Phase change memory devices and methods of forming the same include forming a fin structure from a first material. A phase change memory cell is formed around the fin structure, using a phase change material that includes two solid state phases at an operational temperature.

Systems, methods and apparatus to read target memory cells having an associated reference memory cell configured to be representative of drift or changes in the threshold voltages of the target memory cells. The reference cell is programmed to a predetermined threshold level when the target cells are programmed to store data. In response to a command to read the target memory cells, estimation of a drift of the threshold voltage of the reference is performed in parallel with applying an initial voltage pulse to read the target cells. Based on a result of the drift estimation, voltage pulses used to read the target cells can be modified and/or added to account for the drift estimated using the reference cell.

An apparatus comprising an input to couple to a negative voltage source; and circuitry to detect whether the input has crossed a negative voltage threshold, wherein the circuitry comprises a first capacitor that is selectively coupled to the first input and a second capacitor that is selectively coupled to a second input coupled to a positive voltage source.

A physically unclonable function (PUF) device includes first and second inverters, each of which includes a common gate node and a common drain node. The common drain node of the first inverter is electrically connected to the common gate node of the second inverter. The PUF device also includes a common output node, a first resistive memory device (RMD) electrically connected to the common drain node of the first inverter and the common output node, and a second RMD electrically connected to the common drain node of the second inverter and the common output node.

A semiconductor memory apparatus may include a memory bank, a global buffer array, and an input and output circuit. The memory bank includes a local data circuit, and the global buffer array includes a global data circuit. The local data circuit is operably coupled to the global data circuit. The global buffer array may be operably coupled to the input and output circuit. The memory bank is disposed in a core region, and the global buffer array and the input and output circuit may be disposed in a peripheral region separated from the core region.

Various embodiments provide methods for configuring a phase-change random-access memory (PCRAM) structures, such as PCRAM operating in a single-level-cell (SLC) mode or a multi-level-cell (MLC) mode. Various embodiments may support a PCRAM structure being operating in a SLC mode for lower power and a MLC mode for lower variability. Various embodiments may support a PCRAM structure being operating in a SLC mode or a MLC mode based at least in part on an error tolerance for a neural network layer.

A semiconductor device includes a semiconductor substrate, a peripheral device on the semiconductor substrate, a lower insulating structure on the semiconductor substrate and covering the peripheral device, a first conductive line on the lower insulating structure, a memory cell structure on the first conductive line, and a second conductive line on the memory cell structure. The memory cell structure may include an information storage material pattern and a selector material pattern on the lower insulating structure in a vertical direction. The selector material pattern may include a first selector material layer including a first material and a second selector material layer including a second material. The second selector material layer may have a threshold voltage drift higher than that of the first material. The second selector material layer may have a second width narrower than a first width of the first selector material layer.

Artificial neuromorphic circuit includes synapse and post-neuron circuits. Synapse circuit includes phase change element and receives first and second pulse signals. Post-neuron circuit includes input, output and integration terminals. Integration terminal is charged to membrane potential according to first pulse signal. Post-neuron circuit further includes first and second control circuits, and first and second delay circuits. First control circuit generates firing signal at output terminal based on membrane potential. Second control circuit generates first control signal based on firing signal. First delay circuit delays firing signal to generate second control signal. Second delay circuit delays second control signal to generate third control signal. First and third control signals control voltage level of integration terminal, maintain integration terminal at fixed voltage during period, and second control signal cooperates with second pulse signal to control state of phase change element to determine weight of artificial neuromorphic circuit.

Provided are a switching device and a memory device including the switching device. The switching device includes first and second electrodes, and a switching material layer provided between the first and second electrodes and including a chalcogenide. The switching material layer includes a core portion and a shell portion covering a side surface of the core portion. The switching layer includes a material having an electrical resistance greater than an electrical resistance of the core portion, for example in at least one of the core portion or the shell portion.

A memory device includes a stack and a plurality of memory strings. The stack is disposed on the substrate, and the stack includes a plurality of conductive layers and a plurality of insulating layers alternately stacked. The memory strings pass through the stack along a first direction, wherein a first memory string in the memory strings includes a first conductive pillar and a second conductive pillar, a channel layer, and a memory structure. The first conductive pillar and the second conductive pillar respectively extend along the first direction and are separated from each other. The channel layer is disposed between the first conductive pillar and the second conductive pillar. The memory structure surrounds the second conductive pillar, and the memory structure includes a resistive memory material.