Patent classifications
G05B2219/32097
USING DEFECT MODELS TO ESTIMATE DEFECT RISK AND OPTIMIZE PROCESS RECIPES
A system includes a memory and a processing device, operatively coupled to the memory, to perform operations including receiving, as input to a trained machine learning model for identifying defect impact with respect to at least one type defect type, data associated with a process related to electronic device manufacturing. The data associated with the process comprises at least one of: an input set of recipe settings for processing a component, a set of desired characteristics to be achieved by processing the component, or a set of constraints specifying an allowable range for each setting of the set of recipe settings. The operations further include obtaining an output by applying the data associated with the process to the trained machine learning model. The output is representative of the defect impact with respect to the at least one defect type.
Methods and apparatus to implement flexible bioreactor control systems
Methods, apparatus, systems and articles of manufacture are disclosed herein to implement flexible bioreactor control systems. An example apparatus disclosed herein includes a processor coupled to a memory, the processor programmed to determine whether the map value included in the process task object is a valid map value, the process task object to correspond to a task executed by a bioreactor, a control device or a measurement device of the bioreactor control system configuration, in response to determining the map value is a valid map value, decode the map value to identify the source location of a first input of the process task object, pull a value from the source location to update the input value of the process task object, and facilitate execution of the process task with the input value.
Integrated substrate measurement system to improve manufacturing process performance
A method for determining whether to modify a manufacturing process recipe is provided. A substrate to be processed at a manufacturing system according to the first process recipe is identified. An instruction to transfer the substrate to a substrate measurement subsystem to obtain a first set of measurements for the substrate is generated. The first set of measurements for the substrate is received from the substrate measurement subsystem. An instruction to transfer the substrate from the substrate measurement subsystem to a processing chamber is generated. A second set of measurements for the substrate is received from one or more sensors of the processing chamber. A first mapping between the first set of measurements and the second set of measurements for the substrate is generated. The first set of measurements mapped to the second set of measurements for the substrate is stored. A determination is made based on the first set of measurements mapped to the second set of measurements for the substrate of whether to modify the first process recipe or a second process recipe for the substrate.
Substrate processing method including reprocessing rejected wafers
A substrate processing method which can increase the yield by reprocessing a substrate whose processing has been interrupted by a processing interruption command during a substrate processing is disclosed. A substrate processing method performs a predetermined processing of a substrate while sequentially transporting the substrate to a plurality of processing sections according to a preset recipe. The substrate processing method includes processing a substrate in one of the processing sections; interrupting the processing of the substrate by a processing interruption command during processing of the substrate; setting the substrate whose processing has been interrupted in a standby state; and customizing the recipe and performing reprocessing of the processing-interrupted substrate according to the customized recipe, or performing reprocessing of the processing-interrupted substrate according to a preset recipe for reprocessing.
Parameter download verification in industrial control system
An industrial control system includes a download verification subsystem to execute a verification test using the parameters stored in a configuration database before an execution subsystem downloads the recipe parameters to the input/output addresses of a piece of equipment to determine a first verification value. The download verification subsystem executes the verification test using the recipe parameters downloaded to the piece of equipment to determine a second verification value. The download verification subsystem compares the first and second verification values to determine whether the recipe parameters were downloaded to the input/output addresses of the piece of equipment successfully.
Method and system for a meta-recipe control software architecture
A method and system for computerized coordination of multiple operations to be performed by components of machines are provided. The computer system includes a memory device for storing data and a computer-controlled machine that includes a processor in communication with the memory device wherein the processor is programmed to read a recipe file from the memory device, the recipe file including operating parameter values for controlling the operation of the machine, extract a name of a meta-recipe file from the recipe file, the meta-recipe file including a first portion including parameter properties of operating parameter values used by the meta-recipe file, receive values for the meta-recipe having the parameter properties specified in the first portion, and operate the machine using code from a second portion of the meta-recipe and the received values.
Mixed Operation of Production Units in Hybrid Plants
A method of integrating modules into a hybrid modular plant comprising a discrete manufacturing part and a continuous manufacturing part includes integrating the discrete part into the continuous part, comprising constructing at least one module definition file mapping one or more discrete-part units of the discrete part to a continuous-part module and importing the module definition file into an orchestration layer of the continuous part. Alternatively, the method comprises integrating the continuous part into the discrete part, comprising constructing one or more interfaces representing each continuous-part module as one or more respective discrete-part units.
INTEGRATED SUBSTRATE MEASUREMENT SYSTEM TO IMPROVE MANUFACTURING PROCESS PERFORMANCE
A method for determining whether to modify a manufacturing process recipe is provided. A substrate to be processed at a manufacturing system according to the first process recipe is identified. An instruction to transfer the substrate to a substrate measurement subsystem to obtain a first set of measurements for the substrate is generated. The first set of measurements for the substrate is received from the substrate measurement subsystem. An instruction to transfer the substrate from the substrate measurement subsystem to a processing chamber is generated. A second set of measurements for the substrate is received from one or more sensors of the processing chamber. A first mapping between the first set of measurements and the second set of measurements for the substrate is generated. The first set of measurements mapped to the second set of measurements for the substrate is stored. A determination is made based on the first set of measurements mapped to the second set of measurements for the substrate of whether to modify the first process recipe or a second process recipe for the substrate.
RECIPE CREATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM STORING RECIPE CREATION PROGRAM
There is provided a technique that includes: displaying a recipe editing screen including at least a selection screen area that displays a parameter list for selection of parameters included in a recipe of a substrate processing apparatus, and a parameter editing screen area that edits the parameters; receiving a selection operation that selects an editing target parameter from the parameter list; displaying, on the parameter editing screen area, in an editable manner, a timing chart that is changeable at a time of each process in a series of processes included in a substrate processing process; and editing the editing target parameter by receiving an operation instruction to edit the timing chart displayed on the parameter editing screen area and changing the timing chart according to the operation instruction.
INTEGRATED SUBSTRATE MEASUREMENT SYSTEM TO IMPROVE MANUFACTURING PROCESS PERFORMANCE
A process recipe associated with a substrate at a manufacturing system is identified. A first set of measurements for the substrate is obtained from a substrate measurement subsystem. A second set of measurements for the substrate is obtained from one or more sensors of a chamber of the manufacturing system. A determination is made based on the obtained first set of measurements and the obtained second set of measurements of whether to modify the process recipe by at least one of modifying an operation of the process recipe or generating an instruction to prevent completion of execution of one or more operations of the process recipe.