A semiconductor analysis system includes a machining device that machines a semiconductor wafer to prepare a thin film sample for observation, a transmission electron microscope device that acquires a transmission electron microscope image of the thin film sample, and a host control device that controls the machining device and the transmission electron microscope device. The host control device evaluates the thin film sample based on the transmission electron microscope image, updates acquisition conditions of the transmission electron microscope image based on an evaluation result of the thin film sample, and outputs the updated acquisition conditions to the transmission electron microscope device

A phase contrast X-ray imaging system includes: an illumination source adapted to illuminate a region of interest; a diffraction grating adapted to receive illumination from the illuminated region of interest, the diffraction grating comprising a spatial structure having a first periodicity superimposed with a second periodicity that is different from the first periodicity; and a detector adapted to detect illumination passing through the diffraction grating, wherein the spatial structure is defined by varying height and/or pitch, and wherein the spatial structure imparts a first phase dependence based on the first periodicity and an additional phase dependence based on the second periodicity on the illumination passing through the diffraction grating.

A phase contrast X-ray imaging system includes: an illumination source adapted to illuminate a region of interest; a diffraction grating adapted to receive illumination from the illuminated region of interest, the diffraction grating comprising a spatial structure having a first periodicity superimposed with a second periodicity that is different from the first periodicity; and a detector adapted to detect illumination passing through the diffraction grating, wherein the spatial structure is defined by varying height and/or pitch, and wherein the spatial structure imparts a first phase dependence based on the first periodicity and an additional phase dependence based on the second periodicity on the illumination passing through the diffraction grating.

An X-ray image generation device includes a moving mechanism that moves an object relative to a grating part in a direction crossing X-rays emitted toward the grating part. The grating part includes N (2≤N) regions along the direction of movement by the moving mechanism. A cyclic direction of a grating structure in each of the plurality of gratings belonging to an ith (1≤i≤N−1) region out of the N regions and a cyclic direction of a grating structure in each of the plurality of gratings belonging to an (i+1)th region out of the N regions are different directions. The plurality of gratings are configured so that moiré interference fringes generated in the N regions have a cyclic intensity fluctuation measurable by the detector and of at least one cycle or more in the direction of movement by the moving mechanism.

An X-ray image generation device includes a moving mechanism that moves an object relative to a grating part in a direction crossing X-rays emitted toward the grating part. The grating part includes N (2≤N) regions along the direction of movement by the moving mechanism. A cyclic direction of a grating structure in each of the plurality of gratings belonging to an ith (1≤i≤N−1) region out of the N regions and a cyclic direction of a grating structure in each of the plurality of gratings belonging to an (i+1)th region out of the N regions are different directions. The plurality of gratings are configured so that moiré interference fringes generated in the N regions have a cyclic intensity fluctuation measurable by the detector and of at least one cycle or more in the direction of movement by the moving mechanism.

Disclosed herein is a method, comprising: for i=1, . . . , M, sending a pencil radiation beam (i) toward an image sensor, wherein the pencil radiation beam (i) is incident on an incident region (i) on the image sensor, wherein the pencil radiation beam (i) is aimed at a target region (i) on the image sensor, wherein M is a positive integer, wherein the image sensor comprises active areas spatially discontinuous from each other, and wherein the incident regions (i), i=1, . . . , M and the target regions (i), i=1, . . . , M are on the active areas; and for i=1, . . . , M, determining an offset (i) between the incident region (i) and the target region (i).

Disclosed herein is a method, comprising: for i=1, . . . , M, sending a pencil radiation beam (i) toward an image sensor, wherein the pencil radiation beam (i) is incident on an incident region (i) on an active area of the image sensor, wherein the pencil radiation beam (i) is aimed at a target region (i) on the active area, wherein M is a positive integer, for i=1, . . . , M, determining an offset (i) between the incident region (i) and the target region (i).

Disclosed herein is a method, comprising: for i=1, . . . , M, sending a pencil radiation beam (i) toward an image sensor, wherein the pencil radiation beam (i) is incident on an incident region (i) on an active area of the image sensor, wherein the pencil radiation beam (i) is aimed at a target region (i) on the active area, wherein M is a positive integer, for i=1, . . . , M, determining an offset (i) between the incident region (i) and the target region (i).

In accordance with the invention, an X-ray amplitude analyzer grating adapted for use in an interferometric imaging system, the interferometric imaging system comprising an X-ray source and an X-ray detector with an X-ray fringe plane between the X-ray source and the X-ray detector, wherein an X-ray fringe pattern is formed at the X-ray fringe plane, wherein the X-ray amplitude analyzer grating is provided. The X-ray amplitude analyzer grating comprises a plurality of grating pixels across two dimensions of the X-ray amplitude analyzer grating, wherein each grating pixels of the plurality of grating pixels has a different pattern with respect to all adjacent grating pixels to the grating pixel so that all adjacent grating pixels do not have a same pattern as the grating pixel.

In accordance with the invention, an X-ray amplitude analyzer grating adapted for use in an interferometric imaging system, the interferometric imaging system comprising an X-ray source and an X-ray detector with an X-ray fringe plane between the X-ray source and the X-ray detector, wherein an X-ray fringe pattern is formed at the X-ray fringe plane, wherein the X-ray amplitude analyzer grating is provided. The X-ray amplitude analyzer grating comprises a plurality of grating pixels across two dimensions of the X-ray amplitude analyzer grating, wherein each grating pixels of the plurality of grating pixels has a different pattern with respect to all adjacent grating pixels to the grating pixel so that all adjacent grating pixels do not have a same pattern as the grating pixel.