An electronic microscope has a great depth of focus compared with an optical microscope. Thus, information is superimposed in the depth direction in one image. Thus, observation of a three-dimensional structure inside a specimen with use of the electronic microscope requires accurate specification of a three-dimensional position or density of a structure inside the specimen. Furthermore, the specimen on a slide glass that is observed with the optical microscope may not be put in a TEM device in the related art. Thus, a very complicated preparation of the specimen is required for performing three-dimensional internal structure observation, with the electronic microscope, of a location that is observed with the optical microscope.

Provided is a charged particle beam device including a charged particle optical column that irradiates a specimen with a primary charged particle beam, and a specimen base rotating unit that is capable of rotating the specimen base in a state of an angle formed by a surface of the specimen base and an optical axis of the primary charged particle beam being inclined to a non-perpendicular angle, in which the specimen base is configured to include a detecting element that detects a charged particle scattered or transmitted inside the specimen, and transmitted charged particle images of the specimen corresponding to each angle is acquired by irradiating the specimen in a state of the specimen base rotating unit being rotated at a plurality of different angles.

An analysis method using an electron microscope, detects by a first electronography detector an electron beam transmitted through or scattered by a sample to detect an ADF image of the sample, detects by a second electronography detector the electron beam passing through the first electronography detector to detect an MABF image, adjusts a focal point of the electron beam to be located on the film of the sample to obtain first and second electronographies by the second and first electronography detectors, respectively, adjusts the focal point of the electron beam to be located on the substrate of the sample to obtain third and fourth electronographies by the second and first electronography detectors, respectively, aligns positions of the second and fourth electronographies based on the first and third electronographies, and after the aligning, subtracts the fourth electronography from the second electronography to obtain an image of the film.

An embodiment of the invention relates to a method for carrying out a time-resolved interferometric measurement comprising the steps of generating at least two coherent waves, overlapping said at least two coherent waves and producing an interference pattern, measuring the interference pattern for a given exposure time, thereby forming measured interference values, and analyzing the measured interference values and extracting amplitude and/or phase information from the measured interference values. In at least one time segment, hereinafter referred to as disturbed time segment, of the expo-sure time, the interference pattern is intentionally disturbed or destroyed such that the corresponding measured interference values describe a disturbed or destroyed interference pattern. In at least one other time segment, hereinafter referred to as undisturbed time segment, of the exposure time, the interference pattern is undisturbed or at least less disturbed compared to the disturbed time segment such that the corresponding measured interference values describe an undisturbed or less disturbed interference pattern. The measured interference values that were measured during the entire given exposure time, are filtered, wherein those interference values that were measured during the at least one disturbed time segment, are reduced, suppressed or discarded. The filtered interference values are analyzed and the amplitude and/or phase information is extracted from the filtered interference values.

A lensless Fourier transform holography high accuracy reconstruction method using a charged particle beam apparatus which holds a sample on a diffraction surface of a diffraction grating provided on the downstream side of a traveling direction of the charged particle beam and which is formed of a material having permeability. The charged particle beam passed through the diffraction surface is image-formed, and the formed image is detected. An opening region of the diffraction grating is smaller than an irradiation region of the charged particle beam on the diffraction grating. Image data is obtained in a state where the irradiation region of the charged particle beam diffracted with the diffraction grating is within the irradiation region of the charged particle beam transmitted through the diffraction grating. Plural holograms obtained based on the image data are Fourier transformed and an intensity distribution image is displayed and stored.

A system for performing diffraction analysis, includes a mill for removing a surface portion of a sample, and an analyzer for performing diffraction analysis on the milled sample.

A lensless Fourier transform holography high accuracy reconstruction method using a charged particle beam apparatus which holds a sample on a diffraction surface of a diffraction grating provided on the downstream side of a traveling direction of the charged particle beam and which is formed of a material having permeability. The charged particle beam passed through the diffraction surface is image-formed, and the formed image is detected. An opening region of the diffraction grating is smaller than an irradiation region of the charged particle beam on the diffraction grating. Image data is obtained in a state where the irradiation region of the charged particle beam diffracted with the diffraction grating is within the irradiation region of the charged particle beam transmitted through the diffraction grating. Plural holograms obtained based on the image data are Fourier transformed and an intensity distribution image is displayed and stored.

An embodiment of the invention relates to a method for carrying out a time-resolved interferometric measurement comprising the steps of generating at least two coherent waves, overlapping said at least two coherent waves and producing an interference pattern, measuring the interference pattern for a given exposure time, thereby forming measured interference values, and analyzing the measured interference values and extracting amplitude and/or phase information from the measured interference values. In at least one time segment, hereinafter referred to as disturbed time segment, of the exposure time, the interference pattern is intentionally disturbed or destroyed such that the corresponding measured interference values describe a disturbed or destroyed interference pattern. In at least one other time segment, hereinafter referred to as undisturbed time segment, of the exposure time, the interference pattern is undisturbed or at least less disturbed compared to the disturbed time segment such that the corresponding measured interference values describe an undisturbed or less disturbed interference pattern. The measured interference values that were measured during the entire given exposure time, are filtered, wherein those interference values that were measured during the at least one disturbed time segment, are reduced, suppressed or discarded. The filtered interference values are analyzed and the amplitude and/or phase information is extracted from the filtered interference values.

A system for performing diffraction analysis, includes a mill for removing a surface portion of a sample, and an analyzer for performing diffraction analysis on the milled sample.

Provided is a charged particle beam device including a charged particle optical column that irradiates a specimen with a primary charged particle beam, and a specimen base rotating unit that is capable of rotating the specimen base in a state of an angle formed by a surface of the specimen base and an optical axis of the primary charged particle beam being inclined to a non-perpendicular angle, in which the specimen base is configured to include a detecting element that detects a charged particle scattered or transmitted inside the specimen, and transmitted charged particle images of the specimen corresponding to each angle is acquired by irradiating the specimen in a state of the specimen base rotating unit being rotated at a plurality of different angles.

A system for performing diffraction analysis, includes a focused ion beam (FIB) device for preparing a sample, a mill for removing a surface portion of the prepared sample, and an analyzer for performing diffraction analysis on the milled sample.