Patent classifications
G01N2223/503
SYSTEM, METHOD, AND APPARATUS FOR X-RAY BACKSCATTER INSPECTION OF PARTS
Disclosed herein is an x-ray backscatter apparatus for non-destructive inspection of a part. The x-ray backscatter apparatus comprises an x-ray source and an x-ray filter. The x-ray filter comprises a plurality of emission apertures and a detection aperture. The x-ray backscatter apparatus further comprises an x-ray intensity sensor that is fixed to the x-ray filter over the detection aperture such that any portion of an unfiltered x-ray emission filtered into the detection aperture is detected by the x-ray intensity sensor. The x-ray backscatter apparatus additionally comprises an emission alignment adjuster that is operable to adjust a position of the unfiltered x-ray emission relative to the plurality of emission apertures and the detection aperture in response to a position, relative to the detection aperture, of a peak intensity of the unfiltered x-ray emission passing into the detection aperture, detected by the x-ray intensity sensor.
SYSTEM AND METHOD FOR IN-SITU X-RAY DIFFRACTION-BASED REAL-TIME MONITORING OF MICROSTRUCTURE PROPERTIES OF PRINTING OBJECTS
The system for in-situ real-time measurements of microstructure properties of 3D-printing objects during 3-D printing processes. An intensive parallel X-ray beam (with an adjustable beam size) impinges on a printing object and is diffracted on a crystal lattice of the printing material. The diffracted radiation impinges on a reflector formed with an array of reflector crystals mounted on an arcuated substrate. The diffracted beams reflected from the reflector crystals correspond to the diffraction intensity peaks produced by interaction of the crystal lattice of the printing material with the impinging X-ray beam. The intensities of the diffraction peaks are observed by detectors which produce corresponding output signals, which are processed to provide critical information on the crystal phase composition, which is closely related to the defects and performance of the printing objects. The subject in-situ technology provides an effective and efficient way to monitor, in real-time, the quality of 3D-printing parts during the 3-D printing process, with a significant potential for effective process control based on the reliable microstructure feedback.
X-ray collimator and related x-ray inspection apparatus
An X-ray collimator (30) that comprises: a collimator body (31) comprising: a collimation conduit (32) provided with an inlet (320), configured to be connected to an X-ray source (20) for the inlet of a beam (B) of X-rays, and an outlet (321), configured to emit a collimated portion (B1) of the X-ray beam (B); and a derivation conduit (33) inclined with respect to the collimation conduit (32), wherein the derivation conduit (33) is provided with an inlet (330), configured to be connected to the X-ray source (20) for the inlet of a peripheral portion (B2) of the same X-ray beam (B) emitted by the source (20), and an outlet (331); a reference detector (40) fixed to the collimator body (31) and provided with an inlet window (41) facing the outlet (331) of the derivation conduit (33).
System and method for high-resolution high contrast x-ray ghost diffraction
A system for high-resolution high-contrast x-ray ghost diffraction comprises: A) a laboratory x-ray source configured to provide an input beam; B) a diffuser configured to induce intensity fluctuations in the input beam; C) a beam splitter configured to split the input beam into: i) a test arm comprising an object and a single-pixel detector; and ii) a reference arm comprising one of: (a) a multi-pixel detector and (b) a single-pixel detector and an aperture or a scanning slit configured to simulate a one or two dimensional multi-pixel detector; and D) a processor configured to receive output intensity measurements of the detectors in the test arm and the reference arm, to record the output intensity measurements at different rotational positions of the rotating diffuser, to correlate the output intensity measurements, and to use the correlated output measurements to reconstruct a diffraction pattern of the object; wherein the object is placed as close as possible to the beam splitter and the detectors in the test arm and the reference arm are equidistant from the beam splitter.
X-ray collimator and related X-ray inspection apparatus
An X-ray collimator (30) that comprises: a collimator body (31) comprising: a collimation conduit (32) provided with an inlet (320), configured to be connected to an X-ray source (20) for the inlet of a beam (B) of X-rays, and an outlet (321), configured to emit a collimated portion (B1) of the X-ray beam (B); and a derivation conduit (33) inclined with respect to the collimation conduit (32), wherein the derivation conduit (33) is provided with an inlet (330), configured to be connected to the X-ray source (20) for the inlet of a peripheral portion (B2) of the same X-ray beam (B) emitted by the source (20), and an outlet (331); a reference detector (40) fixed to the collimator body (31) and provided with an inlet window (41) facing the outlet (331) of the derivation conduit (33).
