Embossing resins, methods of manufacturing such resins, and electrokinetic display system, which includes display cells containing such resins. The resins include a fluoropolymer in weight percentage 5%-60%, a difunctional diluent in weight percentage 0-30%, a monofunctional diluent in weight percentage 0-40%, a urethane diacrylate or functionalized nanoscale material, e.g., a functionalized urethane material, in weight percentage 5-50%, a photoinitiator in weight percentage 0.5-5%, and a surfactant in weight percentage less than 0.5%. The difunctional diluent may be Hexanediol Diacrylate, and the monofunctional diluent may be a monofunctional hydrocarbon. The resins are made by identifying a target index of refraction for a cured state thereof, and combining together, by weight percentage, the constituent components to produce the liquid state version of the embossing resin having a desired composite index of refraction.

Embossing resins, methods of manufacturing such resins, and electrokinetic display system, which includes display cells containing such resins. The resins include a fluoropolymer in weight percentage 5%-60%, a difunctional diluent in weight percentage 0-30%, a monofunctional diluent in weight percentage 0-40%, a urethane diacrylate or functionalized nanoscale material, e.g., a functionalized urethane material, in weight percentage 5-50%, a photoinitiator in weight percentage 0.5-5%, and a surfactant in weight percentage less than 0.5%. The difunctional diluent may be Hexanediol Diacrylate, and the monofunctional diluent may be a monofunctional hydrocarbon. The resins are made by identifying a target index of refraction for a cured state thereof, and combining together, by weight percentage, the constituent components to produce the liquid state version of the embossing resin having a desired composite index of refraction.

Methods relating to and an apparatus including: a smart device and an integrated heating module are provided. The apparatus includes: a smart device having an electrically switchable material, a first transparent layer and a second transparent layer, wherein the electrically switchable material is retained between a first transparent layer and a second transparent layer; and an integrated heating module configured between the electrically switchable material and one of: the first transparent layer and the second transparent layer, wherein the integrated heating module is configured to provide resistant heating along at least a portion of the electrically switchable material.

Some embodiments are directed to a light modulator comprising transparent or reflective substrates, multiple electrodes being applied to the substrates in a pattern across the substrate. A controller may apply an electric potential to the electrodes to obtain an electro-magnetic field between the electrodes providing electrophoretic movement of the particles towards or from an electrode.

A display panel, a driving method thereof and a display device are provided. The display panel includes a plurality of pixel units each of which includes a transparent electrode; a pixel electrode opposite to the transparent electrode; an auxiliary electrode at a side of the transparent electrode facing the pixel electrode, a channel penetrating through the auxiliary electrode; an electrostrictive dielectric layer between the auxiliary electrode and the transparent electrode, an accommodation space being formed in the electrostrictive dielectric layer; and charged particles located between the transparent electrode and the pixel electrode. The through channel is configured to allow the charged particles to pass through the auxiliary electrode through the through channel, and the electrostrictive dielectric layer is configured to selectively confine the charged particles in the accommodation space according to an electric field applied thereto.

Layered dielectric materials for use in controlling dielectric strength in microelectronic devices, especially as they relate to electrophoretic and electrowetting applications. Specifically, a combination of a first atomic layer deposition (ALD) step, a sputtering step, and a second ALD step result in a layer that is chemically robust and nearly pinhole free. The dielectric layer may be disposed on the transparent common electrode of an electrophoretic display or covering the pixelated backplane electrodes, or both.

Layered dielectric materials for use in controlling dielectric strength in microelectronic devices, especially as they relate to electrophoretic and electrowetting applications. Specifically, a combination of a first atomic layer deposition (ALD) step, a sputtering step, and a second ALD step result in a layer that is chemically robust and nearly pinhole free. The dielectric layer may be disposed on the transparent common electrode of an electrophoretic display or covering the pixelated backplane electrodes, or both.

A display apparatus including a first substrate, a first electrode, a second substrate, a first microlens layer, a second microlens layer, a second electrode, a blocking wall structure, an electrophoresis medium, and multiple particles. The first electrode is disposed on the first substrate. The first microlens layer, having multiple first microlenses, is disposed on the second substrate. The second microlens layer, having multiple second microlenses, is disposed on the first microlens layer. The second electrode is disposed on the second microlens layer. The blocking wall structure is at least disposed between the first electrode and the second electrode and has an accommodating space corresponding to the first electrode. The electrophoresis medium is disposed in the accommodating space. The first microlens layer and the second microlens layer are disposed between the second substrate and at least a portion of the electrophoresis medium. The particles are mixed within the electrophoresis medium.

In an electro-optical device, a first opening and a second opening are provided in an interlayer insulating layer provided in a layer between a transistor and a scanning line, with a semiconductor layer interposed between the first opening and the second opening in plan view. A portion of a gate electrode is provided inside the first opening, and the gate electrode is electrically connected to the scanning line via the first opening. The second opening does not overlap with the gate electrode, and a portion of a first capacitance electrode of a capacitance element is provided in the second opening, the first capacitance electrode having light shielding properties. Therefore, the width of the scanning line can be made narrower than in a case in which the gate electrode and the scanning line are electrically connected to each other via both the first opening and the second opening.

In an electro-optical device, a first opening and a second opening are provided in an interlayer insulating layer provided in a layer between a transistor and a scanning line, with a semiconductor layer interposed between the first opening and the second opening in plan view. A portion of a gate electrode is provided inside the first opening, and the gate electrode is electrically connected to the scanning line via the first opening. The second opening does not overlap with the gate electrode, and a portion of a first capacitance electrode of a capacitance element is provided in the second opening, the first capacitance electrode having light shielding properties. Therefore, the width of the scanning line can be made narrower than in a case in which the gate electrode and the scanning line are electrically connected to each other via both the first opening and the second opening.