An example method of forming a deterministic thin film from a crystal substrate is described herein. The method can include implanting ions into a surface of the crystal substrate to form a thin film crystal layer, and bonding the crystal substrate and a handle substrate to form a bilayer bonding interface between the crystal substrate and the handle substrate. The method can also include exfoliating the thin film crystal layer from the crystal substrate, patterning the thin film crystal layer to define a deterministic thin film, etching one or more trenches in the thin film crystal layer, etching the bilayer bonding interface via the one or more trenches, and releasing the deterministic thin film from the handle substrate.

An example method of forming a deterministic thin film from a crystal substrate is described herein. The method can include implanting ions into a surface of the crystal substrate to form a thin film crystal layer, and bonding the crystal substrate and a handle substrate to form a bilayer bonding interface between the crystal substrate and the handle substrate. The method can also include exfoliating the thin film crystal layer from the crystal substrate, patterning the thin film crystal layer to define a deterministic thin film, etching one or more trenches in the thin film crystal layer, etching the bilayer bonding interface via the one or more trenches, and releasing the deterministic thin film from the handle substrate.

Provided is an optical scanning element, which has a large scan angle, is quickly responsive, and can be downsized. The optical scanning element includes: a photonic crystal layer having holes periodically formed in an electro-optical crystal substrate; a line-defect optical waveguide formed in the photonic crystal layer; a diffraction grating arranged in at least one portion selected from an upper portion, a left side surface portion, and a right side surface portion of the optical waveguide; and electrodes arranged on a left side and a right side of the optical waveguide. The optical scanning element is configured so that an emission angle of light emitted from an upper surface of the optical waveguide is changed.