G03C1/09

THERMALLY-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND PREPARATION METHOD THEREOF
20190235376 · 2019-08-01 ·

Provided is a thermally-developable photosensitive material having a support, an image forming layer, which contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, on one surface of the support, and a non-photosensitive back layer on the other surface of the support, in which either the image forming layer or the image forming layer and the non-photosensitive back layer contain an infrared absorbing dye which absorbs at least infrared having a wavelength equal to or longer than 700 nm. Also provided is a manufacturing method of the thermally-developable photosensitive material.

THERMALLY-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND PREPARATION METHOD THEREOF
20190235376 · 2019-08-01 ·

Provided is a thermally-developable photosensitive material having a support, an image forming layer, which contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, on one surface of the support, and a non-photosensitive back layer on the other surface of the support, in which either the image forming layer or the image forming layer and the non-photosensitive back layer contain an infrared absorbing dye which absorbs at least infrared having a wavelength equal to or longer than 700 nm. Also provided is a manufacturing method of the thermally-developable photosensitive material.

Patterning continuous webs with protected electrically-conductive grids

A method is used to provide an electrically conductive article. The method includes: (i) providing a continuous polymeric web of a transparent polymeric substrate; (ii) forming a first photocurable pattern on at least a first portion on a first supporting side of the continuous polymeric web using a photocurable composition comprising metal particles; (iii) exposing the photocurable pattern to form a photocured pattern on the first portion of the first supporting side; (iv) electrolessly plating the photocured pattern with an electrically-conductive metal to form an electrically-conductive metal pattern; and (v) forming a dry outermost polymeric coating over at least part but not all of the electrically-conductive pattern, the dry polymeric coating having a dry thickness of less than 5 m, an integrated transmittance of at least 80%, and comprising a non-crosslinked thermoplastic polymer having a glass transition temperature (T.sub.g) that is equal to or greater than 65 C.