A SYSTEM AND METHOD FOR HIGH-RESOLUTION HIGH CONTRAST X-RAY GHOST DIFFRACTION
A system for high-resolution high-contrast x-ray ghost diffraction comprises: A) a laboratory x-ray source configured to provide an input beam; B) a diffuser configured to induce intensity fluctuations in the input beam; C) a beam splitter configured to split the input beam into: i) a test arm comprising an object and a single-pixel detector; and ii) a reference arm comprising one of: (a) a multi-pixel detector and (b) a single-pixel detector and an aperture or a scanning slit configured to simulate a one or two dimensional multi-pixel detector; and D) a processor configured to receive output intensity measurements of the detectors in the test arm and the reference arm, to record the output intensity measurements at different rotational positions of the rotating diffuser, to correlate the output intensity measurements, and to use the correlated output measurements to reconstruct a diffraction pattern of the object; wherein the object is placed as close as possible to the beam splitter and the detectors in the test arm and the reference arm are equidistant from the beam splitter.
System and method for in-situ X-ray diffraction-based real-time monitoring of microstructure properties of printing objects
The system for in-situ real-time measurements of microstructure properties of 3D-printing objects during 3-D printing processes. An intensive parallel X-ray beam (with an adjustable beam size) impinges on a printing object and is diffracted on a crystal lattice of the printing material. The diffracted radiation impinges on a reflector formed with an array of reflector crystals mounted on an arcuated substrate. The diffracted beams reflected from the reflector crystals correspond to the diffraction intensity peaks produced by interaction of the crystal lattice of the printing material with the impinging X-ray beam. The intensities of the diffraction peaks are observed by detectors which produce corresponding output signals, which are processed to provide critical information on the crystal phase composition, which is closely related to the defects and performance of the printing objects. The subject in-situ technology provides an effective and efficient way to monitor, in real-time, the quality of 3D-printing parts during the 3-D printing process, with a significant potential for effective process control based on the reliable microstructure feedback.
System, method, and apparatus for x-ray backscatter inspection of parts
Disclosed herein is an x-ray backscatter apparatus for non-destructive inspection of a part. The x-ray backscatter apparatus comprises an x-ray source and an x-ray collimator. The x-ray collimator comprises a plurality of emission apertures and a detection aperture. The x-ray backscatter apparatus further comprises an x-ray intensity sensor that is fixed to the x-ray collimator over the detection aperture such that any portion of an uncollimated x-ray emission collimated into the detection aperture is detected by the x-ray intensity sensor. The x-ray backscatter apparatus additionally comprises an emission alignment adjuster that is operable to adjust a position of the uncollimated x-ray emission relative to the plurality of emission apertures and the detection aperture in response to a position, relative to the detection aperture, of a peak intensity of the uncollimated x-ray emission passing into the detection aperture, detected by the x-ray intensity sensor.
SYSTEM, METHOD, AND APPARATUS FOR X-RAY BACKSCATTER INSPECTION OF PARTS
Disclosed herein is an x-ray backscatter apparatus for non-destructive inspection of a part. The x-ray backscatter apparatus includes an x-ray source and an x-ray collimator. The x-ray collimator includes a plurality of emission apertures and a detection aperture. The x-ray backscatter apparatus further includes an x-ray intensity sensor that is fixed to the x-ray collimator over the detection aperture such that at least a portion of an uncollimated x-ray emission, collimated into the detection aperture, is detected by the x-ray intensity sensor. The x-ray backscatter apparatus additionally includes an emission alignment adjuster that is operable to adjust a position of the uncollimated x-ray emission relative to the plurality of emission apertures and the detection aperture in response to the at least the portion of the uncollimated x-ray emission detected by the x-ray intensity sensor.
System, method, and apparatus for x-ray backscatter inspection of parts
Disclosed herein is an x-ray backscatter apparatus for non-destructive inspection of a part. The x-ray backscatter apparatus includes an x-ray source and an x-ray collimator. The x-ray collimator includes a plurality of emission apertures and a detection aperture. The x-ray backscatter apparatus further includes an x-ray intensity sensor that is fixed to the x-ray collimator over the detection aperture such that at least a portion of an uncollimated x-ray emission, collimated into the detection aperture, is detected by the x-ray intensity sensor. The x-ray backscatter apparatus additionally includes an emission alignment adjuster that is operable to adjust a position of the uncollimated x-ray emission relative to the plurality of emission apertures and the detection aperture in response to the at least the portion of the uncollimated x-ray emission detected by the x-ray intensity sensor.