G11C16/0441

Semiconductor storage device and electronic apparatus

In a semiconductor storage device including a plurality of memory cells formed at a laminated substrate including a support layer, an insulating layer on the support layer, and a semiconductor layer on the insulating layer, the plurality of memory cells each include a floating gate transistor and a selection transistor. The floating gate transistor includes a first source region, a first drain region, a first body region, a first body contact region, a floating gate insulating film, and a floating gate electrode, and the selection transistor includes a second source region, a second drain region, a second body region, a second body contact region insulated from the first body contact region, a selection gate insulating film, and a selection gate electrode.

DIFFERENTIAL MEMORY CELL ARRAY STRUCTURE FOR MULTI-TIME PROGRAMMING NON-VOLATILE MEMORY
20230014498 · 2023-01-19 ·

A differential memory cell array structure for a MTP non-volatile memory is provided. The array structure is connected to a source line, a word line, a bit line, an inverted bit liner and an erase line. After an erase operation (ERS) is completed, the stored data in the differential memory cells of the selected row are not all erased. That is, only the stored data in a single selected memory cell of the selected row is erased.

Logic compatible flash memory programming with a pulse width control scheme
11694751 · 2023-07-04 · ·

A selective non-volatile memory programming method for a selected memory cell in a memory array is described so as to reduce or avoid program disturbance on an unselected memory cell. This selective programming method comprises: applying a programming pulse to a selected memory cell to be programmed and an unselected memory cell, wherein the programming pulse allows a change of the unselected memory cell within a range specified; boosting a region of the unselected memory cell; and setting a threshold time of the programming pulse, wherein the threshold time is defined when an absolute magnitude of a voltage difference between a floating gate of the unselected memory cell and the boosted region of the unselected memory cell reaches a threshold value defined.

Device of physically unclonable function with floating gate transistors, and manufacturing method

In accordance with an embodiment, a physically unclonable function device includes a set of floating gate transistor pairs, floating gate transistors of the set of floating gate transistor pairs having a randomly distributed effective threshold voltage belonging to a common random distribution; a differential read circuit configured to measure a threshold difference between the effective threshold voltages of floating gate transistors of floating gate transistor pairs of the set of floating gate transistor pairs, and to identify a floating gate transistor pair in which the measured threshold difference is smaller than a margin value as being an unreliable floating gate transistor pair; and a write circuit configured to shift the effective threshold voltage of a floating gate transistor of the unreliable floating gate transistor pair to be inside the common random distribution.

Single-layer polysilicon nonvolatile memory cell and memory including the same

The present invention relates to a single-layer polysilicon nonvolatile memory cell, a group structure thereof and a memory including the same. The memory cell includes a selection transistor and a storage transistor, wherein the selection transistor is connected in series with the storage transistor; and the selection transistor and the storage transistor are arranged on a substrate in a mutually perpendicular manner. A memory cell group includes four memory cells, arranged in a center-symmetrical array of two rows×two columns. The memory comprises at least one memory cell group. The memory cell and the memory thereof are used as a one-time programming memory cell and memory, and have the advantages of small area, high programming efficiency and capability, and strong data retention capability.

CONTENT-ADDRESSABLE MEMORY AND OPERATION METHOD THEREOF
20220366988 · 2022-11-17 ·

A content-address memory (CAM) and an operation method are provided. The content-address memory comprises: a plurality of first signal lines; a plurality of second signal lines; and a plurality of CAM memory cells coupled to the first signal lines and the second signal lines, wherein in data match, a plurality of input signals are input into the CAM memory cells via the first signal lines; the input signals are compared with contents stored in the CAM memory cells; and a match result is determined based on an electrical characteristic of the second signal lines.

Content-addressable memory and operation method thereof

A content-address memory (CAM) and an operation method are provided. The content-address memory comprises: a plurality of first signal lines; a plurality of second signal lines; and a plurality of CAM memory cells coupled to the first signal lines and the second signal lines, wherein in data match, a plurality of input signals are input into the CAM memory cells via the first signal lines; the input signals are compared with contents stored in the CAM memory cells; and a match result is determined based on an electrical characteristic of the second signal lines.

METHOD AND APPARATUS FOR ANALOG FLOATING GATE MEMORY CELL
20230116512 · 2023-04-13 ·

A floating-node memory device includes a metal-oxide-semiconductor (MOS) transistor including a first polysilicon gate, a source region, and a drain region in a first well region, a tunneling device including a second polysilicon gate in a second well region, and a metal-insulator-metal (MIM) capacitor including a conductive top plate and a bottom plate formed in a metal interconnect layer. The floating-node device includes a floating-node comprising the first polysilicon gate, the second polysilicon gate, and the conductive top plate of the MIM capacitor coupled together, a control node at the bottom plate of the MIM capacitor, an erase node in the second well region, a source node at the source region of the MOS transistor, and a drain node at the drain region of the MOS transistor.

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

A semiconductor device includes a semiconductor substrate and a first memory cell disposed on the semiconductor substrate. The first memory cell includes a first write and erasure transistor, a first read transistor, and a first charge transfer reduction transistor. The first write and erasure transistor controls data writing and erasing. The first read transistor controls data reading. The first charge transfer reduction transistor reduces injection of an electric charge to the first write and erasure transistor and the first read transistor.

One time programmable memory

A memory device is provided. The memory device includes a first transistor and a second transistor connected in series with the first transistor. The second transistor is programmable between a first state and a second state. A bit line connected to the second transistor. A sense amplifier connected to the bit line. The sense amplifier is operative to sense data from the bit line. A feedback circuit connected to the sense amplifier, wherein the feedback circuit is operative to control a bit line current of the bit-line.