A processing system for processing a photosensitive flexographic printing plate having an aqueous-processable photopolymer. A main processing unit is used to develop a relief image by removing unexposed photopolymer using an aqueous processing solution including a first dispersing agent while the photosensitive flexographic printing plate is being subjected to mechanical cleaning. Used aqueous processing solution containing the removed photopolymer is returned back into a processing solution tank. A secondary processing unit is used to wash the developed relief image with secondary aqueous processing solution including a second dispersing agent to remove debris from the developed relief image. Used secondary aqueous processing solution containing the removed photopolymer is directed into the processing solution tank. A portion of the aqueous processing solution from the processing solution tank is removed to keep a volume of aqueous processing solution in the processing solution tank below a predefined maximum volume.

A method for processing a photosensitive flexographic printing plate having an aqueous-processable photopolymer. A main processing unit is used to develop a relief image by removing unexposed photopolymer using an aqueous processing solution including a first dispersing agent while the photosensitive flexographic printing plate is being subjected to mechanical cleaning. Used aqueous processing solution containing the removed photopolymer is returned back into a processing solution tank. A secondary processing unit is used to wash the developed relief image with secondary aqueous processing solution including a second dispersing agent to remove debris from the developed relief image. Used secondary aqueous processing solution containing the removed photopolymer is directed into the processing solution tank. A portion of the aqueous processing solution from the processing solution tank is removed to keep a volume of aqueous processing solution in the processing solution tank below a predefined maximum volume.

A method for lithography patterning includes forming a first layer over a substrate, the first layer being radiation-sensitive, exposing the first layer to a radiation, mixing a first solution and a second solution, thereby forming a developer, and dispensing the developer to the exposed first layer to form a pattern over the substrate. The dispensing of the developer includes varying a concentration of a developing chemical in the developer in multiple stages, such that the concentration of the developing chemical in the developer increases from a first stage to a subsequent second stage, and increases from the second stage to a subsequent third stage real-time during the dispensing.

There are provided a developer management method, a developer management device, a plate-making method, and a plate-making apparatus that can prevent development residues from being adhered, can perform appropriate development, and decrease the replacement frequency of a developer. A plate-making method has a developing step of removing and developing a non-exposed portion of an imagewise exposed flexographic printing plate precursor using a developer, a measuring step of measuring a conductivity of the developer used in removing the non-exposed portion of the imagewise exposed flexographic printing plate precursor, and a replenishing step of replenishing at least one liquid of a development replenishing liquid or water to the developer based on the conductivity measured in the measuring step such that the conductivity becomes a conductivity in a determined range.

A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.

A method for lithography patterning includes forming a first layer over a substrate, the first layer being radiation-sensitive. The method further includes exposing the first layer to a radiation. The method further includes applying a developer to the exposed first layer, resulting in a pattern over the substrate, wherein the developer includes a developing chemical whose concentration in the developer is a function of time during the applying of the developer.

A liquid chemical supply apparatus for supplying a liquid chemical to a plurality of substrate processing apparatuses disposed at different heights includes a pump for providing a hydraulic pressure for moving the liquid chemical to the substrate processing apparatuses, a plurality of liquid chemical supply lines having ends connected to the pump and other ends separately connected to the substrate processing apparatuses, to provide passages through which the liquid chemical moves, and a pump vent line connected to the pump to discharge some of the liquid chemical to outside, wherein flow rate calibration lines are connected between the liquid chemical supply lines and the pump vent line.

Provided are a treatment device and a treatment method capable of easily reusing a used rinsing liquid, and reducing the amount of waste liquid. A treatment device has: a developing portion which is provided with a developing unit which performs development by removing a non-exposed portion of a flexographic printing plate precursor after imagewise exposure using a developer containing a washing solution; a rinsing portion which is provided with a rinsing liquid supply portion which supplies a rinsing liquid containing substantially only water as a component to at least a surface of the flexographic printing plate precursor after development, from which the non-exposed portion of the flexographic printing plate precursor has been removed; a developer storage portion which has a developer storage tank which stores the developer which is used for the development in the developing portion; a first liquid feeding path through which the developer after development is fed to the developer storage tank of the developer storage portion; and a second liquid feeding path different from the first liquid feeding path, through which the rinsing liquid supplied by the rinsing portion is fed to the developer storage tank of the developer storage portion, and the developing portion repeatedly uses the developer stored in the developer storage tank of the developer storage portion to perform the development.

The developing device comprises: a development chamber that is provided with an air extraction pipeline for extracting air inside the development chamber to outside the development chamber; a carrier that is disposed in the development chamber for supporting a wafer; a plurality of temperature sensors that are disposed on the carrier for detecting temperatures of a plurality of target regions; a plurality of mutually independent air supply pipelines for supplying air to the development chamber, each of the target regions corresponding to at least one air supply pipeline; and a control unit for acquiring measured temperatures of the temperature sensors and calculating current temperatures of the corresponding target regions, and basing on the current temperatures of the target regions to adjust air parameters of the corresponding air supply pipelines, so that the temperatures of the corresponding target regions rest within a preset temperature range.

A method for lithography patterning includes forming a first layer over a substrate, the first layer being radiation-sensitive, exposing the first layer to a radiation, mixing a first solution and a second solution, thereby forming a developer, and dispensing the developer to the exposed first layer to form a pattern over the substrate. The dispensing of the developer includes varying a concentration of a developing chemical in the developer in multiple stages, such that the concentration of the developing chemical in the developer increases from a first stage to a subsequent second stage, and increases from the second stage to a subsequent third stage real-time during the dispensing.