G03F7/004

RESIST MATERIAL AND PATTERNING PROCESS
20230050585 · 2023-02-16 · ·

The present invention is a resist material containing a base polymer and an acid generator, where the resist material contains, as the acid generator, a sulfonium salt or iodonium salt of a sulfonic acid bonded to a maleimide group. In a chemically amplified resist material in which an acid is used as a catalyst, it is desired to develop an acid generator that makes it possible to reduce LWR of line patterns and critical dimension uniformity (CDU) of hole patterns, and to improve sensitivity. For this purpose, it is necessary to reduce image blurs due to acid diffusion considerably. An object of the present invention is to provide: a resist material having high sensitivity and low CDU in both a positive resist material and a negative resist material; and a patterning process using the same.

METHOD FOR REMOVING FLUOROPOLYMER LIFT-OFF LAYER

The invention pertains to a method of removing a layer of a lift-off fluoropolymer layer from a substrate using a particular stripping solvent, and to a lithographic process using said combination of lift-off fluoropolymer and stripping solvent, in particular for the manufacture of OLED devices.

Organometallic cluster photoresists for EUV lithography

The present disclosure is directed to organotin cluster compounds having formula (I) and their use as photoresists in extreme ultraviolet lithography processes. ##STR00001##

Resist composition and patterning process

A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition. ##STR00001##

Films with narrow band emission phosphor materials

A color conversion film is provided. The film includes at least one narrow band emission phosphor dispersed within a binder matrix, wherein the narrow band emission phosphor has a D50 particle size from about 0.1 μm to about 15 μm and is selected from the group consisting of a green-emitting U.sup.6+-containing phosphor, a green-emitting Mn.sup.2+-containing phosphor, a red-emitting phosphor based on complex fluoride materials activated by Mn.sup.4+, and a mixture thereof. A device is also provided.

Image differentiated multiplex assays

Provided herein are encoded microcarriers for analyte detection in multiplex assays. The microcarriers are encoded with an analog code for identification and include a capture agent for analyte detection. Also provided are methods of making the encoded microcarriers disclosed herein. Further provided are methods and kits for conducting a multiplex assay using the microcarriers described herein.

Zirconium nitride powder and method for producing same

A zirconium nitride powder which has a specific surface area of 20 to 90 m.sup.2/g as measured by a BET method, has a peak corresponding to zirconium nitride but does not have a peak corresponding to zirconium dioxide, a peak for lower zirconium oxide or a peak corresponding to lower zirconium oxynitride in an X-ray diffraction profile, and the light transmittance X at 370 nm is at least 18%, the light transmittance Y at 550 nm is 12% or less and the ratio (X/Y) of the light transmittance X at 370 nm to the light transmittance Y at 550 nm is 2.5 or more in the transmission spectra of a dispersion that contains the powder at a concentration of 50 ppm.

Positive resist composition and patterning process

A positive resist composition is provided comprising two onium salts, a base polymer comprising acid labile group-containing recurring units, and an organic solvent. The positive resist composition forms a pattern having PED stability and improved properties including DOF, LWR, and controlled footing profile.

COLORED RESIN COMPOSITION

An object of the present invention is to provide a colored resin composition, which is useful in production of a color filter suitable for an organic EL display device, excellent in low temperature curability, and also excellent in red color reproducibility. The present invention relates to the colored resin composition containing a colorant, a resin, a polymerizable compound, and a polymerization initiator, wherein the colorant is composed of only pigments, and the pigments include C.I. Pigment Violet 19, a red pigment and a yellow pigment.

COLORED RESIN COMPOSITION

An object of the present invention is to provide a colored resin composition, which is useful in production of a color filter suitable for an organic EL display device, excellent in low temperature curability, and also excellent in red color reproducibility. The present invention relates to the colored resin composition containing a colorant, a resin, a polymerizable compound, and a polymerization initiator, wherein the colorant is composed of only pigments, and the pigments include C.I. Pigment Violet 19, a red pigment and a yellow pigment.