An environmentally friendly photoresist removing composition includes 20 parts by weight to 80 parts by weight of a carbonate compound, 0.5 parts by weight to 15 parts by weight of a hydramine compound, an amide compound, or an ammonium compound, 1 part by weight to 20 parts by weight of an organic base compound, and 2 parts by weight to 70 parts by weight of an alcohol ether compound.

The present invention provides a method for producing a radiation-sensitive resin composition, in which an inter-lot variation in performance of radiation-sensitive resin compositions that have been filtered is suppressed, a pattern forming method, and a method for producing an electronic device. The method for producing a radiation-sensitive resin composition of an embodiment of the present invention has a step 1 of bringing a first solution including a first organic solvent into contact with a first filter to clean the first filter, and a step 2 of filtering a radiation-sensitive resin composition using the first filter cleaned in the step 1.