A method of manufacturing a security device including: conveying a substrate web including a photosensitive film along a transport path; exposing the photosensitive film to radiation of a predetermined wavelength through a mask, wherein the mask includes a predetermined pattern of regions which are substantially opaque to radiation of the predetermined wavelength and at least semi-transparent to radiation of the predetermined wavelength, respectively; during the exposure, moving the mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web; and heating the substrate web including the exposed photosensitive film. In this way, regions of the photosensitive film exposed to the radiation of the predetermined wavelength undergo an increase in optical density such that the photosensitive film displays a reproduction of the predetermined pattern.

A method of manufacturing a security device including: conveying a substrate web including a photosensitive film along a transport path; exposing the photosensitive film to radiation of a predetermined wavelength through a mask, wherein the mask includes a predetermined pattern of regions which are substantially opaque to radiation of the predetermined wavelength and at least semi-transparent to radiation of the predetermined wavelength, respectively; during the exposure, moving the mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web; and heating the substrate web including the exposed photosensitive film. In this way, regions of the photosensitive film exposed to the radiation of the predetermined wavelength undergo an increase in optical density such that the photosensitive film displays a reproduction of the predetermined pattern.

A method and security device, including: a semi-transparent layer exhibiting a first pattern of regions having high optical density and/or raised surface profile relative to layer intervening regions; and a color layer exhibiting a second pattern of elements of at least one color. First and second patterns partially overlap and are configured so the device, appearance varies at different viewing angles. First pattern has color layer following the contours of raised regions. Security device includes: a photosensitive film exhibiting pattern of regions of relatively high and low optical density, the pattern arising from photosensitive film exposure to radiation of a responsive predetermined wavelength from the photosensitive film; and a color layer overlapping the pattern exhibited by photosensitive film, which exhibits increase in optical density upon radiation exposure of a predetermined wavelength and concurrent or subsequent heating. Increases in optical density being due to the bubbles formation within the photosensitive film.

A method and security device, including: a semi-transparent layer exhibiting a first pattern of regions having high optical density and/or raised surface profile relative to layer intervening regions; and a color layer exhibiting a second pattern of elements of at least one color. First and second patterns partially overlap and are configured so the device, appearance varies at different viewing angles. First pattern has color layer following the contours of raised regions. Security device includes: a photosensitive film exhibiting pattern of regions of relatively high and low optical density, the pattern arising from photosensitive film exposure to radiation of a responsive predetermined wavelength from the photosensitive film; and a color layer overlapping the pattern exhibited by photosensitive film, which exhibits increase in optical density upon radiation exposure of a predetermined wavelength and concurrent or subsequent heating. Increases in optical density being due to the bubbles formation within the photosensitive film.

There are provided an image forming method, an image forming apparatus, and an image forming program capable of giving a temporal change to an observation image by intentionally providing a time difference between image appearance recognition timings for a plurality of regions of the observation image. There is provided an image forming method of forming an observation image by exposing a photographic photosensitive material using an input image and performing development processing. The observation image includes an image A of a first image region in which the image appearance recognition timing after a start of development processing is relatively earlier and an image B of a second image region in which the image appearance recognition timing after a start of development processing is relatively later. First, two original images are acquired, and a first original image and a second original image respectively corresponding to the first image region and the second image region are determined. For the first original image and the second original image, a first drawing condition that satisfies a condition of the image appearance recognition timing of the first image region and a second drawing condition that satisfies a condition of the image appearance recognition timing of the second image region are created. The input image which is to be used for forming the observation image is generated based on the first original image, the first drawing condition, the second original image, and the second drawing condition.

Provided is a thermally-developable photosensitive material having a support, an image forming layer, which contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, on one surface of the support, and a non-photosensitive back layer on the other surface of the support, in which either the image forming layer or the image forming layer and the non-photosensitive back layer contain an infrared absorbing dye which absorbs at least infrared having a wavelength equal to or longer than 700 nm. Also provided is a manufacturing method of the thermally-developable photosensitive material.

A method of manufacturing a security device component includes: providing a photosensitive film including a diazonium compound which decomposes upon exposure to radiation of a predetermined wavelength; providing a dye coupler film comprising one or more dye coupler compositions; exposing elements of the photosensitive film to radiation of the predetermined wavelength in accordance with a predetermined pattern; and contacting at least part of the exposed photosensitive film against at least part of the dye coupler film so as to effect at least partial transfer of the one or more dye coupler compositions to the exposed photosensitive film, whereupon unexposed elements of the photosensitive film exhibit one or more colours such that the photosensitive film exhibits a reproduction of the predetermined pattern.

A method of manufacturing a security device component includes: providing a photosensitive film including a diazonium compound which decomposes upon exposure to radiation of a predetermined wavelength; providing a dye coupler film comprising one or more dye coupler compositions; exposing elements of the photosensitive film to radiation of the predetermined wavelength in accordance with a predetermined pattern; and contacting at least part of the exposed photosensitive film against at least part of the dye coupler film so as to effect at least partial transfer of the one or more dye coupler compositions to the exposed photosensitive film, whereupon unexposed elements of the photosensitive film exhibit one or more colours such that the photosensitive film exhibits a reproduction of the predetermined pattern.