Embodiments of the disclosure provide a design method for a LiDAR scanning mirror. The design method may include receiving, by a communication interface, design parameters of the LiDAR scanning mirror. The design method may further include setting, by at least one processor, an initial value and a step size for each design parameter. The design method may also include adjusting the design parameters according to the respective step sizes. The design method may additionally include computing one or more mirror performance indexes, by the at least one processor, by applying a Finite Element Analysis (FEA) model to the adjusted design parameters. The design method may further include determining that the mirror performance indexes meet a predetermined target performance. The design method may also include providing, by the at least one processor, the adjusted design parameters and the mirror performance indexes for making the LiDAR scanning mirror.

Embodiments of the disclosure provide a design method for a LiDAR scanning mirror. The design method may include receiving, by a communication interface, design parameters of the LiDAR scanning mirror. The design method may further include setting, by at least one processor, an initial value and a step size for each design parameter. The design method may also include adjusting the design parameters according to the respective step sizes. The design method may additionally include computing one or more mirror performance indexes, by the at least one processor, by applying a Finite Element Analysis (FEA) model to the adjusted design parameters. The design method may further include determining that the mirror performance indexes meet a predetermined target performance. The design method may also include providing, by the at least one processor, the adjusted design parameters and the mirror performance indexes for making the LiDAR scanning mirror.

Embodiments of the disclosure provide a design method for a LiDAR scanning mirror. The design method may include determining, by at least one processor, design parameters of the LiDAR scanning mirror and computing one or more mirror performance indexes, by the at least one processor, by applying a Finite Element Analysis (FEA) model to the design parameters. The method may further include when the mirror performance indexes meet a predetermined target performance, providing the design parameters determined by the at least one processor for making the LiDAR scanning mirror.

Embodiments of the disclosure provide a method for designing an optical scanning mirror. The method may include receiving a first set of design parameters and a second set of design parameters of the scanning mirror. The method may include computing a first quality factor associated with slide film damping of the scanning mirror based on the first set of design parameters. The method may include computing a second quality factor associated with squeeze film damping of the scanning mirror based on the second set of design parameters using a simulation model. The method may include computing a third quality factor associated with the scanning mirror based on the first quality factor and the second quality factor. The method may include outputting the third quality factor associated with the scanning mirror.

Embodiments of the disclosure provide a method for designing an optical scanning mirror. The method may include receiving, by a communication interface, a set of initial design parameters of the scanning mirror. The method may also include computing an initial quality factor associated with the scanning mirror, by at least one processor, based on the initial design parameters. The method may further include determining, by the at least one processor, at least one structural alteration associated with the scanning mirror based on a comparison between the initial quality factor and a target quality factor. The method may also include outputting, by the at least one processor, the at least one structural alteration to be implemented on the scanning mirror.

A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes patterning a wiring layer to form at least one fixed plate and forming a sacrificial material on the wiring layer. The method further includes forming an insulator layer of one or more films over the at least one fixed plate and exposed portions of an underlying substrate to prevent formation of a reaction product between the wiring layer and a sacrificial material. The method further includes forming at least one MEMS beam that is moveable over the at least one fixed plate. The method further includes venting or stripping of the sacrificial material to form at least a first cavity.

A micromechanical system (MEMS) acoustic wave resonator is formed on a base substrate. A piezoelectric member is mounted on the base substrate. The piezoelectric member has a first electrode covering a first surface of the piezoelectric member and a second electrode covering a second surface of the piezoelectric member opposite the first electrode, the second electrode being bounded by a perimeter edge. A first guard ring is positioned on the second electrode spaced apart from the perimeter edge of the second electrode.

A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.

A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes patterning a wiring layer to form at least one fixed plate and forming a sacrificial material on the wiring layer. The method further includes forming an insulator layer of one or more films over the at least one fixed plate and exposed portions of an underlying substrate to prevent formation of a reaction product between the wiring layer and a sacrificial material. The method further includes forming at least one MEMS beam that is moveable over the at least one fixed plate. The method further includes venting or stripping of the sacrificial material to form at least a first cavity.

A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.