A beam guide guides a laser beam on a device for extreme ultraviolet lithography. The beam guide has a scraper mirror for coupling out laser radiation and a positioning device for positioning the scraper mirror in a positioning plane defined by first and second positioning axes. The positioning device contains first and second positioning units assigned to the first and second positioning axes, respectively. The first positioning unit has a first linear guide and a first positioning drive. By the first positioning drive, the scraper mirror is moved together with the mirror-side guide element of the first linear guide relative to the mirror-remote guide element of the first linear guide along the first positioning axis into a target position. The second positioning unit has a second linear guide and a second positioning drive, the second linear guide has a mirror-side guide element and a mirror-remote guide element.

A bipod flexure mount couples an optic to a base while isolating the optic from strain to resist wavefront error. The bipod flexure mount has a distal attachment pad to be coupled to the optic and a proximal attachment pad to be coupled to the base. A pair of beams extend between and couple the distal and proximal attachment pads. The distal attachment pad, the proximal attachment pad and the pair of beams are disposed in and define a planar layer with opposite planar surfaces that are substantially parallel. The bipod flexure mount is relatively flexible about four degrees of freedom and is relatively stiff about two degrees of freedom.

A head-mounted fixing device includes: a head frame including two side frame portions, and a front frame portion located between the two side frame portions and connected to the two side frame portions, and the two side frame portions and the front frame portion being made of rigid materials; an elastic piece including one end connected to the front frame portion; a headgear including an arc portion and a top portion, wherein two ends of the arc portion are respectively connected to the two side frame portions, one end of the top portion is connected to another end of the elastic piece, and another end of the top portion is connected to the arc portion; it is characterized in that the front frame portion is used to abut against a user's forehead to provide a fulcrum.

There is provided a light source module in which an optical element is accommodated in a housing, in which three projection portions are provided in the housing, and the light source module has a structure where the optical element is pressed to be brought into contact with the three projection portions by a pressing member, so that the optical element is fixed in the housing.

A laser beam alignment system includes at least one mirror with a surface pattern configured to receive and reflect a laser beam, at least one detector configured to detect a deflected portion of a laser beam from the mirror, and at least one controller configured to communicate with the at least one mirror and the at least one detector and to control the mirror position on the basis of the deflected portion of the laser beam.

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (41). Position- and orientation data of the removed mirror for replacement are measured (43) by a position -and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured (46) using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked (48) on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (54). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.

The disclosure provides an optical module comprising a first frame, a second frame, a pillar and an optical component. The first frame has an adjustment portion, and the adjustment portion has a guiding slot. The second frame is rotatably connected to the first frame along the first axis. The pillar is connected to the second frame and is disposed through the guiding slot. The pillar is configured to be subjected to force and swing in the guiding slot to drive the second frame to rotate around the first axis. The optical component is disposed on the second frame. In addition, a projector with the optical module is also disclosed, and the rotation angle of the optical component can be accurately adjusted by the optical module.

A system for providing two parallel light beams spaced-apart a selectable distance, the system including: a first beam splitter configured for reflecting a light beam from a light source to create a first datum light beam, the first beam splitter is fixedly attached to a base; a second beam splitter configured for reflecting a transmitted light beam from the light beam from the light source to create a second datum light beam, a third beam splitter configured for reflecting a transmitted light beam from the light beam from the light source to create a third datum light beam, a fourth beam reflecting device configured for reflecting a transmitted light beam from the light beam from the light source to create a fourth light beam. Each of the second, third beam splitters and fourth beam reflecting device is configured to be slidingly attached to the base.

A metrology frame configured to receive and secure a workpiece in preparation for an interferometric determination of a spatial profile of the workpiece with the use of one or more retroreflectors removably cooperated with the frame in known pre-determined spatial relationship with respect the fiducial features of not only the workpiece but those of the metrology frame itself The metrology frame is necessarily devoid of a holographic optical element, while the measurement apparatus containing such metrology frame employs a hologram configured to generate at least one alignment optical wavefront that spatially converges on the retroreflector. The hologram is preferably structured as a set of constituent holographic regions (contained in the same, unitary or spatially-complementary housing and/or substrate) that perform different but operationally-complementary functions to facilitate the alignment of the metrology frame with respect to the converging optical wavefront with or without the workpiece in the frame. The optical measurement system employing the metrology frame and the hologram. Methods of optical alignment with use of same.