An assembly is provided including a manipulation device and a cooling unit. The manipulation device includes a holder for samples and a thermal mass member which is arranged in thermal contact with the holder. The manipulation device is configured to place the manipulation device in a heat exchange position wherein the in thermal mass member is in thermal contact with the cooling unit, and to move the manipulation device from the heat exchange position to a manipulation position wherein the thermal mass member is thermally separated from the cooling unit. An inspection apparatus of focused ion beam apparatus is also provided including such an assembly, and a method of using such an assembly.

A plasma-generating nozzle and a plasma device including the plasma-generating nozzle are provided. The plasma-generating nozzle includes a plasma-generating channel, a cooling channel at least partially surrounding the plasma-generating channel, and a pair of electrodes partially disposed in the plasma-generating channel for generating plasma. The plasma device includes a housing enclosing a plasma treatment space and a component space, and the plasma-generating nozzle removable disposed in the plasma treatment space.

A hydrogen supply device disposed in a high-potential section includes a bottle internally provided with a hydrogen absorbing alloy.

In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum.

Provided is an ion beam system including a gas field ionization ion source which can obtain a high current sufficient for processing and stabilize an ion beam current. The ion beam system includes a gas field ionization ion source which includes: a vacuum vessel; an emitter tip holder disposed in the vacuum vessel; an emitter tip connected to the emitter tip holder; an extraction electrode opposed to the emitter tip; a gas supply portion for supplying a gas to the emitter tip; and a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder. The cold transfer member has its surface covered with a heat insulating material in order to prevent the gas condensation.

Disclosed herein is an aperture body for passing a portion of a charged particle beam propagating along a beam path comprising an axis, the aperture body comprising: an up-beam facing surface; a chamber portion comprising an up-beam end, a down-beam end and an up-beam plate, wherein the up-beam plate extends radially inwards from the up-beam end and the up-beam plate is configured to define an entrance opening around the beam path; wherein: the up-beam facing surface extends radially inwards from the down-beam end; the up-beam facing surface comprises an aperture portion that is configured to define an opening around the beam path; and the opening defined by the aperture portion is smaller than the entrance opening.

Physical vapor deposition methods for reducing the particulates deposited on the substrate are disclosed. The pressure during sputtering can be increased to cause agglomeration of the particulates formed in the plasma. The agglomerated particulates can be moved to an outer portion of the process chamber prior to extinguishing the plasma so that the agglomerates fall harmlessly outside of the diameter of the substrate.

The invention relates to a sample holder for a microscopy system comprising a material with a low thermal conductivity for reducing a drift of the sample holder when inserted into a microscope. The invention also relates to a cold trap for a microscopy system comprising a sample holder, wherein the cold trap comprises a coating with a high thermal emissivity to increase a heat load between the sample holder and the cold trap. The invention also relates to a microscopy system comprising a first element configured to have a first temperature, a second element configured to have a second temperature, and a third element configured to have a third temperature, wherein the third element is configured to be located at a plurality of different distances from the first element, wherein the microscopy system is configured to image a sample and to reduce a drift of the image.

An assembly provided with a coolant flow channel includes a base in which the coolant flow channel is formed; and a protrusion component that is disposed in the coolant flow channel, wherein the protrusion component is liftable or rotatable.

A heater assembly that that is effective at maintaining heating lamps at acceptable temperatures is disclosed. The heater assembly utilizes radiative heat transfer to transfer unwanted heat buildup in the heating lamps to a cooling base. One or more high emissivity films are disposed between the heating lamps and the cooling base to facilitate heat transfer. Further, a reflective coating is applied to a portion of the heating lamps to reflect heat away from the cooling base. The heater assembly may be utilized in a high vacuum environment as it does not rely on convective cooling.