Methods of micro- and nano-patterning substrates to form transparent conductive electrode structures or polarizers by continuous near-field optical nanolithography methods using a roll-type photomask or phase-shift mask are provided. In such methods, a near-field optical nanolithography technique uses a phase-shift or photo-mask roller that comprises a rigid patterned externally exposed surface that transfers a pattern to an underlying substrate. The roller device may have an internally disposed radiation source that generates radiation that passes through the rigid patterned surface to the substrate during the patterning process. Sub-wavelength resolution is achieved using near-field exposure of photoresist material through the cylindrical rigid phase-mask, allowing dynamic and high throughput continuous patterning.

A 3D grating, a color filter substrate, a display device and a control method thereof are provided. The 3D grating comprises: a first transparent electrode layer; a second transparent electrode layer; and an electrochromic material layer formed between the first transparent electrode layer and the second transparent electrode layer; wherein the first transparent electrode layer comprises a pattern of strip-shaped electrodes, which comprises a plurality of strip-shaped electrodes and an electrode wire electrically connected with each of the strip-shaped electrodes in the pattern; and wherein the electrochromic material layer is configured to be non-transparent when it is in an electric field and to be transparent when it is not in an electric field, or the electrochromic material layer is configured to be transparent when it is in an electric field and to be non-transparent when it is not in an electric field.