including an electron source generating an electron beam, an anode including a target to transmit an X-ray generated by collision of the electron beam, and a convergence electrode converging the electron beam toward the target. The target has a first region having a locally small thickness and a second region having a larger thickness than the first region. The X-ray generation device further includes a deflection unit to switch an incident position of the electron beam between the first region and the second region. The deflection unit has an adjustment mode to adjust an X-ray focal spot diameter and an X-ray generation mode to generate an X-ray, the electron beam is caused to enter the first region in the adjustment mode, and the electron beam is caused to enter the second region in the X-ray generation mode.