A method for operating an EUV lithography apparatus (1) with at least one vacuum housing (27) for at least one reflective optical element (12) includes operating the EUV lithography apparatus in an exposure operating mode (B), in which EUV radiation (5) is radiated into the vacuum housing, wherein a reducing plasma is generated at a surface (12a) of the reflective optical element in response to an interaction of the EUV radiation with a residual gas present in the vacuum housing. After an exposure pause, in which no EUV radiation is radiated into the vacuum housing, and before renewed operation of the EUV lithography apparatus in the exposure operating mode (B), the EUV lithography apparatus is operated in a recovery operating mode, in which oxidized contaminants at the surface of the reflective optical element are reduced in order to recover a transmission of the EUV lithography apparatus before the exposure pause.

A doubly bent X-ray spectroscopic device (1) according to the present invention includes: a glass plate (3) which is deformed into a shape having a doubly bent surface by being sandwiched between a doubly curved convex surface (21a) of a convex forming die (21) and a doubly curved concave surface (22a), of a concave forming die (22), that matches the doubly curved convex surface (21a), and being heated to a temperature of 400° C. to 600° C.; and a reflection coating (5) configured to reflect X-rays, which is formed on a concave surface (3a) of the deformed glass plate (3 ).

A doubly bent X-ray spectroscopic device (1) according to the present invention includes: a glass plate (3) which is deformed into a shape having a doubly bent surface by being sandwiched between a doubly curved convex surface (21a) of a convex forming die (21) and a doubly curved concave surface (22a), of a concave forming die (22), that matches the doubly curved convex surface (21a), and being heated to a temperature of 400° C. to 600° C.; and a reflection coating (5) configured to reflect X-rays, which is formed on a concave surface (3a) of the deformed glass plate (3 ).

Systems and methods relate to arranging atoms into 1D and/or 2D arrays; exciting the atoms into Rydberg states and evolving the array of atoms, for example, using laser manipulation techniques and high-fidelity laser systems described herein; and observing the resulting final state. In addition, refinements can be made, such as providing high fidelity and coherent control of the assembled array of atoms. Exemplary problems can be solved using the systems and methods for arrangement and control of atoms.

Systems and methods relate to arranging atoms into 1D and/or 2D arrays; exciting the atoms into Rydberg states and evolving the array of atoms, for example, using laser manipulation techniques and high-fidelity laser systems described herein; and observing the resulting final state. In addition, refinements can be made, such as providing high fidelity and coherent control of the assembled array of atoms. Exemplary problems can be solved using the systems and methods for arrangement and control of atoms.

Systems and methods of providing X-ray optics are described. The optics are formed from CVD thin film diamond. The optics lave three sections that include a tip on which X-rays impinge, a base, and an intermediate section connecting the base and the tip. The intermediate section tapers from the base to the tip. The base has a substantially larger thickness than the tip. The base is disposed within a holder that securely retains the optics to provide vibration control, while the tip is thin enough to provide thermal management and reduce crystal strain.

Systems and methods of providing X-ray optics are described. The optics are formed from CVD thin film diamond. The optics lave three sections that include a tip on which X-rays impinge, a base, and an intermediate section connecting the base and the tip. The intermediate section tapers from the base to the tip. The base has a substantially larger thickness than the tip. The base is disposed within a holder that securely retains the optics to provide vibration control, while the tip is thin enough to provide thermal management and reduce crystal strain.

A focusing grating device (100) is described comprising a substrate (402) and a grating comprising a plurality of grating features (408) positioned on the substrate (402). The grating features (408) are positioned non-perpendicular to the substrate surface, thereby inducing a first focusing direction. The substrate (402) is curved, thereby inducing a second focusing direction, which is different from the first focusing direction. An X-ray system (300) comprising such a focusing grating device (100) as well as a method for producing such a focusing grating device (100) are also described.

An imaging system (IS) including device (G, IFD) for phase contrast and/or dark field imaging such as a grating (G). The device has a periodic structure with a spatial period p. The imaging system (IS) further includes a phase stepping mechanism (PSM) configured to facilitate a relative phase stepping motion between the device (G, IFD) and a focal spot (FS) of an X-ray source (XS) of the imaging system (IS). The relative phase stepping motion covers a distance greater than the said spatial period to reduce artifacts in dark-field or phase contrast imagery caused by defects in the grating.

An imaging system (IS) including device (G, IFD) for phase contrast and/or dark field imaging such as a grating (G). The device has a periodic structure with a spatial period p. The imaging system (IS) further includes a phase stepping mechanism (PSM) configured to facilitate a relative phase stepping motion between the device (G, IFD) and a focal spot (FS) of an X-ray source (XS) of the imaging system (IS). The relative phase stepping motion covers a distance greater than the said spatial period to reduce artifacts in dark-field or phase contrast imagery caused by defects in the grating.