An X-ray imaging system (XI) configured for phase contrast and/or dark-field imaging The system comprises an X-ray source (XS) operable to cause X-radiation to emanate from a focal spot (SF) of the source (XS) and an X-ray sensitive detector (D) operable to SMF detect the X-radiation after interaction of said X-radiation with an object to be imaged, if present, between the X-ray source and the detector (D). A control logic (CL) is operable to cause the X-ray imaging apparatus to operate in any one of two modes, an object image acquisition mode and a scattering measurement mode. When in scattering measurement mode, the X-radiation receivable at the detector comprises a higher proportion of scattering radiation than in X-radiation receivable when the system is in object image acquisition mode.

Phase contrast and dark-field X-ray imaging enable imaging of objects that absorb or reflect very little X-ray light. Disclosed is a method and systems for performing coded-mask-based multi-contrast imaging (CMMI). The method includes providing radiation to a coded mask that has a known phase and absorption profile according to a pre-determined pattern. The radiation is then impingent upon a sample, and the radiation is detected to perform phase-reconstruction and image processing. The method and associated systems allow for the use of maximum-likelihood and machine learning methods for reconstruction images of the sample from the detected radiation.

Phase contrast and dark-field X-ray imaging enable imaging of objects that absorb or reflect very little X-ray light. Disclosed is a method and systems for performing coded-mask-based multi-contrast imaging (CMMI). The method includes providing radiation to a coded mask that has a known phase and absorption profile according to a pre-determined pattern. The radiation is then impingent upon a sample, and the radiation is detected to perform phase-reconstruction and image processing. The method and associated systems allow for the use of maximum-likelihood and machine learning methods for reconstruction images of the sample from the detected radiation.

A focusing grating device (100) is described comprising a substrate (402) and a grating comprising a plurality of grating features (408) positioned on the substrate (402). The grating features (408) are positioned non-perpendicular to the substrate surface, thereby inducing a first focusing direction. The substrate (402) is curved, thereby inducing a second focusing direction, which is different from the first focusing direction. An X-ray system (300) comprising such a focusing grating device (100) as well as a method for producing such a focusing grating device (100) are also described.

A focusing grating device (100) is described comprising a substrate (402) and a grating comprising a plurality of grating features (408) positioned on the substrate (402). The grating features (408) are positioned non-perpendicular to the substrate surface, thereby inducing a first focusing direction. The substrate (402) is curved, thereby inducing a second focusing direction, which is different from the first focusing direction. An X-ray system (300) comprising such a focusing grating device (100) as well as a method for producing such a focusing grating device (100) are also described.

An imaging system (IS) including device (G, IFD) for phase contrast and/or dark field imaging such as a grating (G). The device has a periodic structure with a spatial period p. The imaging system (IS) further includes a phase stepping mechanism (PSM) configured to facilitate a relative phase stepping motion between the device (G, IFD) and a focal spot (FS) of an X-ray source (XS) of the imaging system (IS). The relative phase stepping motion covers a distance greater than the said spatial period to reduce artifacts in dark-field or phase contrast imagery caused by defects in the grating.

An imaging system (IS) including device (G, IFD) for phase contrast and/or dark field imaging such as a grating (G). The device has a periodic structure with a spatial period p. The imaging system (IS) further includes a phase stepping mechanism (PSM) configured to facilitate a relative phase stepping motion between the device (G, IFD) and a focal spot (FS) of an X-ray source (XS) of the imaging system (IS). The relative phase stepping motion covers a distance greater than the said spatial period to reduce artifacts in dark-field or phase contrast imagery caused by defects in the grating.

An X-ray imaging system including: an X-ray Talbot imaging apparatus which is provided with an object table, an X-ray source, a plurality of gratings, and an X-ray detector side by side in a direction of an X-ray radiation axis, and irradiates the X-ray detector with an X-ray from the X-ray source through an object and the plurality of gratings to obtain a moire image required for forming a reconstruction image of the object; and an object housing inside which the object is housed and an environmental condition independent of an external environment is set, wherein the object housing is provided detachably with respect to the object table.

An X-ray imaging system including: an X-ray Talbot imaging apparatus which is provided with an object table, an X-ray source, a plurality of gratings, and an X-ray detector side by side in a direction of an X-ray radiation axis, and irradiates the X-ray detector with an X-ray from the X-ray source through an object and the plurality of gratings to obtain a moire image required for forming a reconstruction image of the object; and an object housing inside which the object is housed and an environmental condition independent of an external environment is set, wherein the object housing is provided detachably with respect to the object table.

A semiconductor analysis system includes a machining device that machines a semiconductor wafer to prepare a thin film sample for observation, a transmission electron microscope device that acquires a transmission electron microscope image of the thin film sample, and a host control device that controls the machining device and the transmission electron microscope device. The host control device evaluates the thin film sample based on the transmission electron microscope image, updates acquisition conditions of the transmission electron microscope image based on an evaluation result of the thin film sample, and outputs the updated acquisition conditions to the transmission electron microscope device