Patent classifications
G03F7/0005
PATTERN-FORMING COMPOSITION
Provided is, for example, a pattern-forming composition that contains a triazine ring-containing polymer having a predetermined repeating unit structure, represented by formula [4] below, a crosslinking agent, and an organic solvent.
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OPTICAL SYSTEM AND METHOD OF FORMING THE SAME
Various embodiments may relate to an optical system. The optical system may include a lens structure configured to generate an outgoing Gaussian beam based on an incoming Gaussian beam. The optical system may also include a light source configured to provide the incoming Gaussian beam to the lens structure. The lens structure may be a flat lens or a phase plate.
CONTROLLING POROSITY OF AN INTERFERENCE LITHOGRAPHY PROCESS BY FINE TUNING EXPOSURE TIME
A method to control the density of a three-dimensional photonic crystal template involves changing the irradiation time from at least four laser beams to yield a periodic percolating matrix of mass and voids free of condensed matter from a photoresist composition. The photoresist composition includes a photoinitiator at a concentration where the dose or irradiation is controlled by the irradiation time and is less than the irradiation time that would convert all photoinitiator to initiating species such that the density of the three-dimensional photonic crystal template differs for different irradiation times. A deposition of reflecting or absorbing particles can be patterned on the surface of the photoresist composition to form a template with varying densities above different areas of the substrate.
Methods for controlling etch depth by localized heating
Embodiments of the present disclosure relate to methods for controlling etch depth by providing localized heating across a substrate. The method for controlling temperatures across the substrate can include individually controlling a plurality of heating pixels disposed in a dielectric body of a substrate support assembly. The plurality of heating pixels provide temperature distributions on a first surface of the substrate disposed on a support surface of the dielectric body. The temperature distributions correspond to a plurality of portions of at least one grating on a second surface of the substrate to be exposed to an ion beam. Additionally, the temperatures can be controlled by individually controlling light emitting diodes (LEDs) of LED arrays. The substrate is exposed to the ion beam to form a plurality of fins on the at least one grating. The at least one grating has a distribution of depths corresponding to the temperature distributions.
Photocurable composition for three-dimensional stereolithography and three-dimensional object
A photocurable composition for three-dimensional stereolithography which has a lower viscosity and from which a cured product having a high refractive index is obtained, and a three-dimensional object formed by using the composition. The composition is a photocurable composition for three-dimensional stereolithography containing a fluorene monomer, a carbazole monomer, a diluent monomer, and a photopolymerization initiator, the carbazole monomer being contained in an amount of less than 30 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer, and the diluent monomer being contained in an amount of at least 20 wt % with respect to total solids.
Gray-tone lithography for precise control of grating etch depth
Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.
Methods of greytone imprint lithography to fabricate optical devices
A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template.
Method for Manufacturing Multi-Stage Compound Eye Lens
A method for manufacturing a multi-stage compound eye lens includes the steps of manufacturing a micropillar array using a photoetching method, then sputtering ZnO on the surface of the micropillar array, jet printing an ultraviolet curing adhesive onto gaps in the micropillar array using a micro jet printing machine, and controlling the morphology of microlens using the number of droplet dropping instances to obtain a microlens array; further respectively dissolving hexamethyl tetramine and zinc nitrate in deionized water, then pouring the hexamethyl tetramine solution into the zinc nitrate solution to obtain a mixed solution, placing the microlens array into the mixed solution, and placing is in a water bath kettle for a water bath, and finally, removing the microlens array from the mixed solution, rinsing it with deionized water, and drying same to obtain the multi-stage compound eye lens.
PHOTOSENSITIVE COMPOSITION, CURED FILM, COLOR FILTER, LIGHT SHIELDING FILM, OPTICAL ELEMENT, SOLID-STATE IMAGING ELEMENT, INFRARED SENSOR, AND HEADLIGHT UNIT
The present invention provides a photosensitive composition with which a cured film having excellent patterning properties and excellent electrode anticorrosion properties can be produced. In addition, it also provides a cured film formed of the photosensitive composition, a color filter, a light shielding film, an optical element, a solid-state imaging element, an infrared sensor, and a headlight unit.
The photosensitive composition of the present invention contains a zirconium nitride-based particle containing one or more selected from the group consisting of zirconium nitride and zirconium oxynitride a resin, a polymerizable compound, and a photopolymerization initiator, in which the zirconium nitride-based particle contains 0.001% to 0.400% by mass of a Fe atom with respect to a total mass of the zirconium nitride-based particle.
SURFACE TREATMENT FOR REPLICATION
A method includes treating a surface of a substrate to cause the surface to include a hydrophobic portion and a hydrophilic portion, providing a replication material over the hydrophilic portion, and imprinting the replication material to cause the replication material to have a predetermined characteristic.