There is a described a patch-clamp chip for making electrical measurements on a biological sample. The patch-clamp chip comprising a plurality of layers comprising poly-dimethylsiloxane (PDMS) forming a stack. It comprises at least a chip surface layer comprising an aperture formed therethrough and which upwardly opens on the surface, where the biological sample is provided. A microfluidic channel layer comprising PDMS extends below the plane of the chip surface layer and comprises a microfluidic channel formed therein. The aperture of the chip surface layer downwardly opens on the microfluidic channel. Electrophysiological measurements are made between an internal solution in the microfluidic channel and the external solution on the chip surface. The measurements can be performed via a bottom electrode. A plurality of apertures and corresponding microfluidic channels can be provided to perform simultaneous measurements on a plurality of samples, independently.

In an example of a method for making a flow cell, a light sensitive material is deposited over a resin layer including depressions separated by interstitial regions, wherein the depressions overlie a first resin portion having a first thickness and the interstitial regions overlie a second resin portion having a second thickness that is greater than the first thickness. A predetermined ultraviolet light dosage that is based on the first and second thicknesses is directed through the resin layer, whereby the light sensitive material overlying the depressions is exposed to ultraviolet light and the second resin portion absorbs the ultraviolet light, thereby defining an altered light sensitive material at a first predetermined region over the resin layer. The altered light sensitive material is utilized to generate a functionalized layer at the first predetermined region or at a second predetermined region over the resin layer.

In an example of a method for making a flow cell, a metal material is sputtered over a transparent substrate including depressions separated by interstitial regions to form a metal film having a first thickness over the interstitial regions and having a second thickness over the depressions, the second thickness being about 30 nm or less and being at least ⅓ times smaller than the first thickness. A light sensitive material is deposited over the metal film; and the metal film is used to develop the light sensitive material through the transparent substrate to define an altered light sensitive material at a first predetermined region over the transparent substrate. The altered light sensitive material is utilized to generate a functionalized layer at the first predetermined region or at a second predetermined region over the transparent substrate.

Apparatus for exposure of a relief precursor includes a substrate layer and at least one photosensitive layer. The apparatus includes a first light source configured to illuminate a first side of the relief precursor, a movable second light source configured to illuminate a second side of the relief precursor opposite the first side, a movable shield located between the first light source and the second light source and configured to capture at least a portion of the light of the second light source transmitted through the relief precursor, and a moving means configured to move the movable shield simultaneously with the second light source.

The present invention relates to a microstructure 20 having pores 22 on its surface or inside. The microstructure is a sheet containing an energy ray active resin 21. The pores 22 are formed in a vertical array and are in a formation pattern with a Talbot distance being specified by Formula 1 below:

Z.sub.T=(2nd.sup.2)/λ  [Formula 1] where Z.sub.T represents a Talbot distance (nm), n represents a refractive index, d represents a pitch distance (nm), and λ represents a light wavelength (nm). The pores have a periodic shape in the planar direction. Thus, the present invention provides three-dimensional microfabricated structures through which the periodicity is controlled.

Lithography fabrication methods for producing polymeric microneedles, microprobes, and other micron-sized structures with sharp tips. The fabrication process utilizes a single-step bottom-up exposure of photosensitive resin through a photomask micro-pattern, with a corresponding change/increase in refractive index of the resin creating a meta-state waveguide within the resin which focuses down additional transmitted energy and forms a converging shape (first harmonic microcone). Energy is diffracted through the tip of the first harmonic microcone as a second harmonic beam to form a second converging shape (second harmonic shape) adjacent the first microcone, followed by additional tertiary harmonic microcones, which can be built upon these structures with application of additional energy.

IR-sensitive lithographic printing plate precursors provide a stable print-out image using a unique IR radiation-sensitive composition in an infrared radiation-sensitive image-recording layer. This IR radiation-sensitive composition includes: (1) a free radical initiator composition comprising a borate compound; (2) a free radically polymerizable composition; (3) an acid-sensitive color-changing compound that is represented by the Formula (I) identified herein; (4) an infrared absorber material; and a (5) color-changing compound of Formula (III) or Formula (IV) identified herein. After IR imaging, the exposed precursors exhibit desirable printout images especially in the 600-700 nm region of the electromagnetic spectrum and especially for observation using electronic sensing devices. The imaged precursors can be developed off-press or on-press.

A device having a color photo resist pattern includes a 3D substrate, at least one color photo resist layer and at least one circuit pattern layer. The at least one color photo resist layer is formed on said 3D substrate and forms a visual pattern together. The at least one circuit pattern layer is formed on said visual pattern formed by said at least one color photo resist layer.

Methods for making a B-stage thiol-cured urethane acrylate elastomeric film are provided. At least a urethane acrylate oligomer, a multifunctional thiol, and a base catalyst are combined to form a thiol terminated B-stage elastomer. The thiol terminated B-stage elastomer is exposed to an ultraviolet photoinitiator in the presence of an allyl ether terminated urethane to form the B-stage thiol-cured urethane acrylate elastomeric film. In some embodiments the B-stage thiol-cured urethane acrylate elastomeric film is used for a soft actuator application such as a fluidic elastomer actuator application or an electrostatic zipping actuator application.

A method for exposing a photopolymerization layer comprising photopolymers includes: providing a printed circuit board, with a photopolymerization layer disposed on the top side of the printed circuit board; performing first-instance exposure on the photopolymerization layer, using a UV source and a digital micro-lens device, wherein the UV source is of a power less than 0.2 kW; stopping the first-instance exposure; covering the photopolymerization layer with a mask, with the mask having a bottom side in contact with the photopolymerization layer; and performing second-instance exposure on the photopolymerization layer, using a mercury lamp and the mask, wherein the mercury lamp is of a power greater than 5 kW.