An example includes a system, having: an illumination source configured to produce illumination light; and a spatial light modulator (SLM) optically coupled to the illumination source, the SLM comprising an array of picture elements. The SLM is configured to: receive the illumination light; direct, by a first portion of the picture elements, on state light in a first direction; and direct, by a second portion of the picture elements, off state light in a second direction. The example system includes imaging optics optically coupled to the SLM, the imaging optics configured to receive the on state light from the SLM and to project an image as an image portion of a beam; and non-imaging optics optically coupled to the SLM, the non-imaging optics configured to receive the off state light from the SLM and to project the off state light as part of the beam.

A display device includes a light-emitting module and a light-diffusing sheet stacked body. The light-emitting module includes at least one light guide plate including an upper surface and a lower surface, and light sources disposed at the lower surface side of the light guide plate. The light-diffusing sheet stacked body includes a first light-diffusing sheet disposed on the light guide plate, a second light-diffusing sheet disposed on the first light-diffusing sheet, and a third light-diffusing sheet disposed on the second light-diffusing sheet. The first light-diffusing sheet includes first protrusions at an upper surface side thereof. The second light-diffusing sheet includes second protrusions at an upper surface side thereof. The third light-diffusing sheet includes third protrusions at an upper surface side thereof. A shape of the third protrusion may be different from a shape of the first protrusions and/or a shape of the second protrusions.

In one aspect of the present disclosure an optical measurement device includes a sample holder defining a sample plane, wherein the sample holder is configured to arrange a sample carrier including an array of measurement positions in the sample plane, an illumination unit configured to illuminate the sample plane, a detector and an optical imaging system configured to image the sample plane including the array of measurement positions onto the detector, the optical imaging system including two or more curved reflective elements adapted to image the sample plane onto the detector with a magnification of between 2:1 and 1:2 and the detector being configured to take an image of all measurement positions of the array of measurement positions at a time.

A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.

A display device includes a light-emitting module and a light-diffusing sheet stacked body. The light-emitting module includes at least one light guide plate including an upper surface and a lower surface, and light sources disposed at the lower surface side of the light guide plate. The light-diffusing sheet stacked body includes a first light-diffusing sheet disposed on the light guide plate, a second light-diffusing sheet disposed on the first light-diffusing sheet, and a third light-diffusing sheet disposed on the second light-diffusing sheet. The first light-diffusing sheet includes first protrusions at an upper surface side thereof. The second light-diffusing sheet includes second protrusions at an upper surface side thereof. The third light-diffusing sheet includes third protrusions at an upper surface side thereof. A shape of the third protrusion may be different from a shape of the first protrusions and/or a shape of the second protrusions.

A head mounted display (HMD) includes a field curvature corrected (FC) display to mitigate field curvature in an image that is output to a user's eyes. The FC display includes elements that generate the image light and elements to mitigate field curvature from the image light. The FC display may include a display panel with lenses, a display panel with a reflective polarizer and reflective surface, or other optical elements. The FC display may include a pancake lens configuration including a polarized display with a quarter wave plate, a reflective mirror, and a polarization reflective mirror.

An optical imaging system includes a first lens, a second lens, a third lens, a fourth lens, and a fifth lens, disposed in order from an object side, and a first reflection member and a second reflection member, disposed on an object side of the first lens, each having a freeform surface.

Imaging systems and methods are provided for taking high-magnification photographs confined to a small physical volume. In some embodiments the system is composed of at least one lens, one or more partially reflective elements, and a sensor. The partial reflectors reflect a portion of the light back and forth between them to allow a long path length for a portion of the light from the lens to the sensor which enables a high magnification.

Provided is an optical system having a configuration capable of attaining a large light-gathering power while producing a maximum light-gathering power easily and inexpensively with a minimum material. An offset optical system according to the present invention comprises: a primary mirror composed of at least part of one of two optical element halves obtained by dividing an optical element having a concave shape curved only in one direction, in an intermediate position of a length along a curvature thereof, wherein the optical element is configured to reflect and focus light from an object, into a linear focus; a sub-mirror disposed between the primary mirror and the linear focus and configured to transmit or reflect light reflected by the primary mirror, thereby focusing the light into a point focus; wherein, when: a direction tangent to the curvature in the intermediate position of the optical element is defined as an x-axis; a direction which is perpendicular to the x-axis and in which the object is located is defined as a y-axis; and a direction orthogonal to the x-axis and the y-axis is defined as a z-axis, the sub-mirror is offset parallel to the x-axis by a given distance toward an edge of the primary mirror located distal to the y-axis.

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided in which an illumination field of the mask is illuminated by illumination radiation with an operating wavelength λ that was provided by an illumination system.