SRAM arrays are provided. A SRAM array includes a plurality of SRAM cells and a plurality of well strap cells. Each of the SRAM cells arranged in the same column of the cell array includes a first transistor formed in a first P-type well region of a substrate, a second transistor formed in an N-type well region of the substrate, and a third transistor formed in a second P-type well region of the substrate. Each well strap cell is arranged on one of the columns in the cell array and includes a first P-well strap structure formed on the first P-type well region, a second P-well strap structure formed on the second P-type well region, and an N-well strap structure formed on the N-type well region. The first and second P-well strap structures and the N-well strap structure are separated from the SRAM cells by a dummy area.

The present disclosure describes a method for memory cell placement. The method can include placing a memory cell region in a layout area and placing a well pick-up region and a first power supply routing region along a first side of the memory cell region. The method also includes placing a second power supply routing region and a bitline jumper routing region along a second side of the memory cell region, where the second side is on an opposite side to that of the first side. The method further includes placing a device region along the second side of the memory cell region, where the bitline jumper routing region is between the second power supply routing region and the device region.

The present disclosure describes a method for memory cell placement. The method can include placing a memory cell region in a layout area and placing a well pick-up region and a first power supply routing region along a first side of the memory cell region. The method also includes placing a second power supply routing region and a bitline jumper routing region along a second side of the memory cell region, where the second side is on an opposite side to that of the first side. The method further includes placing a device region along the second side of the memory cell region, where the bitline jumper routing region is between the second power supply routing region and the device region.

The present disclosure describes embodiments of a memory system with a memory cell power supply. The memory system can include a circuit with a first voltage supply, a second voltage supply, pull-up devices, pull-down devices, and pass devices. The first voltage supply is configured to provide a first voltage. The first voltage supply is configured to apply the first voltage to gate terminals of the pass devices. The second voltage supply is electrically coupled to S/D terminals of the pull-up devices and is configured to transition from the first voltage to the second voltage for a read operation.

The present disclosure describes embodiments of a memory system with a memory cell power supply. The memory system can include a circuit with a first voltage supply, a second voltage supply, pull-up devices, pull-down devices, and pass devices. The first voltage supply is configured to provide a first voltage. The first voltage supply is configured to apply the first voltage to gate terminals of the pass devices. The second voltage supply is electrically coupled to S/D terminals of the pull-up devices and is configured to transition from the first voltage to the second voltage for a read operation.

The present disclosure relates to a layout structure forming method of a sense amplifier and a layout structure of a sense amplifier. The method includes: providing a first active region layout structure layer, the first metal contact pattern layer includes a first metal contact pattern and a second metal contact pattern that are located on two opposite sides of the first pattern region; the first conductive wire pattern layer includes a first conductive wire pattern covering the first metal contact pattern and the second metal contact pattern; and the first connection hole pattern layer includes a plurality of connection hole designs, and the connection hole designs are connected to form a connection structure connected to the first metal contact pattern layer.

The present disclosure relates to a layout structure forming method of a sense amplifier and a layout structure of a sense amplifier. The method includes: providing a first active region layout structure layer, the first metal contact pattern layer includes a first metal contact pattern and a second metal contact pattern that are located on two opposite sides of the first pattern region; the first conductive wire pattern layer includes a first conductive wire pattern covering the first metal contact pattern and the second metal contact pattern; and the first connection hole pattern layer includes a plurality of connection hole designs, and the connection hole designs are connected to form a connection structure connected to the first metal contact pattern layer.

Systems and methods are provided for controlling a wake-up operation of a memory circuit. The memory circuit is configured to precharge the bit lines of a memory array sequentially during wakeup. A sleep signal is received by the first bit line of a memory cell and then a designed delay occurs prior to the precharge of a second complementary bit line. The sleep signal may then precharge the bit lines of a second memory cell with further delay between the precharge of each bit line. The memory circuit is configured to precharge both bit lines of a memory cell at the same time when an operation associated with that cell is designated.

A floating body SRAM cell that is readily scalable for selection by a memory compiler for making memory arrays is provided. A method of selecting a floating body SRAM cell by a memory compiler for use in array design is provided.

A floating body SRAM cell that is readily scalable for selection by a memory compiler for making memory arrays is provided. A method of selecting a floating body SRAM cell by a memory compiler for use in array design is provided.