Patent classifications
H01J23/10
Substrate processing apparatus and substrate processing method
A substrate processing apparatus includes: a processing container; an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied; a holder fixed to the injector; a first magnet fixed to the holder and disposed inside the processing container; a second magnet separated from the first magnet by a partition plate and disposed outside the processing container; and a driving part configured to rotate the second magnet, wherein the first magnet and the second magnet are magnetically coupled to each other, and wherein by rotating the second magnet by the driving part, the first magnet magnetically coupled to the second magnet is rotated, and the injector rotates about the longitudinal direction as an axis.
Magnetron
Provided is a low-cost magnetron that is excellent in productivity without any adverse effect on characteristics. Two large and small strap rings 11 (11A and 11B) are only disposed at lower ends, or input sides, of a plurality of vanes 10 (10A and 10B) in the direction of a tube axis m. Diameter Rip of a protruding flat surface 41 of an input side pole piece 18 is larger than diameter Rop of a protruding flat surface 40 of an output side pole piece 17. Therefore, it is possible to provide a practical magnetron without a significant decrease in productivity or characteristics from a conventional one, while cutting costs by reducing the number of parts with the use of two strap rings on one side.
Magnetron
Provided is a low-cost magnetron that is excellent in productivity without any adverse effect on characteristics. Two large and small strap rings 11 (11A and 11B) are only disposed at lower ends, or input sides, of a plurality of vanes 10 (10A and 10B) in the direction of a tube axis m. Diameter Rip of a protruding flat surface 41 of an input side pole piece 18 is larger than diameter Rop of a protruding flat surface 40 of an output side pole piece 17. Therefore, it is possible to provide a practical magnetron without a significant decrease in productivity or characteristics from a conventional one, while cutting costs by reducing the number of parts with the use of two strap rings on one side.
Compact magnet design for high-power magnetrons
A high-power magnetron assembly includes a high-power magnetron and a compact magnetic field generator. The high-power magnetron includes a cathode configured to emit electrons in response to receiving a supply of voltage from a power supply. The high-power magnetron includes an anode configured to concentrically surround the cathode and to attract the emitted electrons across an interaction region between the cathode and the anode. The compact magnetic field generator includes a plurality of permanent magnets including: a cathode magnet that has a longitudinal axis of symmetry annularly and that is surrounded by the cathode and disposed within the magnetron; and an anode magnet configured to annularly surround an outer perimeter of the magnetron. An arrangement of the plurality of permanent magnets concentrically about the longitudinal axis of symmetry forms a specified magnetic field within the interaction region that bounds the electrons emitted within the interaction region.
Compact magnet design for high-power magnetrons
A high-power magnetron assembly includes a high-power magnetron and a compact magnetic field generator. The high-power magnetron includes a cathode configured to emit electrons in response to receiving a supply of voltage from a power supply. The high-power magnetron includes an anode configured to concentrically surround the cathode and to attract the emitted electrons across an interaction region between the cathode and the anode. The compact magnetic field generator includes a plurality of permanent magnets including: a cathode magnet that has a longitudinal axis of symmetry annularly and that is surrounded by the cathode and disposed within the magnetron; and an anode magnet configured to annularly surround an outer perimeter of the magnetron. An arrangement of the plurality of permanent magnets concentrically about the longitudinal axis of symmetry forms a specified magnetic field within the interaction region that bounds the electrons emitted within the interaction region.
Apparatus for generating electromagnetic waves
An apparatus for generating electromagnetic waves is envisaged relating to the field of electromagnetic wave generating systems. The apparatus provides efficient radio frequency amplification, facilitates low loss electromagnetic generation, enables efficient utilization of kinetic energy of electrons, and works for different radio frequencies. The apparatus comprises an evacuated envelope, a pair of metal plates, a resonator, an electron gun, a magnetic field generator, and a pick-up loop. The evacuated envelope defines a space therewithin. The pair of metal plates defines a passage therebetween. The resonator is coupled to the pair of metal plates. The electron gun emits controlled bursts of electrons into the passage. The magnetic field generator is configured to generate electromagnetic waves. The pick-up loop extracts the generated electromagnetic waves.
Apparatus for generating electromagnetic waves
An apparatus for generating electromagnetic waves is envisaged relating to the field of electromagnetic wave generating systems. The apparatus provides efficient radio frequency amplification, facilitates low loss electromagnetic generation, enables efficient utilization of kinetic energy of electrons, and works for different radio frequencies. The apparatus comprises an evacuated envelope, a pair of metal plates, a resonator, an electron gun, a magnetic field generator, and a pick-up loop. The evacuated envelope defines a space therewithin. The pair of metal plates defines a passage therebetween. The resonator is coupled to the pair of metal plates. The electron gun emits controlled bursts of electrons into the passage. The magnetic field generator is configured to generate electromagnetic waves. The pick-up loop extracts the generated electromagnetic waves.
An Apparatus for Generating Electromagnetic Waves
An apparatus for generating electromagnetic waves is envisaged relating to the field of electromagnetic wave generating systems. The apparatus provides efficient radio frequency amplification, facilitates low loss electromagnetic generation, enables efficient utilization of kinetic energy of electrons, and works for different radio frequencies. The apparatus comprises an evacuated envelope, a pair of metal plates, a resonator, an electron gun, a magnetic field generator, and a pick-up loop. The evacuated envelope defines a space therewithin. The pair of metal plates defines a passage therebetween. The resonator is coupled to the pair of metal plates. The electron gun emits controlled bursts of electrons into the passage. The magnetic field generator is configured to generate electromagnetic waves. The pick-up loop extracts the generated electromagnetic waves.
An Apparatus for Generating Electromagnetic Waves
An apparatus for generating electromagnetic waves is envisaged relating to the field of electromagnetic wave generating systems. The apparatus provides efficient radio frequency amplification, facilitates low loss electromagnetic generation, enables efficient utilization of kinetic energy of electrons, and works for different radio frequencies. The apparatus comprises an evacuated envelope, a pair of metal plates, a resonator, an electron gun, a magnetic field generator, and a pick-up loop. The evacuated envelope defines a space therewithin. The pair of metal plates defines a passage therebetween. The resonator is coupled to the pair of metal plates. The electron gun emits controlled bursts of electrons into the passage. The magnetic field generator is configured to generate electromagnetic waves. The pick-up loop extracts the generated electromagnetic waves.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes: a processing container; an injector provided inside the processing container and having a shape extending in a longitudinal direction along which a processing gas is supplied; a holder fixed to the injector; a first magnet fixed to the holder and disposed inside the processing container; a second magnet separated from the first magnet by a partition plate and disposed outside the processing container; and a driving part configured to rotate the second magnet, wherein the first magnet and the second magnet are magnetically coupled to each other, and wherein by rotating the second magnet by the driving part, the first magnet magnetically coupled to the second magnet is rotated, and the injector rotates about the longitudinal direction as an axis.