An optical assembly of a microlithography imaging device comprises a holding device for holding an optical element. The holding device has a holding element having first and second interface sections. The first interface section for a first interface connecting the holding element and the optical element in an installed state. The second interface section forms a second interface connecting the holding element and a support unit in the installed state. The support unit connects the optical element to a support structure to support the optical element on the support structure via a supporting force. The holding device comprises an actuator device engaging on the holding element between the first and second interfaces. The actuator device acts on the holding element via a controller so that a specifiable interface deformation and/or a specifiable interface force distribution acting on the optical element is set on the first interface.

The invention relates to an adaptive optical system (1) comprising: an adaptive optical device (2) comprising an optical processing surface (3) and a driving device (5) for controllably modifying the optical behaviour of said optical processing surface (3), an optical analyser (6) intended to be subjected to an input light beam (7) in order to produce, in response, output signals (8, 9, 10), a control device (11) connected to the optical analyser (6) and to the driving device (5) in order to command the latter depending on said output signals (8, 9, 10), characterised in that said optical analyser (6) is designed to spatially demultiplex, via multi-plane light conversion, the input light beams (7) into a plurality of elementary output light beams (80, 90, 100). Adaptive optical systems.

The invention relates to an adaptive optical system (1) comprising: an adaptive optical device (2) comprising an optical processing surface (3) and a driving device (5) for controllably modifying the optical behaviour of said optical processing surface (3), an optical analyser (6) intended to be subjected to an input light beam (7) in order to produce, in response, output signals (8, 9, 10), a control device (11) connected to the optical analyser (6) and to the driving device (5) in order to command the latter depending on said output signals (8, 9, 10), characterised in that said optical analyser (6) is designed to spatially demultiplex, via multi-plane light conversion, the input light beams (7) into a plurality of elementary output light beams (80, 90, 100). Adaptive optical systems.

An optical assembly of a projection exposure apparatus for semiconductor lithography comprises an optical element and an actuator for deforming the optical element. The actuator is subjected to a bias voltage by a controller that is present. A projection exposure apparatus for semiconductor lithography comprises an optical assembly. A method for operating an actuator for deforming an optical element for semiconductor lithography comprises subjecting the actuator to a bias voltage by a controller.

A system and method for measurement and correction of aero-optical and aero-thermal effects to an EO/IR sensor's window/dome on a supersonic flight-vehicle. Range-gating of laser pulses measures and separates aerodynamic and atmospheric effects. Separate control algorithms and control loops at different update rates both simplifies the control algorithms and improves overall performance. The use of a MEMS MMA having tip/tilt/piston capabilities as the deformable mirror to provide wavefront correction enhances overall performance. The corrected laser pulses may also be used to actively illuminate a target to provide both active and passive detection.

An amplified laser device is provided with one or more Micro-Electro-Mechanical System (MEMS) Micro-Mirror Arrays (MMAs) having tip, tilt and piston capability positioned on either side of the optical amplifier to correct the profile of the beam to improve the gain performance of the optical amplifier or to compensate for atmospheric distortion while steering the amplified beam over a FOR. The MEMS MMAs may be positioned in front of, behind or on both sides of the amplifier. The MEMS MMAs can be configured to optimize the combined amplifier performance, static and time varying, and compensation for atmospheric distortion together or separately.

An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

An oscillator system includes an electrostatic oscillator structure configured to oscillate about an axis based on a deflection that varies over time; an actuator configured to drive the electrostatic oscillator structure about the axis, the actuator including a first capacitive element having a first capacitance dependent on the deflection and a second capacitive element having a second capacitance dependent on the deflection; a sensing circuit configured to receive a first displacement current from the first capacitive element and a second displacement current from the second capacitive element, to integrate the first displacement current to generate a first capacitive charge value, and to integrate the second displacement current to generate a second capacitive charge value; and a measurement circuit configured to receive the first and the second capacitive charge values and to measure the deflection of the electrostatic oscillator structure based on the first and the second capacitive charge values.

A projection exposure apparatus comprises a projection objective, and the projection objective comprises an optical device, wherein the optical device comprises an optical element having an optically effective surface and an electrostrictive actuator. The electrostrictive actuator is deformable by a control voltage being applied. The electrostrictive actuator is functionally connected to the optical element to influence the surface shape of the optically effective surface. A control device supplies the electrostrictive actuator with the control voltage. A measuring device is configured, at least at times while the electrostrictive actuator influences the optically effective surface of the optical element, to measure directly and/or to determine indirectly the temperature and/or a temperature change of the electrostrictive actuator and/or the surroundings thereof to take account of a temperature-dependent influence during driving of the electrostrictive actuator by the control device.

A system for fastening a mirror to a support is disclosed including intermediate structures, for example bipod structures. At least some of the intermediate structures are provided with torsion devices making it possible to at least partially compensate for optical aberrations of an instrument that includes the mirror. Each torsion device may comprise an elastic element and a variator. The variator is designed to control a deformation of the elastic element, resulting in a torque which is applied to the mirror.