Patent classifications
G01Q70/12
Debris removal in high aspect structures
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
Probe, method of manufacturing a probe and scanning probe microscopy system
This document relates to a probe for use in a scanning probe microscopy device. The probe comprises a cantilever and a probe tip being located at a first end section of the cantilever. The cantilever is configured for bending in a Z-direction perpendicular to a surface of a substrate in use. The cantilever comprises a neck section and a paddle section, and the probe tip is located on the paddle section. The neck section has a width and height in cross section thereof, comprises a base part having a rectangular cross section. The cantilever at least across a length of the neck section comprises a ridge extending in a direction away from the base part. The base part and the ridge together define the width and height of the neck section, and have dimensions such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction. The document further describes a manufacturing method.
Quantum dot microscope apparatus comprising a nanoscale semiconductor on the tip of a fiber, a tunneling electrical lead and a capacitive electrical lead on the fiber
A quantum dot microscope apparatus is provided. A further aspect employs a tilted or tapered end or tip on a microscopic probe. Another aspect of the present apparatus employs a probe including a quantum dot with only one tunneling lead connected to a power source. A manufacturing aspect includes creating a tapered or asymmetrically shaped specimen-facing end of a probe where a quantum dot is located on the end. A further manufacturing aspect includes using focused ion-beam milling to create a tip or end of a quantum dot microscope probe.
Nanoscale scanning electrochemical microscopy electrode method
Disclosed is a method for preparing nanoscale electrodes comprised of electrochemically grown noble metal nanowires, and use of the same for the detection of extremely small concentrations of molecules. Such nanoscale electrodes provide target molecule release information from submicron areas on the cell surface, significantly increasing the spatial resolution of the target molecule mapping of a cell surface to enable localization of target molecules on the cell surface, which can be critical for the detection of certain cells with different properties in a given group of cells, such as circulating tumor cells.
Nanoscale scanning electrochemical microscopy electrode method
Disclosed is a method for preparing nanoscale electrodes comprised of electrochemically grown noble metal nanowires, and use of the same for the detection of extremely small concentrations of molecules. Such nanoscale electrodes provide target molecule release information from submicron areas on the cell surface, significantly increasing the spatial resolution of the target molecule mapping of a cell surface to enable localization of target molecules on the cell surface, which can be critical for the detection of certain cells with different properties in a given group of cells, such as circulating tumor cells.
SEMICONDUCTOR-LASER-INTEGRATED ATOMIC FORCE MICROSCOPY OPTICAL PROBE
A new semiconductor-laser-integrated Atomic Force Microscopy (AFM) optical probe integrates a semiconductor laser and a silicon cantilever AFM probe into a robust easy-to-use chip to enable AFM measurements, optical imaging, and spectroscopy at the nanoscale.
SEMICONDUCTOR-LASER-INTEGRATED ATOMIC FORCE MICROSCOPY OPTICAL PROBE
A new semiconductor-laser-integrated Atomic Force Microscopy (AFM) optical probe integrates a semiconductor laser and a silicon cantilever AFM probe into a robust easy-to-use chip to enable AFM measurements, optical imaging, and spectroscopy at the nanoscale.
Debris Removal From High Aspect Structures
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
PROBE, METHOD OF MANUFACTURING A PROBE AND SCANNING PROBE MICROSCOPY SYSTEM
This document relates to a probe for use in a scanning probe microscopy device. The probe comprises a cantilever and a probe tip being located at a first end section of the cantilever. The cantilever is configured for bending in a Z-direction perpendicular to a surface of a substrate in use. The cantilever comprises a neck section and a paddle section, and the probe tip is located on the paddle section. The neck section has a width and height in cross section thereof, comprises a base part having a rectangular cross section. The cantilever at least across a length of the neck section comprises a ridge extending in a direction away from the base part. The base part and the ridge together define the width and height of the neck section, and have dimensions such that a vertical bending stiffness of the cantilever for bending in the Z-direction matches a lateral stiffness of the cantilever with respect to forces acting on the probe tip in a direction transverse to the Z-direction. The document further describes a manufacturing method.
SCANNING PROBE MICROSCOPE (SPM) TIP
The present invention refers to a method for modifying a scanning probe microscope (SPM) tip, a modified SPM tip obtainable by the method, a modified SPM tip, to the use of the modified SPM tip, to a scanning probe comprising the modified SPM tip and to the use of the scanning probe.