A geological analysis system, device, and method are provided. The geological analysis system includes sensors, including an X-ray fluorescence (XRF) unit, which detect properties of geological sample materials, a sample tray which holds the geological sample materials therein, and a processor. The XRF unit includes a body and a separable head unit and an output port configured to emit helium onto the geological sample materials within the sample tray. The sample tray includes chambers formed in an upper surface, ports, and passages, each providing communication between an interior of a chamber and an interior of a port. The ports are configured to be attachable to vials. The processor is configured to automatically position at least one of the sensors and the sample tray with respect to the other of the at least one of the sensors and the sample tray and to control the sensors.

A geological analysis system, device, and method are provided. The geological analysis system includes sensors, including an X-ray fluorescence (XRF) unit, which detect properties of geological sample materials, a sample tray which holds the geological sample materials therein, and a processor. The XRF unit includes a body and a separable head unit and an output port configured to emit helium onto the geological sample materials within the sample tray. The sample tray includes chambers formed in an upper surface, ports, and passages, each providing communication between an interior of a chamber and an interior of a port. The ports are configured to be attachable to vials. The processor is configured to automatically position at least one of the sensors and the sample tray with respect to the other of the at least one of the sensors and the sample tray and to control the sensors.

A method for x-ray based evaluation of a status of a structure of a substrate, the method may include acquiring an electron image of a region of the substrate, the region comprises the structure; acquiring an x-ray image of the structure; and evaluating the status of the structure, wherein the evaluating is based at least on a number of x-ray photons that were emitted from the structure.

The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.

Methods and systems for imaging a sample with a charged particle microscope comprises after scanning a region of interest (ROI) of a sample with an electron beam and acquiring X-rays emitted from the sample, scanning the ROI with an ion beam and acquiring ion-induced photons emitted from the sample. A spatial distribution of multiple elements in the sample may be determined based on both the acquired X-rays and the acquired ion-induced photons.

An analyzer includes a wavelength-dispersive X-ray spectrometer and a control unit that controls the wavelength-dispersive X-ray spectrometer, the control unit performing: processing of acquiring an analysis result of preparatory analysis performed on a specimen to be analyzed; processing of setting spectroscopic conditions for WDS analysis using the wavelength-dispersive X-ray spectrometer based on the analysis result of the preparatory analysis; and processing of performing the WDS analysis on the specimen to be analyzed under the set spectroscopic conditions.

An analyzer includes a wavelength-dispersive X-ray spectrometer and a control unit that controls the wavelength-dispersive X-ray spectrometer, the control unit performing: processing of acquiring an analysis result of preparatory analysis performed on a specimen to be analyzed; processing of setting spectroscopic conditions for WDS analysis using the wavelength-dispersive X-ray spectrometer based on the analysis result of the preparatory analysis; and processing of performing the WDS analysis on the specimen to be analyzed under the set spectroscopic conditions.

The device for observing permeation and diffusion path of observation target gas includes: a scanning electron microscope 15; an observation target ion detecting unit 20; an observation target gas supply unit 19; a diaphragm-type sample holder 12, to which the sample is mounted in attachable/detachable state, as a diaphragm dividing between the analysis chamber 11 and the observation target gas pipe 14; and a control unit 50. The control unit acquires a SEM image and at the same time detects the observation target gas, which diffuses within the sample and is discharged to the surface of the sample, by electron stimulated desorption, in a state where stress is applied to the sample due to differential pressure generated between the analysis chamber and the observation target gas pipe by supplying the observation target gas, and obtains an ESD image of the observation target ions.

Provided are a quantitative analysis method, a quantitative analysis program, and an X-ray fluorescence spectrometer. The quantitative analysis method includes: a step of acquiring a representative composition set to represent contents of analysis components; a step of acquiring a plurality of comparative compositions, in each of which the content of one of the analysis components of the representative composition is changed by a predetermined content; a detection intensity calculation step of calculating a detection intensity indicating an intensity of fluorescent X-rays detected under the influence of the geometry effect through use of an FP method with respect to a virtual sample having a thickness set in advance and being indicated by each of the representative composition and the comparative compositions; and a step of calculating a matrix correction coefficient for each of the analysis components based on the detection intensity.

Provided are a quantitative analysis method, a quantitative analysis program, and an X-ray fluorescence spectrometer. The quantitative analysis method includes: a step of acquiring a representative composition set to represent contents of analysis components; a step of acquiring a plurality of comparative compositions, in each of which the content of one of the analysis components of the representative composition is changed by a predetermined content; a detection intensity calculation step of calculating a detection intensity indicating an intensity of fluorescent X-rays detected under the influence of the geometry effect through use of an FP method with respect to a virtual sample having a thickness set in advance and being indicated by each of the representative composition and the comparative compositions; and a step of calculating a matrix correction coefficient for each of the analysis components based on the detection intensity.