A 3D X-ray device including an X-ray detector, an X-ray source and a computer. The X-ray detector and the X-ray source are moved about an object volume to be recorded on movement paths with a rotation of at least 185°. A number of X-ray projection images are recorded from different directions. X-rays irradiate the object volume in one of the irradiation directions and are captured by the detector. A 3D X-ray image of the object volume is calculated from the recorded X-ray projection images by a reconstruction method. The X-ray detector is arranged asymmetrically relative to a central axis through a center of rotation of the 3D X-ray device. A first fan beam and an opposite second fan beam rotated 180° form an overlap region. At least one X-ray filter is placed between the X-ray source and the object volume for attenuating an X-ray dose inside the overlap region.

An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure neutron rays which are generated at a plurality of locations of the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a measurement value in at least one of the plurality of neutron ray measuring instruments.

A beam shaping assembly (10) used in a neutron capture system and capable of changing an irradiation range of a neutron beam. The beam shaping assembly includes: a beam inlet (11), a target (12), a moderator (13) adjoining the target (12), a reflector (14) surrounding the moderator (13), a thermal neutron absorber (15) adjoining the moderator (13), a radiation shield (16) arranged inside the beam shaping assembly (10), and a beam outlet (17). The beam shaping assembly (10) further includes replacement components (21, 22) that can be attached to and detached from the beam shaping assembly (10) to change the irradiation range of the neutron beam.

A beam shaping assembly (10) used in a neutron capture system and capable of changing an irradiation range of a neutron beam. The beam shaping assembly includes: a beam inlet (11), a target (12), a moderator (13) adjoining the target (12), a reflector (14) surrounding the moderator (13), a thermal neutron absorber (15) adjoining the moderator (13), a radiation shield (16) arranged inside the beam shaping assembly (10), and a beam outlet (17). The beam shaping assembly (10) further includes replacement components (21, 22) that can be attached to and detached from the beam shaping assembly (10) to change the irradiation range of the neutron beam.

The present invention relates to charged particle, X-ray, gamma ray and or thermal neutron attenuators on the basis of micro structured semiconductor and method of making the same. In more detail, the present invention is related to three-dimensionally microstructured charged particle, X-ray, gamma ray and or thermal neutron attenuators. The attenuators of the present invention will improve the performance of telescopes, radiology equipment, nondestructive evaluation equipment and proton therapy equipment.

An x-ray window can include a boron-film 12 and an aluminum-film 52 spanning an aperture 15 of a support-frame 11. The boron-film 12 and the aluminum-film 52 can be the only films, or the primary films, spanning the aperture. The boron-film 12 can include boron and hydrogen. An annular-film 32 can adjoin the support-frame 11, on an opposite side of the support-frame 11 from the boron-film 12. The annular-film 32 can include boron and hydrogen. The annular-film 32 can have the same material composition as, and can be similar in thickness with, the boron-film 12.

An x-ray window can include a boron-film 12 and an aluminum-film 52 spanning an aperture 15 of a support-frame 11. The boron-film 12 and the aluminum-film 52 can be the only films, or the primary films, spanning the aperture. The boron-film 12 can include boron and hydrogen. An annular-film 32 can adjoin the support-frame 11, on an opposite side of the support-frame 11 from the boron-film 12. The annular-film 32 can include boron and hydrogen. The annular-film 32 can have the same material composition as, and can be similar in thickness with, the boron-film 12.

A microscope system for flexibly, efficiently and quickly inspecting patterns and defects on extreme ultraviolet (EUV) lithography photomasks. The system includes a stand-alone plasma-based EUV radiation source with an emission spectrum with a freestanding line emission in the spectral range from 12.5 nm to 14.5 nm has a relative bandwidth of λ/Δλ>1000, means for the broadband spectral filtering λ/Δλ<50 for selecting the dominant freestanding emission line, means for suppressing radiation with wavelengths outside of the EUV spectral region, zone plate optics for magnified imaging of the object with a resolution which corresponds to the width of an outermost zone of the zone plate, a numerical aperture corresponding to more than 1000 zones, and a EUV detector array for capturing the patterned object.

A microscope system for flexibly, efficiently and quickly inspecting patterns and defects on extreme ultraviolet (EUV) lithography photomasks. The system includes a stand-alone plasma-based EUV radiation source with an emission spectrum with a freestanding line emission in the spectral range from 12.5 nm to 14.5 nm has a relative bandwidth of λ/Δλ>1000, means for the broadband spectral filtering λ/Δλ<50 for selecting the dominant freestanding emission line, means for suppressing radiation with wavelengths outside of the EUV spectral region, zone plate optics for magnified imaging of the object with a resolution which corresponds to the width of an outermost zone of the zone plate, a numerical aperture corresponding to more than 1000 zones, and a EUV detector array for capturing the patterned object.

Provided is a neutron beam transmission adjusting device including a neutron beam transmission unit including a neutron reactant and capable of modulating an energy and/or a flux of a neutron beam transmitted through the neutron beam transmission unit.