Ultraviolet-C (UV-C) radiation shielding films including a substrate made of a fluoropolymer, a multilayer optical film disposed on a major surface of the substrate, and a heat-sealable encapsulant layer disposed on a major surface of the multilayer optical film opposite the substrate. The multilayer optical film is made of at least a multiplicity of alternating first and second optical layers collectively reflecting at an incident light angle of at least one of 0°, 30°, 45°, 60°, or 75°, at least 30 percent of incident ultraviolet light over at least a 30-nanometer wavelength reflection bandwidth in a wavelength range from at least 100 nanometers to 280 nanometers. The ultraviolet light shielding film may be applied to a major surface of a photovoltaic device, such as a component of a satellite or an unmanned aerial vehicle. Methods of making the UV-C radiation-protective films also are disclosed.

Collection reflectors with multiple reflector elements defined on a curved surface are used to collect EUV optical radiation from an EUV emitting area. Each of the reflector elements can image the emitting area at or near a corresponding reflective element of a second multi-element reflector that overlaps radiation from each of the multiple reflector element of the collection reflector to illuminate a grating reticle. Systems with such a collection reflector can use fewer optical elements. In addition, grating reticles are defined on a curve substrate an include a plurality of grating phase steps so that the grating reticle provides phase curvature along two axes but with physical curvature along a single axis. Methods of producing varying duty cycle 1D patterns are also disclosed.

An illumination optical unit for EUV projection lithography includes a field facet mirror with a plurality of field facets for guiding illumination light into an object field where a lithography mask is arrangeable. At least one spectral output coupling mirror section is arranged on the field facet mirror. The mirror section serves to output couple the spectral analysis partial beam from a beam path of the illumination light. A detector serves for the spectral analysis of the spectral analysis partial beam. This can yield an illumination optical unit in which process monitoring during the projection exposure is improved.

In a method for producing an optical element for an EUV projection exposure apparatus, a shaping layer (22.sub.1) is applied onto a substrate (20) so as to have a surface roughness of at most 0.5 nm rms directly after the application of the shaping layer onto the substrate.

An EUV collector has a reflection surface with a basic mirror shape of a spherical section. A diffraction grating for EUV used light is applied to the reflection surface. The diffraction grating is designed so that the EUV used light, which emanates from a sphere center of the spherical section, is diffracted by the diffraction grating toward a collection region. The collection region is spatially spaced apart from the sphere center. This creates an EUV collector in which an effective separation between EUV used light, which is to be collected with the aid of the collector, and extraneous light having a wavelength that differs from a used light wavelength is made possible.

The present invention relates to calibration in X-ray phase contrast imaging. In order to remove the disturbance due to individual gain factors, a calibration filter grating (10) for a slit-scanning X-ray phase contrast imaging arrangement is provided that comprises a first plurality of filter segments (11) comprising a filter material (12) and a second plurality of opening segments (13). The filter segments and the opening segments are arranged alternating as a filter pattern (15). The filter material is made from a material with structural elements (14) comprising structural parameters in the micrometer region. The filter grating is movably arranged between an X-ray source grating (54) and an analyzer grating (60) of an interferometer unit in a slit-scanning system of a phase contrast imaging arrangement. The slit-scanning system is provided with a pre-collimator (55) comprising a plurality of bars (57) and slits (59). The filter pattern is aligned with the pre-collimator pattern (61).

A grating for line-narrowing a laser beam that is outputted from a laser apparatus at a wavelength in a vacuum ultraviolet region may include: a grating substrate; a first aluminum metal film formed above the grating substrate, the first aluminum metal film having grooves in a surface thereof; and a first protective film formed by an ALD method above the first aluminum metal film.

Provided are a mask inspection apparatus and a mask inspection method that can prevent a reduction in a reflectance of a drop-in mirror, which is caused by carbon contaminants. A mask inspection apparatus according to the present invention includes a drop-in mirror including multi-layer film and a reflective surface. The drop-in mirror is configured to reflect illumination light incident on the reflective surface and illuminate the mask. An area of the reflective surface is configured to be greater than an area of an illuminated spot irradiated with the illumination light on the reflective surface. The drop-in mirror is configured to be movable. A position of the illuminated spot on the reflective surface is configured to be moved when the drop-in mirror is moved.

Phase stepping for differential phase contrast and/or dark field x-ray imaging using a switchable grating in which particles in a reservoir are aligned into wall-like x-ray absorbing structures by inducing a standing wave in a medium in the reservoir. The standing wave is modified by a second ultrasound generator that modifies the standing wave such that the pressure nodes of the first standing wave shift position.

A diffractive optical element prevents degradation of the optical performance of the element due to moisture absorption of the resin layers from taking place and also can prevent cracks of the resin layers and peeling of the resin layers along the interface thereof from taking place in a hot environment or in a cold environment. The diffractive optical element comprises a first layer and a second layer sequentially laid on a substrate, a diffraction grating being formed at the interface of the first layer and the second layer, the height d of the diffraction grating, the average film thickness t1 of the first layer and the average film thickness t2 of the second layer satisfying the relationship requirements expressed by the expressions of 1.1×d≤t1≤50 μm and 30 μm≤t2≤(400 μm−t1−d).