An ion implantation system, ion source, and method are provided, where an ion source is configured to ionize an aluminum-based ion source material and to form an ion beam and a by-product including a non-conducting material. An etchant gas mixture has a predetermined concentration of fluorine and a noble gas that is in fluid communication with the ion source. The predetermined concentration of fluorine is associated with a predetermined health safety level, such as approximately a 20% maximum concentration of fluorine. The etchant gas mixture can have a co-gas with a concentration less than approximately 5% of argon. The aluminum-based ion source material can be a ceramic member, such as a repeller shaft, a shield, or other member within the ion source.

A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions.

A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions.

A discharge device includes a connector portion, an electrode portion, and a housing portion. A voltage is applied to the connector portion externally. The electrode portion discharges by boosting and supplying a voltage from the connector portion. The housing portion houses the connector portion and the electrode portion. The housing portion includes a step portion between the connector portion and the electrode portion. The step portion is, for example, a recess.

A discharge device includes a connector portion, an electrode portion, and a housing portion. A voltage is applied to the connector portion externally. The electrode portion discharges by boosting and supplying a voltage from the connector portion. The housing portion houses the connector portion and the electrode portion. The housing portion includes a step portion between the connector portion and the electrode portion. The step portion is, for example, a recess.

An ion generating device (1) includes: a discharge electrode (21,22), protruding from a surface of the ion generating device, for generating ions by electric discharge, the discharge electrode having (i) a tip part (31) including a brush-like electrically conductive member and (ii) a base end part (33) to which the brush-like electrically conductive member is attached, and the base end part protruding from the surface of the ion generating device for a length (L2) that is longer than a length (L1) of the tip part.

An ion generating device (1) includes: a discharge electrode (21,22), protruding from a surface of the ion generating device, for generating ions by electric discharge, the discharge electrode having (i) a tip part (31) including a brush-like electrically conductive member and (ii) a base end part (33) to which the brush-like electrically conductive member is attached, and the base end part protruding from the surface of the ion generating device for a length (L2) that is longer than a length (L1) of the tip part.

A method for operating a particle beam generator for a particle beam device, and a particle beam device for carrying out this method, are provided. An extractor voltage may be set to an extractor value using a first variable voltage supply unit. An emission current of the particle beam generator may be measured. When the emission current of the particle beam generator decreases, a suppressor voltage applied to a suppressor electrode may be adjusted using a second variable voltage supply unit such that a specific emission current of the particle beam generator is reached or maintained. When the emission current of the particle beam generator increases, the extractor voltage applied to the extractor electrode may be adjusted using the first variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

A method for operating a particle beam generator for a particle beam device, and a particle beam device for carrying out this method, are provided. An extractor voltage may be set to an extractor value using a first variable voltage supply unit. An emission current of the particle beam generator may be measured. When the emission current of the particle beam generator decreases, a suppressor voltage applied to a suppressor electrode may be adjusted using a second variable voltage supply unit such that a specific emission current of the particle beam generator is reached or maintained. When the emission current of the particle beam generator increases, the extractor voltage applied to the extractor electrode may be adjusted using the first variable voltage supply unit such that the specific emission current of the particle beam generator is reached or maintained.

The present invention has an object to reduce a risk of performance degradation caused to an ion generating device that is being manufactured. An ion generating device (1) includes: a discharge electrode (21) for generating ions by electric discharge, the discharge electrode having (i) a mounting part (33a) for mounting the discharge electrode on the ion generating device and (ii) a brush part including a plurality of linear electrically conductive members, and the mounting part (33a) binding a base end part of the brush part so as to hold the base end part, the ion generating device further including: an insulating sealing member (41) with which to seal the base end part of the mounting part (33a); and a protective resin (29) with which to cover at least a brush base end surface (25t).