A system consists of a front group, a slit member, and a rear group arranged in order from an object side to an image side, wherein the slit member is provided with an aperture long in a first direction, wherein the front group does not form an image of an object on the aperture in a first cross section parallel to the first direction, and forms an intermediate image of the object on the aperture in a second cross section perpendicular to the first direction, wherein the rear group includes a diffractive surface configured to collects a plurality of rays at positions different from each other in the second cross section, wherein the front group includes a first reflective surface and a second reflective surface that satisfies a predetermined inequality.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

A method and a device for producing an optical component having at least three monolithically arranged optical functional surfaces and an optical component are disclosed. The method includes calculating a continuous surface composite, which includes the first optical functional surface and the second optical functional surface, producing the continuous surface composite, which contains the first and second optical functional surfaces in a defined shape and a relative position to one another, on the first side of the optical component through machining by a machine tool, producing at least one reference surface arranged outside the optical functional surfaces on the optical component or on a mount and having a defined positional relation to the optical functional surfaces through machining by the machine tool and repositioning the optical component in such a way that the second side of the optical component is machined with the machine tool, wherein the at least one reference surface serves as a contact surface or mounting surface.

The disclosure provides a method and to an apparatus for determining the heating state of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. A method for determining the heating state of an optical element includes: measuring values of a first temperature that the optical element has at a first position using a temperature sensor; and estimating a second temperature that the optical element has at a second position, which is located at a distance from the first position, on the basis of the measured values, wherein estimating the second temperature is accomplished while taking into account a temporal change in the previously measured values.

A reflective imager design that is telecentric in image space, or equivalently telecentric at an image plane, or equivalently having an exit pupil located substantially at infinity, while also having an external entrance pupil and a high throughput or fast optical speed is described.

A telescope includes a primary mirror, a secondary mirror configured to move along a first axis, and a tertiary mirror configured to move along a second axis. The secondary and tertiary mirrors are configured to move along respective axes in a synchronized manner to focus a beam of electromagnetic radiation from the primary mirror. The telescope further may include an anamorphic deformable mirror configured to achieve wavefront control and correction of optical aberrations. The telescope further may include a first linear actuator configured to move the secondary mirror along the first axis and a second linear actuator configured to move the tertiary mirror along the second axis.

A telescope includes a primary mirror, a secondary mirror configured to move along a first axis, and a tertiary mirror configured to move along a second axis. The secondary and tertiary mirrors are configured to move along respective axes in a synchronized manner to focus a beam of electromagnetic radiation from the primary mirror. The telescope further may include an anamorphic deformable mirror configured to achieve wavefront control and correction of optical aberrations. The telescope further may include a first linear actuator configured to move the secondary mirror along the first axis and a second linear actuator configured to move the tertiary mirror along the second axis.

Described are two mirror scanning projectors employing a collimated laser beam directed to a first mirror that scans in one direction, an optical relay system, and a second mirror that scans in a perpendicular direction from the first mirror to provide two dimensional scanning of the laser beam.

The disclosure provides a method and to an apparatus for determining the heating state of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. A method for determining the heating state of an optical element includes: measuring values of a first temperature that the optical element has at a first position using a temperature sensor; and estimating a second temperature that the optical element has at a second position, which is located at a distance from the first position, on the basis of the measured values, wherein estimating the second temperature is accomplished while taking into account a temporal change in the previously measured values.