In a method for fabricating a broadband near infrared plasmonic waveguide, the method includes forming a first pattern on a substrate. A metal thin film is evaporated on the substrate on which the first pattern is formed. The first pattern is removed from the substrate on which the metal thin film is evaporated, to remain a second pattern on the substrate on which the metal thin film is evaporated. The substrate on which the second pattern is formed is heated, to induce dewetting, so that metal nano particles are formed on the substrate.

The present disclosure provides methods, device, and system for wafer processing. The wafer processing apparatus uses lid dispenser to disperse at least one reagent to the surface of the wafer. Further, the wafer is positioned on top of a rotatable vacuum chuck configured to spread at least one reagent over the surface of the wafer via a centrifugal force or surface tension, thereby permitting the at least one reagent to react with an additional reagent. Further, when dispensing the at least one reagent, a separation gap between the lid dispenser and the wafer is at a predetermined distance, for example, from 50 m to 2 mm.

The present disclosure provides methods, device, and system for wafer processing. The wafer processing apparatus uses lid dispenser to disperse at least one reagent to the surface of the wafer. Further, the wafer is positioned on top of a rotatable vacuum chuck configured to spread at least one reagent over the surface of the wafer via a centrifugal force or surface tension, thereby permitting the at least one reagent to react with an additional reagent. Further, when dispensing the at least one reagent, a separation gap between the lid dispenser and the wafer is at a predetermined distance, for example, from 50 m to 2 mm.

A method includes providing a photoresist material into a dispenser nozzle having an orifice, emitting transmitted ultrasound waves through the photoresist material in the dispenser nozzle toward the orifice, detecting reflected ultrasound waves, and determining a property of the photoresist material or the nozzle by analyzing a waveform of the detected reflected ultrasound waves.