The present invention pertains to a spin coating composition comprising a carbon material and a metal organic compound. The invention also pertains to a method of using the same to form a metal oxide film above a substrate and manufacturing a device.

A method of forming a pattern in a photoresist includes forming a photoresist layer over a substrate, and selectively exposing the photoresist layer to actinic radiation to form a latent pattern. The latent pattern is developed by applying a developer composition to the selectively exposed photoresist layer to form a pattern. The developer composition includes a first solvent having Hansen solubility parameters of 15<δ.sub.d<25, 10<δ.sub.p<25, and 6<δ.sub.h<30; an acid having an acid dissociation constant, pKa, of −15<pKa<5, or a base having a pKa of 40>pKa>9.5; and a second solvent having a dielectric constant greater than 18. The first solvent and the second solvent are different solvents.

A method for manufacturing a semiconductor device includes forming a photoresist layer comprising a photoresist composition over a substrate to form a photoresist-coated substrate. The photoresist layer is selectively exposed to actinic radiation to form a latent pattern in the photoresist layer. The latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a patterned photoresist layer exposing a portion of the substrate, and a purge gas is applied to the patterned photoresist layer.

There are provided a printer device, a printing method, and a program that can appropriately output an exposure start signal without requiring a film detection device. A printer device includes a loading chamber into which a film cartridge is to be loaded, an exposure head device that is disposed to face a photosensitive surface of a film discharged from the film cartridge and exposes the film to light, a spreading roller that splits a developer pod of the film to spread a developer to the film, a transport roller that transports the film, and a load measuring device that measures a change in load occurring in a case where the film enters at least the spreading roller or the transport roller.

A system including two dimensional, microelectromechanical system (MEMS) based spatial light modulators and anamorphic optics for improved contrast is provided. Generally, the system comprises an array of modulators having a plurality of pixels along a longitudinal axis, each pixel comprising a plurality of modulators along a transverse axis of the array. An illumination source including a laser and anamorphic optics for focuses light from the laser onto the array, and imaging optics focus modulated light from the array onto an image plane. The anamorphic optics are configured to provide a transverse numerical aperture (NA) along the transverse axis of the array that is smaller than a diffraction angle of the modulated light reflected from the array along a transverse axis of the image plane, and a longitudinal NA along the longitudinal axis of the array that is greater than the transverse NA. Other embodiments are also provided.

A spin coater may include a spin chuck, a nozzle, a first temperature controller and a second temperature controller. The spin chuck may be configured make contact with a central portion of a lower surface of a substrate and may be configured to rotate the substrate when photoresist is on the substrate. The nozzle may be arranged over a central portion of the spin chuck and configured to provide a central portion of an upper surface of the substrate with photoresist. The first temperature controller may be configured to control a temperature in a first region of the spin chuck. The second temperature controller may be configured to control a temperature in a second region of the spin chuck.

A substrate processing method includes forming a layer of an inorganic photoresist composition on a substrate, irradiating the layer of the inorganic photoresist composition with extreme ultraviolet (EUV) light using an exposure mask, baking the layer of the inorganic photoresist composition, which is irradiated with EUV light, developing the layer of the inorganic photoresist composition using a developer to form a first inorganic photoresist pattern, performing plasma treatment on the first inorganic photoresist pattern to form a second inorganic photoresist pattern, and processing the substrate using the second inorganic photoresist pattern as a process mask, wherein the plasma treatment uses plasma of a process gas capable of generating hydrogen ions and fluorine ions.

A method of forming a pattern in a photoresist includes forming a photoresist layer over a substrate, and selectively exposing the photoresist layer to actinic radiation to form a latent pattern. The latent pattern is developed by applying a developer composition to the selectively exposed photoresist layer to form a pattern. The developer composition includes a first solvent having Hansen solubility parameters of 15<δ.sub.d<25, 10<δ.sub.p<25, and 6<δ.sub.h<30; an acid having an acid dissociation constant, pKa, of −15<pKa<5, or a base having a pKa of 40>pKa>9.5; and a second solvent having a dielectric constant greater than 18. The first solvent and the second solvent are different solvents.

A nozzle unit for a liquid treatment apparatus that performs a liquid treatment on a substrate using a liquid, includes a first gas nozzle having a discharge flow path for allowing a first gas to flow through the discharge flow path and a first discharge port for discharging the first gas flowing through the discharge flow path toward a surface of the substrate, wherein the first discharge port is formed so as to extend in a first direction along the surface, and wherein a width of the discharge flow path in the first direction increases as the discharge flow path approaches the first discharge port, so that the first gas is discharged radially from the first discharge port.

A developing device and a developing method are provided. The developing device includes a developing chamber, a conveyor table, and an air ejection member. A spraying member in the developing chamber sprays a developing agent onto a surface of a display device. The conveyor table moves the display device from outside of the developing chamber to inside of the developing chamber, and from inside of the developing chamber to outside of the developing chamber. The air ejection member ejects airflow onto the display device. The developing agent disposed on the display device can be prevented from flowing out of the developing chamber.