A mask member is provided at an entrance opening of a mirror unit. Of a first diffraction grating and a second diffraction grating, when the second diffraction grating is used, the mask member masks preceding mirrors. With this process, aberration caused by reflective X-ray is suppressed. When the first diffraction grating is used, the mask member does not function. Alternatively, the mask member and another mask member may be selectively used.

The present invention discloses a combination of two existing approaches for mineral analysis and makes use of the Similarity Metric Invention, that allows mineral definitions to be described in theoretical compositional terms, meaning that users are not required to find examples of each mineral, or adjust rules. This system allows untrained operators to use it, as opposed to previous systems, which required extensive training and expertise.

An analysis device includes a spectroscopic element that diffracts a signal generated by a specimen, a detector that detects the signal diffracted by the spectroscopic element, and a spectrum generation unit that generates a spectrum of the signal based on a detection result by the detector, the detector including detection regions arranged in a plurality of rows and a plurality of columns, a divergent direction of the signal incident on the detector being neither parallel nor perpendicular to a column direction of the detector, and the spectrum generation unit performing: processing for acquiring a plurality of row spectra by generating a row spectrum for each of the plurality of rows based on detection signals relating to the detection regions arranged in a row direction; and processing for generating a spectrum of the signal based on the plurality of row spectra.

A mask member is provided at an entrance opening of a mirror unit. Of a first diffraction grating and a second diffraction grating, when the second diffraction grating is used, the mask member masks preceding mirrors. With this process, aberration caused by reflective X-ray is suppressed. When the first diffraction grating is used, the mask member does not function. Alternatively, the mask member and another mask member may be selectively used.

An analysis device includes a spectroscopic element that diffracts a signal generated by a specimen, a detector that detects the signal diffracted by the spectroscopic element, and a spectrum generation unit that generates a spectrum of the signal based on a detection result by the detector, the detector including detection regions arranged in a plurality of rows and a plurality of columns, a divergent direction of the signal incident on the detector being neither parallel nor perpendicular to a column direction of the detector, and the spectrum generation unit performing: processing for acquiring a plurality of row spectra by generating a row spectrum for each of the plurality of rows based on detection signals relating to the detection regions arranged in a row direction; and processing for generating a spectrum of the signal based on the plurality of row spectra.

An X-ray analyzer includes: an X-ray detector that detects an X-ray emitted from a specimen and outputs a signal having a step that has a height corresponding to energy of the X-ray; a pulse generation circuit that converts the signal output from the X-ray detector into a first pulse signal; a pulse-width setting circuit that sets a pulse width; a pulse-width conversion circuit that converts a pulse width of the first pulse signal into the pulse width set by the pulse-width setting circuit to form a second pulse signal; a pulse-height discriminator that discriminates the second pulse signal according to a pulse height of the second pulse signal; a counting circuit that calculates a counting rate of the discriminated second pulse signal; and a counting-loss correction processing unit that corrects the counting rate. The counting-loss correction processing unit corrects the counting rate based on the pulse width.

An X-ray analyzer includes: an X-ray detector that detects an X-ray emitted from a specimen and outputs a signal having a step that has a height corresponding to energy of the X-ray; a pulse generation circuit that converts the signal output from the X-ray detector into a first pulse signal; a pulse-width setting circuit that sets a pulse width; a pulse-width conversion circuit that converts a pulse width of the first pulse signal into the pulse width set by the pulse-width setting circuit to form a second pulse signal; a pulse-height discriminator that discriminates the second pulse signal according to a pulse height of the second pulse signal; a counting circuit that calculates a counting rate of the discriminated second pulse signal; and a counting-loss correction processing unit that corrects the counting rate. The counting-loss correction processing unit corrects the counting rate based on the pulse width.

An EDS 5 acquires first spectrum data by detecting an X-ray generated from a sample. A WDS 6 acquires second spectrum data by detecting the X-ray generated from the sample. A phase distribution map generation processing unit 11 generates a phase distribution map of a substance of the sample in a measurement region, on the basis of the first spectrum data acquired with respect to each pixel in the measurement region on a sample surface. A composition information acquisition processing unit 13 acquires element composition information of each phase, on the basis of the second spectrum data acquired with respect to a position on the sample corresponding to a representative pixel in the measurement region corresponding to each of the phases of the phase distribution map.

An EDS 5 acquires first spectrum data by detecting an X-ray generated from a sample. A WDS 6 acquires second spectrum data by detecting the X-ray generated from the sample. A phase distribution map generation processing unit 11 generates a phase distribution map of a substance of the sample in a measurement region, on the basis of the first spectrum data acquired with respect to each pixel in the measurement region on a sample surface. A composition information acquisition processing unit 13 acquires element composition information of each phase, on the basis of the second spectrum data acquired with respect to a position on the sample corresponding to a representative pixel in the measurement region corresponding to each of the phases of the phase distribution map.