An apparatus includes: a structure having a lumen for accommodating a beam, wherein the structure is a component of a medical radiation machine having a target for interaction with the beam to generate radiation; and a first beam position monitor comprising a first electrode and a second electrode, the first electrode being mounted to a first side of the structure, the second electrode being mounted to a second side of the structure, the second side being opposite from the first side; wherein the first beam position monitor is located upstream with respect to the target.

An electron gun includes: a cathode, which has a cathode holder and a cathode body; and a Wehnelt cylinder. The cathode holder receives the cathode body and the Wehnelt cylinder is suitable for bundling free electrons, which can escape from the cathode body toward the Wehnelt cylinder, to form an electron beam. The Wehnelt cylinder is interlockingly arranged, at least in some parts along a first inner surface facing the cathode holder, on an outer surface of the cathode holder and at least partly extends around the cathode holder.

An apparatus includes: a structure having a lumen for accommodating a beam (e.g., electron beam, proton beam, or a charged particle beam), wherein the structure is a component of a medical radiation machine having a target for interaction with the beam to generate radiation; and a first beam position monitor comprising a first electrode and a second electrode, the first electrode being mounted to a first side of the structure, the second electrode being mounted to a second side of the structure, the second side being opposite from the first side; wherein the first beam position monitor is located upstream with respect to the target.

An apparatus includes: a structure having a lumen for accommodating a beam (e.g., electron beam, proton beam, or a charged particle beam), wherein the structure is a component of a medical radiation machine having a target for interaction with the beam to generate radiation; and a first beam position monitor comprising a first electrode and a second electrode, the first electrode being mounted to a first side of the structure, the second electrode being mounted to a second side of the structure, the second side being opposite from the first side; wherein the first beam position monitor is located upstream with respect to the target.

The invention relates to the field of fabrication of new materials and coatings and may be used in plants designed for electron-beam heating, melting and evaporating of materials in vacuum or reactive gas atmosphere. The disclosed axial electron gun that comprises, in particular, the primary and secondary cathodes and features the figure-shaped holder used for maintaining a stable position of the secondary cathode relative to the electron-beam axis of the axial gun and the pulsed voltage that is applied between the cathodes for electron bombardment of the secondary cathode. The invention ensures an improved stability of process parameters and operation of the electron gun.

The improved cathode sub-assembly includes a solid cylindrical cathode of tungsten, a cylindrical holder concentric to the cathode with an internal radially directed rib receiving one end of the cathode, and a cylindrical reflector threadably mounted within the holder in circumferentially spaced relation to the cathode. The holder is threadably mounted in a support plate to be able to be readily removed for servicing and/or replacement.

An electron gun includes: a cathode, which has a cathode holder and a cathode body; and a Wehnelt cylinder. The cathode holder receives the cathode body and the Wehnelt cylinder is suitable for bundling free electrons, which can escape from the cathode body toward the Wehnelt cylinder, to form an electron beam. The Wehnelt cylinder is interlockingly arranged, at least in some parts along a first inner surface facing the cathode holder, on an outer surface of the cathode holder and at least partly extends around the cathode holder.

The invention relates to the field of fabrication of new materials and coatings and may be used in plants designed for electron-beam heating, melting and evaporating of materials in vacuum or reactive gas atmosphere. The disclosed axial electron gun that comprises, in particular, the primary and secondary cathodes and features the figure-shaped holder used for maintaining a stable position of the secondary cathode relative to the electron-beam axis of the axial gun and the pulsed voltage that is applied between the cathodes for electron bombardment of the secondary cathode. The invention ensures an improved stability of process parameters and operation of the electron gun.

A cathode filament device for an indirectly heated cathode has a first and second filament rods having respective first and second engagement portions. The first engagement portion has a first engagement body with first and second positioning features extending from the first engagement body. The second engagement portion has at least a second engagement body. Third and fourth positioning features may extend from the second engagement body. First and second clamping members have respective clamping surfaces configured to selectively engage the respective first and second engagement bodies. At least the first positioning feature limits a translation of the first filament rod with respect to the first clamping member along a first axis. The second, third, and fourth positioning features may further limit the translation and secure a position of a filament coupled to the first and second filament rods.

A cathode filament device for an indirectly heated cathode has a first and second filament rods having respective first and second engagement portions. The first engagement portion has a first engagement body with first and second positioning features extending from the first engagement body. The second engagement portion has at least a second engagement body. Third and fourth positioning features may extend from the second engagement body. First and second clamping members have respective clamping surfaces configured to selectively engage the respective first and second engagement bodies. At least the first positioning feature limits a translation of the first filament rod with respect to the first clamping member along a first axis. The second, third, and fourth positioning features may further limit the translation and secure a position of a filament coupled to the first and second filament rods.